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A comparison of transmittance properties between ZnO∶Al films for transparent conductors for solar cells deposited by sputtering of AZO and cosputtering of AZO/ZnO 被引量:8
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作者 LEE Chongmu YIM Keunbin +1 位作者 CHO Youngjoon Lee J.G. 《Rare Metals》 SCIE EI CAS CSCD 2006年第z1期105-109,共5页
Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) and glass substrates by two different sputtering techniques radio frequency magnetron cosputtering of AZO and ZnO targets and sputtering of a... Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) and glass substrates by two different sputtering techniques radio frequency magnetron cosputtering of AZO and ZnO targets and sputtering of an AZO target. The dependence of the photoluminescence (PL) and transmittance properties of the AZO films deposited by cosputtering and sputtering on the AZO/ZnO target power ratio, R and the O2/Ar flow ratio, r were investigated, respectively. Only a deep level emission peak appears in the PL spectra of cosputtered AZO films whereas both UV emission and deep level emission peaks are observed in the PL spectra of sputtered AZO films. The absorption edges in the transmittance spectra of the AZO films shift to the lower wavelength region as R and r increase. Effects of crystallinity, surface roughness, PL on the transmittance of the AZO films were also explained using the X-ray diffraction (XRD), atomic force microscopy (AFM), and PL analysis results. 展开更多
关键词 Al-doped ZnO (AZO) r.f. magnetron sputtering r.f. power transparent conducting oxide (TCO) TrANSMITTANCE
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Preparation and Characterization of CeO_2-TiO_2/SnO_2:Sb Films Deposited on Glass Substrates by R.F.Sputtering 被引量:6
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作者 ZHAO Qingnan DONG Yuhong NI Jiamiao WANG Peng ZHAO Xiujian 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2008年第4期443-447,共5页
CeO2-TiO2 films and CeO2-TiO/SnO2:Sb (6 mol%) double films were deposited on glass substrates by radio-frequency magnetron sputtering (R.F. Sputtering), using SnO2:Sb(6 mol%) target, and CeO2- TiO2 targets wit... CeO2-TiO2 films and CeO2-TiO/SnO2:Sb (6 mol%) double films were deposited on glass substrates by radio-frequency magnetron sputtering (R.F. Sputtering), using SnO2:Sb(6 mol%) target, and CeO2- TiO2 targets with different molar ratio of CeO2 to TiO2 (CeO2:TiO2-0:1.0; 0.1:0.9; 0.2:0.8; 0.3:0.7; 0.4:0.6; 0.5:0.5; 0.6:0.4; 0.7:0.3; 0.8:0.2; 0.9:0.1; 1.0:0). The films are characterized by UV-visible transmission and infrared reflection spectra, scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The obtained results show that the amorphous phases composed of CeO2-TiO2 play an important role in absorbing UV, there are Ce^3-, Ce^4- and Ti^4- on the surface of the films; the glass substrates coated with CeO2-TiO2 (Ce/Ti=0.5:0.5; 0.6:0.4)/SnO2:Sb(6 mol%) double films show high absorbing UV(〉99), high visible light transmission (75%) and good infrared reflection (〉70%). The sheet resistance of the films is 30-50 Ω/□. The glass substrates coated with the double functional films can be used as window glass of buildings, automobile and so on. 展开更多
关键词 coating glass CeO2-TiO/SnO2:Sb double thin films absorbing UV Ir reflection r.f. sputterin
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Preparation and characteristics of indium tin oxide (ITO) thin films at low temperature by r.f. magnetron sputtering 被引量:4
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作者 REN Bingyan LIU Xiaoping WANG Minhua XU Ying 《Rare Metals》 SCIE EI CAS CSCD 2006年第z1期137-140,共4页
Low resistivity and highly transparent ITO conducting films for solar cell applications were fabricated at low temperature by r.f. magnetron sputtering. ITO films were deposited on glass and silicon substrate. Electri... Low resistivity and highly transparent ITO conducting films for solar cell applications were fabricated at low temperature by r.f. magnetron sputtering. ITO films were deposited on glass and silicon substrate. Electrical, optical, structural and morphological properties of the ITO films were investigated in terms of the preparation conditions. The annealing treatment has improved the properties of the ITO films at different degree. The maximum transmittance of the obtained ITO films in the visible range is over 92%, and the low resistivity for the ITO films are about 3.85×10-4 Ω·cm at 80 ℃, 80 W after annealing. 展开更多
关键词 ITO r.f. magnetron sputtering low temperature ANNEALING
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RUELLE'S INEQUALITY FOR THE ENTROPY OF RANDOM DIFFEOMORPHISMS
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作者 龚光鲁 刘培东 钱敏 《Science China Mathematics》 SCIE 1992年第9期1056-1065,共10页
In this paper, we prove Ruelle’s inequality for the entropy and Lyapunov exponents of random diffeomorphisms. Y. Kefer has studied this problem in ergodic case, but his theorem and proof seem to be incorrect. A new d... In this paper, we prove Ruelle’s inequality for the entropy and Lyapunov exponents of random diffeomorphisms. Y. Kefer has studied this problem in ergodic case, but his theorem and proof seem to be incorrect. A new discussion is given in this paper with some new ideas and methods to be introduced, especially for f∈Diff^2(M), we introduce a new definition of C^2-norm |f|c^2 and the concept of relation number r(f) which play an important role both in this paper and in general studies. 展开更多
关键词 ENTrOPY LYAPUNOV EXPONENT C^2-norm |f|_c^2 relation number r(f).
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Preparation and Properties of GaN Micro-Ribbons on Ga-Diffused Si (111) Substrates 被引量:1
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作者 XueChengshan SunZhencui WeiQinqin CaoWentian ZhuangHuizhao 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2005年第7期1162-1165,共4页
Hexagonal GaN micro-ribbons were synthesized through nitriding Ga2O3 films under flowing ammonia. Ga2O3 films were deposited on the Ga-diffused Si (111) substrates by radio frequency (r.f.) magnetron sputtering. X-ray... Hexagonal GaN micro-ribbons were synthesized through nitriding Ga2O3 films under flowing ammonia. Ga2O3 films were deposited on the Ga-diffused Si (111) substrates by radio frequency (r.f.) magnetron sputtering. X-ray diffraction (XRD), scanning electron microscopy (SEM), selected area electron diffraction (SAED); X-ray photo electronic spectrometer (XPS) and photoluminescence (PL) spectroscopy were used to characterize the structure, surface morphology, composition and optical property of the synthesized samples. SEM images show that GaN micro-ribbons with 100-300rim in diameter are randomly distributed on the uniform films. XRD, XPS and SAED analysis suggest the micro-ribbons are polycrystalline GaN with hexagonal structure and preferentially grow in the [001] direction. The PL spectrum has a remarkable blue shift compared with the reported values of bulk GaN, which might be ascribed to quantum confinement effects. 展开更多
关键词 GA2O3 films GAN micro-ribbons radio frequency (r.f.) MAGNETrON SPUTTErING
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硅基扩镓溅射Ga_2O_3反应自组装GaN薄膜 被引量:1
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作者 孙振翠 曹文田 +2 位作者 王书运 薛成山 伊长虹 《功能材料与器件学报》 CAS CSCD 北大核心 2008年第5期853-858,共6页
采用射频磁控溅射工艺在扩镓硅基上溅射Ga2O3薄膜氮化反应组装GaN薄膜,研究硅基扩镓时间对GaN薄膜晶体质量的影响。利用红外透射谱(FTIR)、X射线衍射(XRD)、扫描电镜(SEM)、光电能谱(XPS)和荧光光谱(PL)对生成的GaN薄膜进行组分、结构... 采用射频磁控溅射工艺在扩镓硅基上溅射Ga2O3薄膜氮化反应组装GaN薄膜,研究硅基扩镓时间对GaN薄膜晶体质量的影响。利用红外透射谱(FTIR)、X射线衍射(XRD)、扫描电镜(SEM)、光电能谱(XPS)和荧光光谱(PL)对生成的GaN薄膜进行组分、结构、表面形貌和发光特性分析。测试结果表明:采用此方法得到六方纤锌矿结构的GaN晶体膜。同时显示:在相同的氮化温度和时间下,随着硅基扩镓时间的增加,薄膜的晶体质量和发光特性得到明显提高。但当硅基扩镓时间进一步增加时,薄膜的晶体质量和发光特性却有所降低。较适宜的硅基扩镓时间为40min。 展开更多
关键词 GA2O3 薄膜 GAN薄膜 射频磁控溅射 扩镓时间
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FC/ZnO杂化材料的制备及结构与性能
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作者 张浴晖 齐宏进 《高分子材料科学与工程》 EI CAS CSCD 北大核心 2008年第10期83-86,共4页
采用射频磁控溅射法,分别以聚四氟乙烯(PTFE)和锌为靶,在聚对苯二甲酸乙二醇酯(PET)基底上沉积氟碳(FC)膜以及FC/ZnO的有机-无机纳米杂化材料。用SEM、UV、XPS对氟碳膜和杂化材料进行了表征。结果表明,氟碳膜形成了一种由纳米粒子-纳米... 采用射频磁控溅射法,分别以聚四氟乙烯(PTFE)和锌为靶,在聚对苯二甲酸乙二醇酯(PET)基底上沉积氟碳(FC)膜以及FC/ZnO的有机-无机纳米杂化材料。用SEM、UV、XPS对氟碳膜和杂化材料进行了表征。结果表明,氟碳膜形成了一种由纳米粒子-纳米孔洞组成的双纳米结构,随着ZnO沉积时间的不同,FC/ZnO杂化膜呈现出不同的表面形貌,杂化膜的生长模式是一种依附于有机核的沉积-扩张生长模式;杂化材料的F/C较低,随着氧化锌沉积时间的增加,F/C出现逐渐增大的趋势;杂化膜是一种多重抗紫外线辐射的功能膜。 展开更多
关键词 磁控溅射法 杂化材料 氟碳 氧化锌
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Growth and Microstructure of r.f. Sputtered Fe/Ti Multilayers
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作者 Wei WANG Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China Lishi WEN Department of Surface Engineering of Materials, Institute of Metal Research, Chinese Academy of Science 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第5期521-524,共4页
Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar st... Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction; for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure. 展开更多
关键词 TI Growth and Microstructure of r.f Sputtered fe/Ti Multilayers fE
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Synthesis of GaN nanorods on Si substrates with assistance of the vola-tilization of ZnO middle layers
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作者 ZHUANGHuizhao GAOHaiyong XUEChengshan WANGShuyun DONGZhihua HEJianting 《Rare Metals》 SCIE EI CAS CSCD 2005年第2期110-114,共5页
GaN nanorods have successfully been synthesized on Si(111) substrates via ammoniating ZnO/Ga2O3 films at 950 degrees C. Ga2O3 thin films and ZnO middle layers were deposited in turn on Si(111) substrates by r.f. magne... GaN nanorods have successfully been synthesized on Si(111) substrates via ammoniating ZnO/Ga2O3 films at 950 degrees C. Ga2O3 thin films and ZnO middle layers were deposited in turn on Si(111) substrates by r.f. magnetron sputtering system. ZnO volatilized at 950 degrees C in the ammonia ambience and Ga2O3 reacted to NH3 to fabricate GaN nanorods in the later ammoniating process. The volatilization of ZnO layers played an important role in the fabrication. The structure and composition of the GaN nanorods were studied by X-ray diffraction (XRD) and Fourier transform infrared spectrophotometer (FTIR). The morphology of GaN nanorods was investigated using scanning electron microscopy (SEM) and transmission electronic microscope (TEM). The analyses of measured results revealed that GaN nanorods with hexagonal wurtzite structure were prepared by this method. 展开更多
关键词 semiconductor materials GaN nanorods r.f. magnetron sputtering ZnO/Ga2O3 films
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Preparation and characterization of GaN films grown on Ga-diffused Si (111) substrates
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作者 SUNZhencui CAOWentian +3 位作者 WEIQinqin WANGShuyun XUEChengshan SUNHaibo 《Rare Metals》 SCIE EI CAS CSCD 2005年第2期194-199,共6页
Hexagonal GaN films were prepared by nitriding Ga_2O_3 films with flowingammonia. Ga_2O_3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.)magnetron sputtering. This paper have investig... Hexagonal GaN films were prepared by nitriding Ga_2O_3 films with flowingammonia. Ga_2O_3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.)magnetron sputtering. This paper have investigated the change of structural properties of GaN filmsnitrided in NH_3 atmosphere at the temperatures of 850, 900, and 950 deg C for 15 min and nitridedat the temperature of 900 deg C for 10, 15, and 20 min, respectively. X-ray diffraction (XRD),scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectronspectroscopy (XPS) were used to analyze the structure, surface morphology and composition ofsynthesized samples. The results reveal that the as-grown films are polycrystalline GaN withhexagonal wurtzite structure and GaN films with the highest crystal quality can be obtained whennitrided at 900 deg C for 15 min. 展开更多
关键词 materials synthesis GaN films radio frequency (r.f.) magnetron sputtering Ga-diffused Si (111) substrates Ga_2O_3 films
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Characteristics of a R.F. Ion Source Used in an Electrostatic Accelerator
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作者 詹福如 袁宏永 +6 位作者 胡纯栋 胡素华 陈斌 张束清 王绍虎 余增亮 李军 《Plasma Science and Technology》 SCIE EI CAS CSCD 2000年第1期167-170,共4页
A radio frequency (r.f.) ion source used in the electrostatic accelerator was designed and built for the study on the ion beam bioengineering. The extracting characteristics were determined by experiments, from whic... A radio frequency (r.f.) ion source used in the electrostatic accelerator was designed and built for the study on the ion beam bioengineering. The extracting characteristics were determined by experiments, from which the results showed that a maximal beam current is obtained under the condition of the extracting voltage 1700V and the gas pressure in the range of (4~ 8)× 10-4 Pa. And the diameter of the ion beam was measured as well. 展开更多
关键词 Characteristics of a r.f Ion Source Used in an Electrostatic Accelerator
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射频磁控溅射法在玻璃基片上沉积CeO_2薄膜的研究(英文)
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作者 梁飞 倪佳苗 赵青南 《传感技术学报》 EI CAS CSCD 北大核心 2006年第2期281-284,288,共5页
二氧化铈具有高折射率、介电常数和紫外吸收率,因此它广泛地应用于各种光学和电子器件。本文采用射频磁控溅射法在玻璃基片上沉积CeO2薄膜。溅射过程中,首先制备纯二氧化铈靶材,然后在不同的功率上调节不同的基片温度进行溅射。采用光... 二氧化铈具有高折射率、介电常数和紫外吸收率,因此它广泛地应用于各种光学和电子器件。本文采用射频磁控溅射法在玻璃基片上沉积CeO2薄膜。溅射过程中,首先制备纯二氧化铈靶材,然后在不同的功率上调节不同的基片温度进行溅射。采用光电子能谱、X射线衍射、拉曼光谱和扫描电镜等测试方法表征薄膜的特性。 展开更多
关键词 射频磁控溅射 二氧化铈薄膜 光电子能谱 X射线衍射 拉曼光谱 扫描电镜
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中国学习者英语口语语料库初始研究 被引量:169
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作者 卫乃兴 《现代外语》 CSSCI 北大核心 2004年第2期140-149,共10页
本文基于COLSEC语料库现有数据,研究中国大学生英语会话中的词块使用特征、话语结构特征和会话管理策略特征。研究发现,学生能熟练使用的词块数目较少、长度偏短、缺乏应有的变体,由此揭示他们运用“成语原则”,依据词块将其链接为话语... 本文基于COLSEC语料库现有数据,研究中国大学生英语会话中的词块使用特征、话语结构特征和会话管理策略特征。研究发现,学生能熟练使用的词块数目较少、长度偏短、缺乏应有的变体,由此揭示他们运用“成语原则”,依据词块将其链接为话语的技能较低,话语输出主要仍依赖“开放选择”原则;话语结构显现I鄄R鄄F型式及其若干变体,有其特征,但F话步的实现形式较为贫乏,功能类较少;话轮获取策略、话轮控制策略和交互策略的具体运用与本族语者差异较大,总的会话管理策略较差。文章揭示了研究学生英语口语特征的一些可能的方法与领域。 展开更多
关键词 组织性词块 内容性词块 I—rf机制 话轮获取策略 交互策略
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反复种植失败的相关对策新进展 被引量:28
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作者 祁静 腊晓琳 《生殖与避孕》 CAS CSCD 2014年第2期149-154,共6页
辅助生殖技术的迅速发展使众多不孕症患者借助体外受精-胚胎移植(IVF-ET)及其衍生技术获得了后代。然而很大一部分妇女经历多次优质胚胎移植亦不能获得妊娠,反复种植失败(RIF)已经成为阻碍妊娠率进一步提高的瓶颈问题,且日益受到生殖医... 辅助生殖技术的迅速发展使众多不孕症患者借助体外受精-胚胎移植(IVF-ET)及其衍生技术获得了后代。然而很大一部分妇女经历多次优质胚胎移植亦不能获得妊娠,反复种植失败(RIF)已经成为阻碍妊娠率进一步提高的瓶颈问题,且日益受到生殖医学界的广泛关注。就目前的条件而言,对RIF患者给予药物或者机械操作以提高子宫内膜容受性,行宫腹腔镜检查排除宫腔及盆腔病变以改善胚胎种植环境,通过辅助孵化、选择性囊胚移植、植入前胚胎遗传学筛查、共培养等技术提高胚胎着床能力都有可能改善和提高其种植率及妊娠率。RIF成为了我们亟待解决的问题,现综述近年有关反复种植失败的相关对策新进展。 展开更多
关键词 体外受精-胚胎移植(IVf—ET) 反复种植失败 相关对策 临床妊娠率
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不同抽吸状态下卷烟动态通风特征的数值模拟 被引量:17
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作者 王乐 李斌 +1 位作者 鲁端峰 王兵 《烟草科技》 EI CAS CSCD 北大核心 2016年第1期60-65,共6页
为了考察不同抽吸状态下卷烟动态通风特征,测量了3R4F卷烟在非燃烧不同抽吸状态下的压降与总通风率,建立了包含通风孔结构的全烟支气体流动3维数学模型,通过测量3R4F卷烟在17.5 m L/s恒速抽吸过程中的压降与总通风率对数学模型进行了验... 为了考察不同抽吸状态下卷烟动态通风特征,测量了3R4F卷烟在非燃烧不同抽吸状态下的压降与总通风率,建立了包含通风孔结构的全烟支气体流动3维数学模型,通过测量3R4F卷烟在17.5 m L/s恒速抽吸过程中的压降与总通风率对数学模型进行了验证,发现测量值和模拟值两者相对误差均小于1.5%。利用所建数学模型分析了17.5 m L/s恒速抽吸状态下与ISO标准抽吸状态下3R4F卷烟内部气流压降和速率的3维分布规律以及轴向分布规律。结果显示:在恒速抽吸状态下,从3R4F卷烟纸进入卷烟内部的气流速率与距卷烟气流入口端距离成正比例关系;在ISO标准抽吸状态下,3R4F卷烟压降与抽吸流量呈正比例关系,而卷烟总通风率与抽吸流量无关并保持恒定不变。所得结果可为深入理解卷烟燃烧过程中气流运动规律、燃烧过程调控机理以及卷烟参数优化设计提供理论支持。 展开更多
关键词 3r4f卷烟 数值模拟 吸阻 压降 总通风率
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分子束外延方法生长p型氧化锌薄膜 被引量:6
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作者 矫淑杰 梁红伟 +5 位作者 吕有明 申德振 颜建锋 张振中 张吉英 范希武 《发光学报》 EI CAS CSCD 北大核心 2004年第4期460-462,共3页
用等离子辅助分子束外延 (P MBE)的方法 ,在蓝宝石c 平面上外延生长了p型氧化锌薄膜。在实验中采用高纯金属锌作为Zn源、NO作为O源和掺杂源 ,通过射频等离子体激活进行生长。在生长温度 30 0℃ ,NO气体流量为 1.0sccm ,射频功率为 30 0... 用等离子辅助分子束外延 (P MBE)的方法 ,在蓝宝石c 平面上外延生长了p型氧化锌薄膜。在实验中采用高纯金属锌作为Zn源、NO作为O源和掺杂源 ,通过射频等离子体激活进行生长。在生长温度 30 0℃ ,NO气体流量为 1.0sccm ,射频功率为 30 0W的条件下 ,获得了重复性很好的p型ZnO ,且载流子浓度最大可达 1.2× 10 19cm-3 ,迁移率为 0 .0 5 35cm2 ·V-1·s-1,电阻率为 9.5Ω·cm。 展开更多
关键词 氧化锌薄膜 P型掺杂 一氧化氮 射频等离子体 分了束外延
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地震时供水管网的可靠性和功能分析(下) 被引量:14
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作者 符圣聪 江静贝 黄世敏 《工程抗震与加固改造》 2007年第2期95-99,109,共6页
本文以管线的可靠度分析为基础,对震后供水管网的可靠性及其功能进行分析。将直埋管线看作地基梁,考虑它和地震波引起土层位移的相互作用,建立极限状态函数。假设其随机矢量正态分布和线性无关或非正态分布和非线性无关。对于这两种情形... 本文以管线的可靠度分析为基础,对震后供水管网的可靠性及其功能进行分析。将直埋管线看作地基梁,考虑它和地震波引起土层位移的相互作用,建立极限状态函数。假设其随机矢量正态分布和线性无关或非正态分布和非线性无关。对于这两种情形,可采用电子表格的规化求解方法,或采用可靠度指数的Hasofer-Lind公式,都可得到管线的可靠度指数。用电子表格法对于用户无需求偏导数等复杂的数学运算,而采用H-L公式则要涉及偏导数和R-F变换等的运算,通常这是很困难的。本文借助MATLAB的符号运算程序可给出偏导数和其他相关函数,使得可靠度指数计算变得容易。在给出所有管线的失效概率后,就可对震后管网的可靠性及供水功能进行分析。管网的连通性估计是由Monte-Carlo法进行模拟计算得到的,可以给出任意两节点间的可靠概率估计。供水管网在地震时由于受损可能出现渗透漏,它的供水功能可能降低,可以通过管网的水力分析进行评价。本文采用点式渗漏模型模拟震后管线的渗漏,提出用管线损坏概率的反正弦函数来表示渗漏面积,实现对震后供水管网的水力计算。基于地理信息系统的供水管网抗震能力分析方法已经建立。依据来自GIS的管线失效概率、管网的可靠性和供水功能的分析信息可以对供水管网的抗震能力做出全面的评价。 展开更多
关键词 极限状态函数 可靠性 供水功能 H-L法 r-f变换
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磁控反应溅射SiN_x薄膜的研究 被引量:15
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作者 朱勇 沈伟东 +1 位作者 叶辉 顾培夫 《光子学报》 EI CAS CSCD 北大核心 2005年第1期154-157,共4页
用磁控反应溅射 (RF)的方法制备了SiNx 薄膜 分析了以硅为靶材 ,用N2 /Ar做溅射气体条件下不同的气流比率、总气压以及沉积速率对薄膜光学常数和表面结构形态的影响 ,得出较低总气压下气流比率对薄膜光学常数的影响是最关键的 ,而总气... 用磁控反应溅射 (RF)的方法制备了SiNx 薄膜 分析了以硅为靶材 ,用N2 /Ar做溅射气体条件下不同的气流比率、总气压以及沉积速率对薄膜光学常数和表面结构形态的影响 ,得出较低总气压下气流比率对薄膜光学常数的影响是最关键的 ,而总气压较大的时候 ,水汽影响增大 ,气流比率的影响反而不明显 最后提出了合适的工艺条件来制备符合要求的SiNx 展开更多
关键词 SiNx薄膜 磁控反应溅射 光学常数
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基于线性网络模型的卷烟吸阻及通风特征预测方法 被引量:15
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作者 王乐 游敏 +7 位作者 崔晓梦 易斌 郝喜良 刘欢 黄科 张明建 鲁端峰 李斌 《烟草科技》 EI CAS CSCD 北大核心 2017年第12期85-89,共5页
为了快速预测卷烟吸阻与通风之间的关系,根据卷烟各个组成部分之间的串联与并联关系,建立了卷烟气流流动的线性网络模型,计算卷烟的吸阻、卷烟纸通风率、滤嘴通风率以及总通风率。通过3R4F卷烟和细支卷烟的结构参数与物性参数,验证线性... 为了快速预测卷烟吸阻与通风之间的关系,根据卷烟各个组成部分之间的串联与并联关系,建立了卷烟气流流动的线性网络模型,计算卷烟的吸阻、卷烟纸通风率、滤嘴通风率以及总通风率。通过3R4F卷烟和细支卷烟的结构参数与物性参数,验证线性网络模型,比较模型预测结果与实验检测结果之间的相对误差可知,卷烟吸阻和总通风率的相对误差都在3%以内。线性网络模型不需要复杂的数值模拟或解析计算即可快速预测卷烟气流流动过程通风特征,揭示卷烟通风特征与结构参数和物性参数之间的非线性关系,且该方法预测结果准确性高。 展开更多
关键词 线性网络 3r4f卷烟 吸阻 通风特征 物性参数 结构参数
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有机衬底SnO_2:Sb透明导电膜的制备与特性研究 被引量:8
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作者 郝晓涛 马瑾 +4 位作者 徐现刚 杨莺歌 张德恒 杨田林 马洪磊 《物理学报》 SCIE EI CAS CSCD 北大核心 2002年第2期351-354,共4页
常温下 ,采用射频磁控溅射法在有机的柔性衬底上制备出了SnO2 :Sb透明导电膜 ,并对薄膜的结构和光电性质进行了研究 .制备的样品为多晶薄膜 ,并且保持了二氧化锡的金红石结构 .性能良好的薄膜电阻率为 6 .5× 10 - 3Ω·cm ,载... 常温下 ,采用射频磁控溅射法在有机的柔性衬底上制备出了SnO2 :Sb透明导电膜 ,并对薄膜的结构和光电性质进行了研究 .制备的样品为多晶薄膜 ,并且保持了二氧化锡的金红石结构 .性能良好的薄膜电阻率为 6 .5× 10 - 3Ω·cm ,载流子浓度为 1.2× 10 2 0 cm- 3 ,霍耳迁移率是 9.7cm2 ·V- 1 ·s- 1 .薄膜在可见光区的平均透过率达到了 85 %. 展开更多
关键词 柔性衬底 SnO2:Sb透明导电膜 射频磁控溅射法 制备 氧化锡 光学透过率 光电性质 结构
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