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Surface-induced evaporative cooling
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作者 柯敏 颜波 +1 位作者 程锋 王育竹 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第10期4274-4280,共7页
The effects of surface-induced evaporative cooling on an atom chip are investigated. The evolutions of temperature, number and phase-space density of the atom cloud are measured when the atom cloud is brought close to... The effects of surface-induced evaporative cooling on an atom chip are investigated. The evolutions of temperature, number and phase-space density of the atom cloud are measured when the atom cloud is brought close to the surface. Rapid decrease of the temperature and number of the atoms is found when the atom-surface distance is 〈 100 ttm. A gain of about a factor of five on the phase-space density is obtained. It is found that the efficiency of the surface-induced evaporative cooling depends on the atom-surface distance and the shape of the evaporative trap. When the atoms are moved very close to the surface, severe heating is observed, which dominates when the holding time is 〉 8 ms. It is important that the surface-induced evaporative cooling offers novel possibilities for the realization of a continuous condensation, where a spatially varying evaporative cooling is required. 展开更多
关键词 atom chip atom-surface distance surface-induced evaporative cooling
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Photoionization microscopy of hydrogen atom near a metal surface 被引量:1
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作者 杨海峰 汪磊 +1 位作者 柳晓军 刘红平 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第6期207-214,共8页
We have studied the ionization of Rydberg hydrogen atom near a metal surface with a semiclassical analysis of photoionization microscopy. Interference patterns of the electron radial distribution are calculated at dif... We have studied the ionization of Rydberg hydrogen atom near a metal surface with a semiclassical analysis of photoionization microscopy. Interference patterns of the electron radial distribution are calculated at different scaled energies above the classical saddle point and at various atom surface distances. We find that different types of trajecto- ries contribute predominantly to different manifolds in a certain interference pattern. As the scaled energy increases, the structure of the interference pattern evolves smoothly and more types of trajectories emerge. As the atom approaches the metal surface closer, there are more types of trajectories contributing to the interference pattern as well. When the Rydberg atom comes very close to the metal surface or the scaled energy approaches the zero field ionization energy, the potential induced by the metal surface will make atomic system chaotic. The results also show that atoms near a metal surface exhibit similar properties like the atoms in the parallel electric and magnetic fields. 展开更多
关键词 photoionization microscopy interaction of atom with surface semiclassical theory
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CMP后清洗技术的研究进展 被引量:21
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作者 雷红 《半导体技术》 CAS CSCD 北大核心 2008年第5期369-373,共5页
化学机械抛光(CMP)技术是目前广泛采用的几乎唯一的高精度全局平面化技术,抛光后表面的清洗质量直接关系到CMP技术水平的高低。介绍了各种机械、物理及化学清洗方法与工艺技术优缺点,指出了清洗剂、清洗方式是CMP后清洗技术中的关键要... 化学机械抛光(CMP)技术是目前广泛采用的几乎唯一的高精度全局平面化技术,抛光后表面的清洗质量直接关系到CMP技术水平的高低。介绍了各种机械、物理及化学清洗方法与工艺技术优缺点,指出了清洗剂、清洗方式是CMP后清洗技术中的关键要素。综述了CMP后清洗技术的发展现状,分析了CMP后清洗存在的问题,并对其发展趋势进行了展望。 展开更多
关键词 化学机械抛光 原子级精度表面 清洗技术
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