期刊文献+
共找到3篇文章
< 1 >
每页显示 20 50 100
靶形对溅射薄膜厚度均匀性影响的研究 被引量:3
1
作者 张苏淮 魏文忠 杨晖 《武汉大学学报(自然科学版)》 CSCD 1992年第3期43-47,共5页
本文提出了一种提高溅射镀膜膜厚均匀性的方法。通过计算得到对于多晶和非晶材料制成的阴极靶在强电场气体离子轰击下,若在靶中央开孔并适当选取靶与基板的距离,可以明显改善膜厚均匀性和均匀范围。采用10cm×10cm的阴极靶,中央开5c... 本文提出了一种提高溅射镀膜膜厚均匀性的方法。通过计算得到对于多晶和非晶材料制成的阴极靶在强电场气体离子轰击下,若在靶中央开孔并适当选取靶与基板的距离,可以明显改善膜厚均匀性和均匀范围。采用10cm×10cm的阴极靶,中央开5cm×5cm的孔,所得薄膜厚度不均匀性小于3%的范围是11cm×11cm. 展开更多
关键词 溅射 膜厚均匀性 阴极靶 靶形
下载PDF
Approximate Design of Alloy Composition of Cathode Target 被引量:4
2
作者 Jun ZHANG Yu ZHANG +2 位作者 Li LI Guoqiang LIN Chuang DONG 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2006年第5期639-642,共4页
An empirical formula for composition demixing analysis in cathodic arc ion plating using alloy target is established based on the concepts of average charged state and relative demixing parameter. The level of composi... An empirical formula for composition demixing analysis in cathodic arc ion plating using alloy target is established based on the concepts of average charged state and relative demixing parameter. The level of composition demixing effect is presented by demixing degree of one element. For binary constituent alloy target, the composition change trend in coating is discussed and the limit of demixing degree for each element is determined. The content of one element with higher average charged state gets larger in coating than in alloy target, at meantime, the content of one element with lower average charged state gets less. For each one of the two constituents, the less the atom percent in alloy target, the larger the difference of its contents between the coating and the target. For triple constituent alloy target, the content change of one element with moderate average charged state is discussed in detail. Its content in coating getting larger or less is determined by the combination result of the contents of the other two elements in alloy target. For a given content of the element with moderate average charged state in triple alloy target, the content deviation level of that element from coating to alloy target will be not larger than that using binary alloy target containing only that element and one of the two others. According to the wanted coating composition, the composition design of alloy target is easily deduced from the formula. 展开更多
关键词 cathodic arc ion plating Alloy coating Alloy target COMPOSITION
下载PDF
Ti-Al-Zr靶材的多弧离子镀沉积过程的模拟研究 被引量:2
3
作者 赵时璐 张震 《机械设计与制造》 北大核心 2007年第5期137-139,共3页
本文模拟了Ti-Al-Zr靶材的多弧离子镀的镀膜过程。通过对圆柱形镀膜室-偏压电场的模拟,讨论了在不同的偏压电场下粒子的运动特性、成分离析效应的影响因素、涂层成分均匀性的影响因素,模拟结果与实际的镀膜实验相符。
关键词 多弧离子镀 镀膜过程 Ti-Al-Zr靶材 成分
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部