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题名滑模与常规模板混凝土浇筑施工经济效益分析
被引量：2
- 1
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作者
潘纯
孟祥翠
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机构
辽宁水利土木工程咨询有限公司
辽宁省水利水电工程局
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出处
《东北水利水电》
2010年第3期58-59,共2页
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文摘
大伙房水库输水(二期)工程取水口型式独特,结构异常复杂。因工期调整需要,闸墩混凝土浇筑由原计划常规翻升模板改为滑模浇筑,通过技术攻关,高效、优质、安全地完成了取水口闸墩混凝土浇筑任务,压缩直线工期3个月,经济效益显著,为后续项目的施工争取了主动。
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关键词
取水口
闸墩
滑模
常规模板
经济效益
大伙房水库输水(二期)工程
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Keywords
water intake
pier
slipform
conventional template
economic benefit
water conveyance phase Ⅱ project of Dahuofang reservoir
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分类号
F416.9
[经济管理—产业经济]
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题名表面等离子体无掩膜干涉光刻系统的数值分析(英文)
被引量：5
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作者
董启明
郭小伟
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机构
电子科技大学光电信息学院
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出处
《光子学报》
EI
CAS
CSCD
北大核心
2012年第5期558-564,共7页
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基金
The National Natural Science Foundation of China(No.60906052)
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文摘
表面等离子体激元具有近场增强效应,可以代替光子作为曝光源形成纳米级特征尺寸的图像.本文数值分析了棱镜辅助表面等离子体干涉系统的参量空间,并给出了计算原理和方法.结果表明,适当地选择高折射率棱镜、低银层厚度、入射波长和光刻胶折射率,可以获得高曝光度、高对比度的干涉图像.入射波长为431nm时,选择40nm厚的银层,曝光深度可达200nm,条纹周期为110nm.数值分析结果为实验的安排提供了理论支持.
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关键词
干涉光刻
表面等离子体激元
克莱舒曼结构
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Keywords
Interference lithography
Surface plasmon plortiton
Kretschmann structureCLCN: TN305.7 Document Code:A Article ID:1004-4213(2012)05-0558-70 IntroductionThere is a growing interest in exploring new nanolithography techniques with high efficiency,low cost and large-area fabrication to fabricate nanoscale devices for nanotechnology applications.conventional photolithography has remained a useful microfabrication technology because of its ease of repetition and suitability for large-area fabrication[1].The diffraction limit,however,restricts the fabrication scale of photolithography[2].Potential solutions that have actually been pursued require increasingly shorter illumination wavelengths for replicating smaller structures.It is becoming more difficult and complicated to use the short optical wavelengths to reach the desired feature sizes.Other methods such as electron beam lithography[3],ion beam lithography[4],scanning probe lithography[5],nanoimprint lithography(NIL)[6],and evanescent near-field optical lithography(ENFOL)[7] have been developed in order to achieve nanometer-scale features.As we know,the former three techniques need scanning and accordingly are highly inefficient.In NIL,the leveling of the imprint template and the substrate during the printing process,which determines the uniformity of the imprint result,is a challenging issue of this method.ENFOL have the potential to produce subwavelength structures with high efficiency,but it encounters the fact that the evanescent field decays rapidly through the aperture,thus attenuating the transmission intensity at the exit plane and limiting the exposure distance to the scale of a few tens of nanometers from the mask.In recent years,the use of surface-plasmon polaritons(SPPs) instead of photons as an exposure source was rapidly developed to fabricate nanoscale structures.SPPs are characterized by its near field enhancement so that SPP-based lithography can greatly extend exposure depth and improve pattern contrast.Grating-assisted SPP interference,such as S
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分类号
TN305.7
[电子电信—物理电子学]
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题名方形贴袋模板制作工艺方法比较研究
被引量：3
- 3
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作者
贺小红
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机构
广州市纺织服装职业学校
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出处
《浙江纺织服装职业技术学院学报》
2020年第3期21-25,共5页
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基金
广州市教育科学规划2018年度课题[编号:201811647]。
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文摘
为了使服装教学适应企业自动化、数字化和智能化需求,本研究以方形贴袋为例,利用常规缝制法和3种不同模板制作法进行比较。研究结果表明:智能化模板制作工艺方法所需时间更短,成品效果更好,大大提高了制作效率,降低了产品对操作者技能水平的依赖;同时也发现针对不同的面料性能和需求应采用不同的模板,才能更好地操作,进而提高制作效率和工艺效果。
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关键词
服装工艺模板教学
方形贴袋
常规缝制法
模板制作法
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Keywords
clothing process template teaching
square patch bag
conventional sewing method
template making method
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分类号
TS941.52
[轻工技术与工程—服装设计与工程]
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