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题名基于模板生成的CAPP系统的研究与开发
被引量：4
- 1
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作者
景宁
王秀伦
蔡洪学
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机构
大连理工大学机械系
大连铁道学院机械系
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出处
《机械设计与制造》
北大核心
2000年第6期31-33,共3页
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文摘
从CAPP系统的现状出发 ,分析了当前CAPP系统的问题 ,提出了基于模板生成的CAPP系统的思想。并论述了系统的原理、关键技术和应用前景。在该思想的指导下 ,开发了基于模板生成的实用化CAPP设计与管理系统模型。实践证明该系统是一个具有良好实用化水平的CAPP系统。
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关键词
CAPP
模板生成
原型工艺
工艺管理
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Keywords
CAPP
template produce
prototype process
practical
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分类号
TH162
[机械工程—机械制造及自动化]
TP391.72
[自动化与计算机技术—计算机应用技术]
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题名表面等离子体无掩膜干涉光刻系统的数值分析(英文)
被引量：5
- 2
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作者
董启明
郭小伟
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机构
电子科技大学光电信息学院
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出处
《光子学报》
EI
CAS
CSCD
北大核心
2012年第5期558-564,共7页
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基金
The National Natural Science Foundation of China(No.60906052)
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文摘
表面等离子体激元具有近场增强效应,可以代替光子作为曝光源形成纳米级特征尺寸的图像.本文数值分析了棱镜辅助表面等离子体干涉系统的参量空间,并给出了计算原理和方法.结果表明,适当地选择高折射率棱镜、低银层厚度、入射波长和光刻胶折射率,可以获得高曝光度、高对比度的干涉图像.入射波长为431nm时,选择40nm厚的银层,曝光深度可达200nm,条纹周期为110nm.数值分析结果为实验的安排提供了理论支持.
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关键词
干涉光刻
表面等离子体激元
克莱舒曼结构
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Keywords
Interference lithography
Surface plasmon plortiton
Kretschmann structureCLCN: TN305.7 Document Code:A Article ID:1004-4213(2012)05-0558-70 IntroductionThere is a growing interest in exploring new nanolithography techniques with high efficiency,low cost and large-area fabrication to fabricate nanoscale devices for nanotechnology applications.Conventional photolithography has remained a useful microfabrication technology because of its ease of repetition and suitability for large-area fabrication[1].The diffraction limit,however,restricts the fabrication scale of photolithography[2].Potential solutions that have actually been pursued require increasingly shorter illumination wavelengths for replicating smaller structures.It is becoming more difficult and complicated to use the short optical wavelengths to reach the desired feature sizes.Other methods such as electron beam lithography[3],ion beam lithography[4],scanning probe lithography[5],nanoimprint lithography(NIL)[6],and evanescent near-field optical lithography(ENFOL)[7] have been developed in order to achieve nanometer-scale features.As we know,the former three techniques need scanning and accordingly are highly inefficient.In NIL,the leveling of the imprint template and the substrate during the printing process,which determines the uniformity of the imprint result,is a challenging issue of this method.ENFOL have the potential to produce subwavelength structures with high efficiency,but it encounters the fact that the evanescent field decays rapidly through the aperture,thus attenuating the transmission intensity at the exit plane and limiting the exposure distance to the scale of a few tens of nanometers from the mask.In recent years,the use of surface-plasmon polaritons(SPPs) instead of photons as an exposure source was rapidly developed to fabricate nanoscale structures.SPPs are characterized by its near field enhancement so that SPP-based lithography can greatly extend exposure depth and improve pattern contrast.Grating-assisted SPP interference,such as S
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分类号
TN305.7
[电子电信—物理电子学]
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题名用FlashMX模板功能制作自测类课件
- 3
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作者
王克胜
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机构
安徽省舒城县千人桥中学中学
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出处
《电脑学习》
2008年第4期34-35,共2页
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文摘
介绍了利用FlashMX软件所提供的测验模板功能,制作自测类课件的方法。
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关键词
FLASHMX
模板
自测类课件
制作
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Keywords
FlashMX template Self-test Courseware produce
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分类号
G434
[文化科学—教育学]
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