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Supercell Approach in Tight-Binding Calculation of Si and Ge Nanowire Bandstructures 被引量:1
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作者 管曦萌 余志平 《Chinese Physics Letters》 SCIE CAS CSCD 2005年第10期2651-2654,共4页
Energy bandstructures of [100] oriented Si and Ge quantum nanowires with various cross-sections are calculated by using the sp^3d^5s^* tight-binding model with a supercell approach. Results are compared with those ob... Energy bandstructures of [100] oriented Si and Ge quantum nanowires with various cross-sections are calculated by using the sp^3d^5s^* tight-binding model with a supercell approach. Results are compared with those obtained by the first principles method (i.e., density functional theory, or DFT). The differences in the bandstructure between silicon and germanium nanowires are analysed and it is shown that germanium keeps indirect-bandgap and the silicon nanowire along the [100] direction becomes direct-bandgap when the wire diameter shrinks. It is shown in comparison with the available experimental data that the tight-binding method is adequate in predicting the bandstructure parameters relevant to the carrier transport in mesoscopic nanowire devices and is far superior to the DFT method in terms of computational cost. 展开更多
关键词 silicon quantum wires
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采用锗硅异质外延方法制备硅量子线
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作者 陆阳 施毅 +6 位作者 刘建林 汪峰 张荣 顾书林 郑有 茅保华 谢中华 《固体电子学研究与进展》 CAS CSCD 北大核心 1996年第3期201-205,共5页
报道了一种采用锗硅异质外延制备硅量子线的新方法。在超低压化学气相淀积外延生长Si/SiGe/Si异质结构基础上,采用光刻和反应离子刻蚀技术形成槽状图形,用选择腐蚀液进行选择化学腐蚀,获得Si线阵列,最后通过湿氧、干氧... 报道了一种采用锗硅异质外延制备硅量子线的新方法。在超低压化学气相淀积外延生长Si/SiGe/Si异质结构基础上,采用光刻和反应离子刻蚀技术形成槽状图形,用选择腐蚀液进行选择化学腐蚀,获得Si线阵列,最后通过湿氧、干氧氧化过程,成功实现了高质量Si/SiO2异质界面结构硅量子线。采用扫描电子显微镜对量子线形成特征进行了研究,并讨论了硅线的热氧化性质。 展开更多
关键词 硅量子线 选择腐蚀 热氧化 锗硅异质外延
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