The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits wi...The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.展开更多
A multi-component diffusion coating has been developed to protect Mo-based alloys from high temperature environmental attack. Aluminum addition was made during the coating process to improve the oxidation resistance b...A multi-component diffusion coating has been developed to protect Mo-based alloys from high temperature environmental attack. Aluminum addition was made during the coating process to improve the oxidation resistance by developing hexagonal Mo(Si, Al)2 through the development of the halide activated pack cementation coating process on pure Mo substrate. The results show that Mo(Si, Al)2 formed as a main phase on the surface and a little amount of Mo5Si3 also formed. The total thickness of coating is tens ofμm at 1373K. During the cyclic oxidation test at high temperature(at about 1323K in air), mullite (3Al2O3.2SiO2) and some SiO2 formed. The addition of Al is beneficial for MoSi2 coating and the Al-doped coating exhibited only a small weight gain and protected the Mo substrate, while the MoSi2 coating without Al suffered a significant weight loss, indicating a loss of volatile MoO3 after cycles.展开更多
The microstructures and Vickers hardness at room temperature of arc-meltingprocessed intermetallics of Mo_5Si_3-MoSi_2 hypoeutectic alloy and hypereutectic alloy annealed at1200℃ for different time were investigated....The microstructures and Vickers hardness at room temperature of arc-meltingprocessed intermetallics of Mo_5Si_3-MoSi_2 hypoeutectic alloy and hypereutectic alloy annealed at1200℃ for different time were investigated. Lamellar structure consisted of Mo_5Si_3 (D8m) phaseand MoSi_2 (C11_b) phase was observed in all the alloys. For Mo_5Si_3-MoSi_2 hypoeutectic alloy, thelamellar structure was found only after annealing and developed well with fine spacing on the orderof hundred nanometers after annealing at 1200℃ for 48 h. But when the annealing time was up to 96h, the well-developed lamellar structure was destroyed. For Mo_5Si_3-MoSi_2 hypereutectic alloy, thelamellar structure was found both before and after annealing. However the volume fraction andspacing of the lamellar structure did not change significantly before and after annealing. Theeffects of the formation, development and destruction of lamellar structure on Vickers hardness ofalloys were also investigated. When Mo_5Si_3-MoSi_2 hypoeutectic alloy annealed at 1200℃ for 48 h,the Vickers hardness was improved about 19% compared with that without annealing and formation oflamellar structure. The highest Vickers hardness of Mo5Si3-MoSi_2 hypereutectic was increasing about18% when annealing at 1200℃ for 48 h.展开更多
The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The resul...The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The results show that hexagonal Mo(Si, Al)2 as a main phase and a little amount of the lower disilicide Mo5Si3 was formed on Mo substrate through the halide-activated pack cementation method. The resultant Si-Al coating on Mo substrate exhibits excellent cyclic oxidation resistance. The excellent cyclic oxidation resistance of the coatings is attributed to the formation of alumina on the coatings during the oxidation.展开更多
In order to prepare high quality Mo（Si,Al）2 feedstock characterized with C40 phase, higher Al doping amount andexcellent flowability, Mo（Si1-x,Alx）2 with different Al contents （x=0, 0.1, 0.2, 0.3, 0.4, 0.5） were...In order to prepare high quality Mo（Si,Al）2 feedstock characterized with C40 phase, higher Al doping amount andexcellent flowability, Mo（Si1-x,Alx）2 with different Al contents （x=0, 0.1, 0.2, 0.3, 0.4, 0.5） were synthesized by self-propagatinghigh-temperature synthesis first and Mo（Si0.6,Al0.4）2 was confirmed as the suitable material through X-ray diffraction analysis. Aseries of tests with different parameters of induction plasma spheroidization were applied to improving the flowability of feedstock.Mo（Si,Al）2 feedstock with excellent flowability （26.2 s/50 g） was prepared through adding hydrogen into sheath gas and decreasingthe powder feeding rate. The composition segregation occurred in the spheroidized powder after Al consumption and oxidation. Theinhomogeneous structure of the same particle was caused by the asymmetric heating and cooling when particle passed through theplasma jet.展开更多
Mo/Si muitilayer mirrors(30 periods,doublelayer thickness 7nm)with the AZ-PF514 resist pattern whose smallest lines and spaces structure was 0.5pm were etched by reactive ion etching(RIE)in a fluorinated plasma.The et...Mo/Si muitilayer mirrors(30 periods,doublelayer thickness 7nm)with the AZ-PF514 resist pattern whose smallest lines and spaces structure was 0.5pm were etched by reactive ion etching(RIE)in a fluorinated plasma.The etch rate,selectivity and etch profile were investigated as a function of the gas mixture,pressure,and plasma rf power.The groove depth and the etch proHle were investigated by an atomic force microscope before RIE,after RIE and after resist removal.展开更多
文摘The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
文摘A multi-component diffusion coating has been developed to protect Mo-based alloys from high temperature environmental attack. Aluminum addition was made during the coating process to improve the oxidation resistance by developing hexagonal Mo(Si, Al)2 through the development of the halide activated pack cementation coating process on pure Mo substrate. The results show that Mo(Si, Al)2 formed as a main phase on the surface and a little amount of Mo5Si3 also formed. The total thickness of coating is tens ofμm at 1373K. During the cyclic oxidation test at high temperature(at about 1323K in air), mullite (3Al2O3.2SiO2) and some SiO2 formed. The addition of Al is beneficial for MoSi2 coating and the Al-doped coating exhibited only a small weight gain and protected the Mo substrate, while the MoSi2 coating without Al suffered a significant weight loss, indicating a loss of volatile MoO3 after cycles.
文摘The microstructures and Vickers hardness at room temperature of arc-meltingprocessed intermetallics of Mo_5Si_3-MoSi_2 hypoeutectic alloy and hypereutectic alloy annealed at1200℃ for different time were investigated. Lamellar structure consisted of Mo_5Si_3 (D8m) phaseand MoSi_2 (C11_b) phase was observed in all the alloys. For Mo_5Si_3-MoSi_2 hypoeutectic alloy, thelamellar structure was found only after annealing and developed well with fine spacing on the orderof hundred nanometers after annealing at 1200℃ for 48 h. But when the annealing time was up to 96h, the well-developed lamellar structure was destroyed. For Mo_5Si_3-MoSi_2 hypereutectic alloy, thelamellar structure was found both before and after annealing. However the volume fraction andspacing of the lamellar structure did not change significantly before and after annealing. Theeffects of the formation, development and destruction of lamellar structure on Vickers hardness ofalloys were also investigated. When Mo_5Si_3-MoSi_2 hypoeutectic alloy annealed at 1200℃ for 48 h,the Vickers hardness was improved about 19% compared with that without annealing and formation oflamellar structure. The highest Vickers hardness of Mo5Si3-MoSi_2 hypereutectic was increasing about18% when annealing at 1200℃ for 48 h.
文摘The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The results show that hexagonal Mo(Si, Al)2 as a main phase and a little amount of the lower disilicide Mo5Si3 was formed on Mo substrate through the halide-activated pack cementation method. The resultant Si-Al coating on Mo substrate exhibits excellent cyclic oxidation resistance. The excellent cyclic oxidation resistance of the coatings is attributed to the formation of alumina on the coatings during the oxidation.
基金Project (20101101120030) supported by International Graduate Exchange Program of Beijing Institute of Technologysupported by the Research Fund for the doctoral Program of Higher Education of China
文摘In order to prepare high quality Mo（Si,Al）2 feedstock characterized with C40 phase, higher Al doping amount andexcellent flowability, Mo（Si1-x,Alx）2 with different Al contents （x=0, 0.1, 0.2, 0.3, 0.4, 0.5） were synthesized by self-propagatinghigh-temperature synthesis first and Mo（Si0.6,Al0.4）2 was confirmed as the suitable material through X-ray diffraction analysis. Aseries of tests with different parameters of induction plasma spheroidization were applied to improving the flowability of feedstock.Mo（Si,Al）2 feedstock with excellent flowability （26.2 s/50 g） was prepared through adding hydrogen into sheath gas and decreasingthe powder feeding rate. The composition segregation occurred in the spheroidized powder after Al consumption and oxidation. Theinhomogeneous structure of the same particle was caused by the asymmetric heating and cooling when particle passed through theplasma jet.
基金the German Research Society Deutsche Forschungsgesellschaft(Forschergruppe Nanometerschichtsysteme).
文摘Mo/Si muitilayer mirrors(30 periods,doublelayer thickness 7nm)with the AZ-PF514 resist pattern whose smallest lines and spaces structure was 0.5pm were etched by reactive ion etching(RIE)in a fluorinated plasma.The etch rate,selectivity and etch profile were investigated as a function of the gas mixture,pressure,and plasma rf power.The groove depth and the etch proHle were investigated by an atomic force microscope before RIE,after RIE and after resist removal.
