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Direct Tunneling Effect in Metal-Semiconductor Contacts Simulated with Monte Carlo Method 被引量:2
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作者 孙雷 杜刚 +1 位作者 刘晓彦 韩汝琦 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第11期1364-1368,共5页
Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the i... Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the investigation into the tunneling current indicates that the tunneling effect is of great importance under reverse biases.The Schottky barrier diode current due to Schottky effect is in agreement with the theoretical one.The barrier lowering is found a profound effect on the current transport at the metal semiconductor interface. 展开更多
关键词 Monte Carlo device simulation metal semiconductor contact direct tunneling schottky effect
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