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有源层厚度对MGZO光电晶体管性能的影响
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作者 孙玉轩 高晓红 +2 位作者 王森 王晗 张悦 《吉林建筑大学学报》 CAS 2023年第2期77-83,共7页
室温情况下使用射频磁控溅射设备在100 nm的P型单抛热氧化SiO_(2)上生长镁镓掺杂氧化锌(MGZO)薄膜,并制备成光电晶体管器件.分析MGZO薄膜生长过程中不同有源层厚度对薄膜及器件的影响.使用原子力显微镜(AFM)和扫描电子显微镜(SEM)观察... 室温情况下使用射频磁控溅射设备在100 nm的P型单抛热氧化SiO_(2)上生长镁镓掺杂氧化锌(MGZO)薄膜,并制备成光电晶体管器件.分析MGZO薄膜生长过程中不同有源层厚度对薄膜及器件的影响.使用原子力显微镜(AFM)和扫描电子显微镜(SEM)观察薄膜厚度、表面形貌分析薄膜质量,通过紫外-可见分光光度计(UV-Vis)表征样品的可见光透过率分析其光学特性,使用X射线衍射仪(XRD)分析MGZO薄膜组分.实验结果表明,不同有源层厚度的MGZO薄膜在可见光区域的平均透过率均在95%以上.当有源层厚度为40 nm时MGZO器件的电学性能整体达到最佳,迁移率为8.67 cm^(2)·V^(-1)s^(-1),阈值电压为1.0 V,亚阈值摆幅为0.926 V·dec^(-1),开关电流比达到5.28×10^(7). 展开更多
关键词 mgzo 光电晶体管 磁控溅射 有源层厚度
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Structure and optoelectrical properties of transparent conductive MGZO films deposited by magnetron sputtering
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作者 钟志有 康淮 +2 位作者 陆轴 龙浩 顾锦华 《Optoelectronics Letters》 EI 2018年第1期25-29,共5页
The transparent conductive Mg-Ga co-doped Zn O(MGZO) films were prepared by radio-frequency(RF) magnetron sputtering. The influence of substrate temperature on the structural and optoelectrical properties of the films... The transparent conductive Mg-Ga co-doped Zn O(MGZO) films were prepared by radio-frequency(RF) magnetron sputtering. The influence of substrate temperature on the structural and optoelectrical properties of the films is studied. The results show that all the films possess a preferential orientation along the(002) plane. With the increase of substrate temperature, the structure and optoelectrical properties of the films can be changed. When substrate temperature is 300 ℃, the deposited film exhibits the best crystalline quality and optoelectrical properties, with the minimum micro strain of 1.09×10^(-3), the highest average visible transmittance of 82.42%, the lowest resistivity of 1.62×10^(-3) Ω·cm and the highest figure of merit of 3.18×10~3 Ω^(-1)·cm^(-1). The optical bandgaps of the films are observed to be in the range of 3.342—3.545 eV. The refractive index dispersion curves obey the Sellmeier's dispersion model. 展开更多
关键词 AS Structure and optoelectrical properties of transparent conductive mgzo films deposited by magnetron sputtering
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