A novel structure of low-voltage trigger silicon-controlled rectifiers(LVTSCRs) with low trigger voltage and high holding voltage is proposed for electrostatic discharge(ESD) protection. The proposed ESD protection de...A novel structure of low-voltage trigger silicon-controlled rectifiers(LVTSCRs) with low trigger voltage and high holding voltage is proposed for electrostatic discharge(ESD) protection. The proposed ESD protection device possesses an ESD implant and a floating structure. This improvement enhances the current discharge capability of the gate-grounded NMOS and weakens the current gain of the silicon-controlled rectifier current path. According to the simulation results, the proposed device retains a low trigger voltage characteristic of LVTSCRs and simultaneously increases the holding voltage to 5.53 V, providing an effective way to meet the ESD protection requirement of the 5 V CMOS process.展开更多
A novel scalable model of substrate components for deep n-well (DNW) RF MOSFETs with different number of fingers is presented for the first time. The test structure developed in [1] is employed to directly access the ...A novel scalable model of substrate components for deep n-well (DNW) RF MOSFETs with different number of fingers is presented for the first time. The test structure developed in [1] is employed to directly access the characteristics of the substrate to extract the different substrate components. A methodology is developed to directly extract the parameters for the substrate network from the measured data. By using the measured two-port data of a set of nMOSFETs with different number of fingers, with the DNW in grounded and float configuration, respectively, the parameters of the scalable substrate model are obtained. The method and the substrate model are further verified and validated by matching the measured and simulated output admittances. Excellent agreement up to 40 GHz for configurations in common-source has been achieved.展开更多
电阻在静电放电(Electrostatic Discharge,ESD)保护电路中,起隔离和分压的作用。利用传输线脉冲(Transmission Line Pulsing,TLP)测试系统,在宽度为100ns的脉冲作用下,研究了n阱扩散电阻在ESD应力下的工作特性。结果表明,n阱扩散电阻在...电阻在静电放电(Electrostatic Discharge,ESD)保护电路中,起隔离和分压的作用。利用传输线脉冲(Transmission Line Pulsing,TLP)测试系统,在宽度为100ns的脉冲作用下,研究了n阱扩散电阻在ESD应力下的工作特性。结果表明,n阱扩散电阻在发生初次瞬态击穿(瞬态击穿电压79.0V,瞬态击穿电流1.97A)后,由于阳极n+-n结构被破坏,内部结构已经出现潜在损伤,不再具备隔离和分压的作用。展开更多
基金supported by the National Natural Science Foundation of China (Grant No. 61904110)。
文摘A novel structure of low-voltage trigger silicon-controlled rectifiers(LVTSCRs) with low trigger voltage and high holding voltage is proposed for electrostatic discharge(ESD) protection. The proposed ESD protection device possesses an ESD implant and a floating structure. This improvement enhances the current discharge capability of the gate-grounded NMOS and weakens the current gain of the silicon-controlled rectifier current path. According to the simulation results, the proposed device retains a low trigger voltage characteristic of LVTSCRs and simultaneously increases the holding voltage to 5.53 V, providing an effective way to meet the ESD protection requirement of the 5 V CMOS process.
文摘A novel scalable model of substrate components for deep n-well (DNW) RF MOSFETs with different number of fingers is presented for the first time. The test structure developed in [1] is employed to directly access the characteristics of the substrate to extract the different substrate components. A methodology is developed to directly extract the parameters for the substrate network from the measured data. By using the measured two-port data of a set of nMOSFETs with different number of fingers, with the DNW in grounded and float configuration, respectively, the parameters of the scalable substrate model are obtained. The method and the substrate model are further verified and validated by matching the measured and simulated output admittances. Excellent agreement up to 40 GHz for configurations in common-source has been achieved.
文摘电阻在静电放电(Electrostatic Discharge,ESD)保护电路中,起隔离和分压的作用。利用传输线脉冲(Transmission Line Pulsing,TLP)测试系统,在宽度为100ns的脉冲作用下,研究了n阱扩散电阻在ESD应力下的工作特性。结果表明,n阱扩散电阻在发生初次瞬态击穿(瞬态击穿电压79.0V,瞬态击穿电流1.97A)后,由于阳极n+-n结构被破坏,内部结构已经出现潜在损伤,不再具备隔离和分压的作用。
