The facile reconfiguration of phases plays a pivotal role in enhancing the electrocatalytic production of H2 through heterostructure formation.While chemical methods have been explored extensively for this purpose,pla...The facile reconfiguration of phases plays a pivotal role in enhancing the electrocatalytic production of H2 through heterostructure formation.While chemical methods have been explored extensively for this purpose,plasma-based techniques offer a promising avenue for achieving heterostructured nano-frameworks.However,the conventional plasma approach introduces complexities,leading to a multi-step fabrication process and challenges in precisely controlling partial surface structure modulation due to the intricate interaction environment.In our pursuit of heterostructures with optimized oxygen evolution reaction(OER)behavior,we have designed a facile auxiliary insulator-confined plasma system to directly attain a Ni_(3)N-NiO heterostructure(hNiNO).By meticulously controlling the surface heating process during plasma processing,such approach allows for the streamlined fabrication of hNiNO nano-frameworks.The resulting nano-framework exhibits outstanding catalytic performance,as evidenced by its overpotential of 320 mV at a current density of 10 mA·cm^(-2),in an alkaline environment.This stands in stark contrast to the performance of NiO-covered Ni_(3)N fabricated using the conventional plasma method(sNiNO).Operando plasma diagnostics,coupled with numerical simulations,further substantiates the influence of surface heating due to auxiliary insulator confinement of the substrate on typical plasma parameters and the formation of the Ni_(3)N-NiO nanostructure,highlighting the pivotal role of controlled surface temperature in creating a high-performance heterostructured electrocatalyst.展开更多
In order to improve the length of plasma in a whole tube and mechanical properties of Cr films deposited on the inner surface of the tube, a high-power impulse magnetron sputtering coating method with a planar cathode...In order to improve the length of plasma in a whole tube and mechanical properties of Cr films deposited on the inner surface of the tube, a high-power impulse magnetron sputtering coating method with a planar cathode target and auxiliary anode was proposed. The auxiliary anode was placed near the tube tail to attract plasma into the inner part of the tube. Cr films were deposited on the inner wall of a 20# carbon steel tube with a diameter of 40 mm and length of 120 mm. The influence of auxiliary anode voltage on the discharge characteristics of the Cr target, and the structure and mechanical properties of Cr films deposited on the inner surface of the tube were explored. With higher auxiliary anode voltage, an increase in substrate current was observed, especially in the tube tail. The thickness uniformity, compactness, hardness and H/E ratios of the Cr films deposited on the inner surface of the tube increased with the increase in auxiliary anode voltage. The Cr films deposited with auxiliary anode voltage of 60 V exhibited the highest hardness of 9.6 GPa and the lowest friction coefficient of 0.68.展开更多
基金supported by the National Natural Science Foundation of China(Nos.12304020,21905118,and 22378204)National Science Fund for Distinguished Young Scholars(No.T2125004)+1 种基金the Natural Science Foundation of Jiangsu Province(No.BK20230909)Fundamental Research Funds for the Central Universities(No.30923011013)。
文摘The facile reconfiguration of phases plays a pivotal role in enhancing the electrocatalytic production of H2 through heterostructure formation.While chemical methods have been explored extensively for this purpose,plasma-based techniques offer a promising avenue for achieving heterostructured nano-frameworks.However,the conventional plasma approach introduces complexities,leading to a multi-step fabrication process and challenges in precisely controlling partial surface structure modulation due to the intricate interaction environment.In our pursuit of heterostructures with optimized oxygen evolution reaction(OER)behavior,we have designed a facile auxiliary insulator-confined plasma system to directly attain a Ni_(3)N-NiO heterostructure(hNiNO).By meticulously controlling the surface heating process during plasma processing,such approach allows for the streamlined fabrication of hNiNO nano-frameworks.The resulting nano-framework exhibits outstanding catalytic performance,as evidenced by its overpotential of 320 mV at a current density of 10 mA·cm^(-2),in an alkaline environment.This stands in stark contrast to the performance of NiO-covered Ni_(3)N fabricated using the conventional plasma method(sNiNO).Operando plasma diagnostics,coupled with numerical simulations,further substantiates the influence of surface heating due to auxiliary insulator confinement of the substrate on typical plasma parameters and the formation of the Ni_(3)N-NiO nanostructure,highlighting the pivotal role of controlled surface temperature in creating a high-performance heterostructured electrocatalyst.
基金financial support from National Natural Science Foundation of China(Nos.12075071 and 11875119)Heilongjiang Touyan Innovation Team Program(HITTY-20190013)。
文摘In order to improve the length of plasma in a whole tube and mechanical properties of Cr films deposited on the inner surface of the tube, a high-power impulse magnetron sputtering coating method with a planar cathode target and auxiliary anode was proposed. The auxiliary anode was placed near the tube tail to attract plasma into the inner part of the tube. Cr films were deposited on the inner wall of a 20# carbon steel tube with a diameter of 40 mm and length of 120 mm. The influence of auxiliary anode voltage on the discharge characteristics of the Cr target, and the structure and mechanical properties of Cr films deposited on the inner surface of the tube were explored. With higher auxiliary anode voltage, an increase in substrate current was observed, especially in the tube tail. The thickness uniformity, compactness, hardness and H/E ratios of the Cr films deposited on the inner surface of the tube increased with the increase in auxiliary anode voltage. The Cr films deposited with auxiliary anode voltage of 60 V exhibited the highest hardness of 9.6 GPa and the lowest friction coefficient of 0.68.
