The unique characteristics of ultrafast lasers,such as picosecond and femtosecond lasers,have opened up new avenues in materials processing that employ ultrashort pulse widths and extremely high peak intensities.Thus,...The unique characteristics of ultrafast lasers,such as picosecond and femtosecond lasers,have opened up new avenues in materials processing that employ ultrashort pulse widths and extremely high peak intensities.Thus,ultrafast lasers are currently used widely for both fundamental research and practical applications.This review describes the characteristics of ultrafast laser processing and the recent advancements and applications of both surface and volume processing.Surface processing includes micromachining,microand nanostructuring,and nanoablation,while volume processing includes two-photon polymerization and three-dimensional(3D)processing within transparent materials.Commercial and industrial applications of ultrafast laser processing are also introduced,and a summary of the technology with future outlooks are also given.展开更多
Silver nanowires （AgNWs） have emerged as a promising nanomaterial for next generation stretchable electronics. However, until now, the fabrication of AgNW- based components has been hampered by complex and time-cons...Silver nanowires （AgNWs） have emerged as a promising nanomaterial for next generation stretchable electronics. However, until now, the fabrication of AgNW- based components has been hampered by complex and time-consuming steps. Here, we introduce a facile, fast, and one-step methodology for the fabrication of highly conductive and stretchable AgNW/polyurethane （PU） composite electrodes based on a high-intensity pulsed light （HIPL） technique. HIPL simultaneously improved wire-wire junction conductivity and wire-substrate adhesion at room temperature and in air within 50 μs, omitting the complex transfer-curing-implanting process. Owing to the localized deformation of PU at interfaces with AgNWs, embedding of the nanowires was rapidly carried out without substantial substrate damage. The resulting electrode retained a low sheet resistance （high electrical conductivity） of 〈10 Ω/sq even under 100% strain, or after 1,000 continuous stretching-relaxation cycles, with a peak strain of 60%. The fabricated electrode has found immediate application as a sensor for motion detection. Furthermore, based on our electrode, a light emitting diode （LED） driven by integrated stretchable AgNW conductors has been fabricated. In conclusion, our present fabrication approach is fast, simple, scalable, and cost- efficient, making it a good candidate for a future roll-to-roll process.展开更多
Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is...Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is usually assumed that nonlinear frequency conversion requires large crystals that gradually accumulate a strong effect.However,the large size of nonlinear crystals is not compatible with the miniaturisation of modern photonic and optoelectronic systems.Therefore,shrinking the nonlinear structures down to the nanoscale,while keeping favourable conversion efficiencies,is of great importance for future photonics applications.In the last decade,researchers have studied the strategies for enhancing the nonlinear efficiencies at the nanoscale,e.g.by employing different nonlinear materials,resonant couplings and hybridization techniques.In this paper,we provide a compact review of the nanomaterials-based efforts,ranging from metal to dielectric and semiconductor nanostructures,including their relevant nanofabrication techniques.展开更多
Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shi...Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.展开更多
Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe ...Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano- patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.展开更多
Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor...Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.展开更多
Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly ...Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography.Recently,the International Roadmap for Devices and Systems listed DSA as one of the advanced lithography techniques for the fabrication of 3-5 nm technology node devices.DSA can be combined with other lithography techniques,such as extreme ultra violet(EUV)and 193 nm immersion(193i),to further enhance the patterning resolution and the device density.So far,DSA has demonstrated its superior ability for the fabrication of nanoscale devices,such as fin field effect transistor and bit pattern media,offering a variety of configurations for high-density integration and low-cost manufacturing.Over 1 T in-2 device density can be achieved either by direct templating or coupled with nanoimprinting to improve the throughput.The development of high x block copolymer further enhances the patterning resolution of DSA.In addition to its superiority in high-resolution patterning,the implementation ofDSA on a 300 mm pivot line fully demonstrates its potential for large-scale,high-throughput,and cost-effective manufacturing in industrial environment.展开更多
Advancements in micro/nanofabrication have enabled the realization of practical micro/nanoscale photonic devices such as absorbers,solar cells,metalenses,and metaholograms.Although the performance of these photonic de...Advancements in micro/nanofabrication have enabled the realization of practical micro/nanoscale photonic devices such as absorbers,solar cells,metalenses,and metaholograms.Although the performance of these photonic devices has been improved by enhancing the design flexibility of structural materials through advanced fabrication methods,achieving large-area and high-throughput fabrication of tiny structural materials remains a challenge.In this aspect,various technologies have been investigated for realizing the mass production of practical devices consisting of micro/nanostructural materials.This review describes the recent advancements in soft lithography,colloidal self-assembly,and block copolymer self-assembly,which are promising methods suitable for commercialization of photonic applications.In addition,we introduce low-cost and large-scale techniques realizing micro/nano devices with specific examples such as display technology and sensors.The inferences presented in this review are expected to function as a guide for promising methods of accelerating the mass production of various sub-wavelength-scale photonic devices.展开更多
Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostru...Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostructures with silver-thiol-acrylate composites via two-photon polymerization followed by femtosecond laser nanojoining.Complex 3D micro/nanoscale conductive structures have been successfully fabricated with∼200 nm resolution.The loading of silver nanowires(AgNWs)and joining of junctions successfully enhance the electrical conductivity of the composites from insulating to 92.9 Sm^−1 at room temperature.Moreover,for the first time,a reversible switching to a higher conductivity is observed,up to∼10^5Sm^−1 at 523 K.The temperature-dependent conductivity of the composite is analyzed following the variable range hopping and thermal activation models.The nanomaterial assembly and joining method demonstrated in this study pave a way towards a wide range of device applications,including 3D electronics,sensors,memristors,micro/nanoelectromechanical systems,and biomedical devices,etc.展开更多
Laser has been widely applied for advanced material processing,such as welding of advanced high strength steels(AHSS) for automotive applications and Pt,Ti,and Nitinol alloys for medical applications.Recently,ultrafas...Laser has been widely applied for advanced material processing,such as welding of advanced high strength steels(AHSS) for automotive applications and Pt,Ti,and Nitinol alloys for medical applications.Recently,ultrafast pulse laser,especially femtosecond laser,is identified as powerful tools for joining and surface engineering of nanomaterials.This paper reviews our research on these fields at the Centre of Advanced Materials Joining,University of Waterloo.Representative conclusions are listed for laser material processing at three continuing scales.1) For AHSS welding,a thin Al layer can dramatically enhanced the weldability of galvannealed AHSS.The movement of the welding line and softening in the vicinity has significantly influence on global mechanical properties in dual phase(DP) and transformation induced plasticity(TRIP) steels.The increase of the strength ratio decreases the formability and results in the non-uniform strain distribution.2) For medical micro-welding,oxygen is found to be a key role for welding strength and microstructure.The formation of intermetallics reduces the relative ductility and increases the susceptibility of cracking.Different laser processing parameters can significantly influence weld mechanical performance.3) For femtosecond laser nanofabrication,the joining of Au nanoparticles is successfully achieved by controlling laser energy.Surface nanostructure of Ag induced by femtosecond laser irradiation can work effective probes for surface enhanced Raman spectroscopy.展开更多
文摘The unique characteristics of ultrafast lasers,such as picosecond and femtosecond lasers,have opened up new avenues in materials processing that employ ultrashort pulse widths and extremely high peak intensities.Thus,ultrafast lasers are currently used widely for both fundamental research and practical applications.This review describes the characteristics of ultrafast laser processing and the recent advancements and applications of both surface and volume processing.Surface processing includes micromachining,microand nanostructuring,and nanoablation,while volume processing includes two-photon polymerization and three-dimensional(3D)processing within transparent materials.Commercial and industrial applications of ultrafast laser processing are also introduced,and a summary of the technology with future outlooks are also given.
文摘Silver nanowires （AgNWs） have emerged as a promising nanomaterial for next generation stretchable electronics. However, until now, the fabrication of AgNW- based components has been hampered by complex and time-consuming steps. Here, we introduce a facile, fast, and one-step methodology for the fabrication of highly conductive and stretchable AgNW/polyurethane （PU） composite electrodes based on a high-intensity pulsed light （HIPL） technique. HIPL simultaneously improved wire-wire junction conductivity and wire-substrate adhesion at room temperature and in air within 50 μs, omitting the complex transfer-curing-implanting process. Owing to the localized deformation of PU at interfaces with AgNWs, embedding of the nanowires was rapidly carried out without substantial substrate damage. The resulting electrode retained a low sheet resistance （high electrical conductivity） of 〈10 Ω/sq even under 100% strain, or after 1,000 continuous stretching-relaxation cycles, with a peak strain of 60%. The fabricated electrode has found immediate application as a sensor for motion detection. Furthermore, based on our electrode, a light emitting diode （LED） driven by integrated stretchable AgNW conductors has been fabricated. In conclusion, our present fabrication approach is fast, simple, scalable, and cost- efficient, making it a good candidate for a future roll-to-roll process.
文摘Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is usually assumed that nonlinear frequency conversion requires large crystals that gradually accumulate a strong effect.However,the large size of nonlinear crystals is not compatible with the miniaturisation of modern photonic and optoelectronic systems.Therefore,shrinking the nonlinear structures down to the nanoscale,while keeping favourable conversion efficiencies,is of great importance for future photonics applications.In the last decade,researchers have studied the strategies for enhancing the nonlinear efficiencies at the nanoscale,e.g.by employing different nonlinear materials,resonant couplings and hybridization techniques.In this paper,we provide a compact review of the nanomaterials-based efforts,ranging from metal to dielectric and semiconductor nanostructures,including their relevant nanofabrication techniques.
基金supported by the National Key Research and Development Project of China (Nos.2022YFA1404700,2023YFB2806700,and 2021YFA1400802)National Natural Science Foundation of China (Nos.6233000076,12334016,12025402,62125501,11934012,12261131500,92250302,and 62375232)+3 种基金Shenzhen Fundamental Research Project (Nos.JCYJ20210324120402006,JCYJ20220818102218040,and GXWD20220817145518001)University Grants Committee/Research Grants Council of the Hong Kong Special Administrative Region,China (Project No.AoE/P-502/20,CRF Project Nos.C5031-22G and C1015-21E,GRF Project Nos.CityU15303521 and CityU11305223and Germany/Hong Kong Joint Research Scheme:GCityU101/22)Project of City University of Hong Kong (Nos.9380131,9610628,and 7005867).
文摘Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.
基金Acknowledgements The authors acknowledge financial support given by the National Natural Science Foundation of China （Grant Nos. 91323303, 61401292, 61405133, 61505131, and 61575135）, the Jiangsu Science andTechnology Department （Grant Nos. BK20140350, BK20140348, and BK20150309）, the Specialized Research Fund for the Doctoral Program of Higher Education （Grant No. 20133201120027）, the China Postdoctoral Science Foundation （Grant No. 2015M571816）, and the project of the Priority Academic Program Development （PAPD） of Jiangsu Higher Education Institutions.
文摘Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained consider- able commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano- patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.
基金supported by Natural Science Foundation of Shanghai(No.11ZR1432100)Shanghai Postdoctoral Science Foundation(11R21420900)
文摘Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.
文摘Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography.Recently,the International Roadmap for Devices and Systems listed DSA as one of the advanced lithography techniques for the fabrication of 3-5 nm technology node devices.DSA can be combined with other lithography techniques,such as extreme ultra violet(EUV)and 193 nm immersion(193i),to further enhance the patterning resolution and the device density.So far,DSA has demonstrated its superior ability for the fabrication of nanoscale devices,such as fin field effect transistor and bit pattern media,offering a variety of configurations for high-density integration and low-cost manufacturing.Over 1 T in-2 device density can be achieved either by direct templating or coupled with nanoimprinting to improve the throughput.The development of high x block copolymer further enhances the patterning resolution of DSA.In addition to its superiority in high-resolution patterning,the implementation ofDSA on a 300 mm pivot line fully demonstrates its potential for large-scale,high-throughput,and cost-effective manufacturing in industrial environment.
基金supported by the POSCOPOSTECH-RIST Convergence Research Center program funded by POSCO,and the National Research Foundation (NRF)grant (NRF-2022M3C1A3081312)Y.Y.and D.K.O.acknowledge Hyundai Motor Chung Mong-Koo fellowships.Y.Y.acknowledges the NRF fellowship (NRF-2021R1A6A3A13038935)funded by the Ministry of Education,Republic of Korea.H.K.and N.J.acknowledge POSTECHIAN fellowships.
文摘Advancements in micro/nanofabrication have enabled the realization of practical micro/nanoscale photonic devices such as absorbers,solar cells,metalenses,and metaholograms.Although the performance of these photonic devices has been improved by enhancing the design flexibility of structural materials through advanced fabrication methods,achieving large-area and high-throughput fabrication of tiny structural materials remains a challenge.In this aspect,various technologies have been investigated for realizing the mass production of practical devices consisting of micro/nanostructural materials.This review describes the recent advancements in soft lithography,colloidal self-assembly,and block copolymer self-assembly,which are promising methods suitable for commercialization of photonic applications.In addition,we introduce low-cost and large-scale techniques realizing micro/nano devices with specific examples such as display technology and sensors.The inferences presented in this review are expected to function as a guide for promising methods of accelerating the mass production of various sub-wavelength-scale photonic devices.
基金This research was financially supported by the National Key R&D Program of China(2017YFB1104300)the National Science Foundation(CMMI 1825608)Nebraska Center for Energy Sciences Research,and National Natural Science Foundation of China(61774067).The authors would like to thank Professor Stephen Ducharme for valuable discussions regarding the electrical conductivity analysis of this work and Joel Brehm for figure improvement.
文摘Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostructures with silver-thiol-acrylate composites via two-photon polymerization followed by femtosecond laser nanojoining.Complex 3D micro/nanoscale conductive structures have been successfully fabricated with∼200 nm resolution.The loading of silver nanowires(AgNWs)and joining of junctions successfully enhance the electrical conductivity of the composites from insulating to 92.9 Sm^−1 at room temperature.Moreover,for the first time,a reversible switching to a higher conductivity is observed,up to∼10^5Sm^−1 at 523 K.The temperature-dependent conductivity of the composite is analyzed following the variable range hopping and thermal activation models.The nanomaterial assembly and joining method demonstrated in this study pave a way towards a wide range of device applications,including 3D electronics,sensors,memristors,micro/nanoelectromechanical systems,and biomedical devices,etc.
基金supported by the National Centre of Excellent (NCE)through Auto21,Natural Science and Engineering Research Council(NSERC)of Canada and the Canada Research Chair(CRC).
文摘Laser has been widely applied for advanced material processing,such as welding of advanced high strength steels(AHSS) for automotive applications and Pt,Ti,and Nitinol alloys for medical applications.Recently,ultrafast pulse laser,especially femtosecond laser,is identified as powerful tools for joining and surface engineering of nanomaterials.This paper reviews our research on these fields at the Centre of Advanced Materials Joining,University of Waterloo.Representative conclusions are listed for laser material processing at three continuing scales.1) For AHSS welding,a thin Al layer can dramatically enhanced the weldability of galvannealed AHSS.The movement of the welding line and softening in the vicinity has significantly influence on global mechanical properties in dual phase(DP) and transformation induced plasticity(TRIP) steels.The increase of the strength ratio decreases the formability and results in the non-uniform strain distribution.2) For medical micro-welding,oxygen is found to be a key role for welding strength and microstructure.The formation of intermetallics reduces the relative ductility and increases the susceptibility of cracking.Different laser processing parameters can significantly influence weld mechanical performance.3) For femtosecond laser nanofabrication,the joining of Au nanoparticles is successfully achieved by controlling laser energy.Surface nanostructure of Ag induced by femtosecond laser irradiation can work effective probes for surface enhanced Raman spectroscopy.
