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高性能Ag/La_(0.7)Mg_(0.3)MnO_3/p^+-Si阻变器件的研究 被引量:1
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作者 闫帅帅 王华 +2 位作者 许积文 杨玲 陈齐松 《人工晶体学报》 EI CAS CSCD 北大核心 2015年第12期3493-3497,共5页
采用溶胶-凝胶工艺在p型单晶硅衬底上制备了La_(0.7)Mg_(0.3)MnO_3薄膜,对薄膜的微观结构及Ag/La_(0.7)Mg_(0.3)MnO_3/p+-Si器件的电致阻变性能进行了研究。结果表明:La_(0.7)Mg_(0.3)MnO_3薄膜在经过700℃退火2 h后为单一的钙钛矿结构,... 采用溶胶-凝胶工艺在p型单晶硅衬底上制备了La_(0.7)Mg_(0.3)MnO_3薄膜,对薄膜的微观结构及Ag/La_(0.7)Mg_(0.3)MnO_3/p+-Si器件的电致阻变性能进行了研究。结果表明:La_(0.7)Mg_(0.3)MnO_3薄膜在经过700℃退火2 h后为单一的钙钛矿结构,沿(112)晶向择优生长,薄膜致密平整;Ag/La_(0.7)Mg_(0.3)MnO_3/p+-Si阻变器件具有典型的双极型阻变特性,具有非常高的电阻开关比,其高阻态(HRS)与低阻态(LRS)的比值高于105,以及较佳的耐疲劳性能,器件在1000次循环后高、低阻态比值没有明显变化;器件在高阻态(HRS)时的导电机制为Schotty势垒发射效应,低阻态(LRS)导电机制为导电细丝机制。 展开更多
关键词 阻变 la0.7mg0.3mno3 溶胶-凝胶 异质结
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Resistance Switching Behaviour and Properties of Ag/La0.5Mg0.5MnO3/p+-Si with Different Thicknesses of Resistance Films Fabricated through Sol–Gel Method
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作者 YAN Shuaishuai WANG Hua 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2019年第3期568-571,共4页
Ag/La0.5 Mg0.5 MnO3/p+-Si resistance switching device for nonvolatile memory application was fabricated by sol-gel method. The thickness effects of La0.5 Mg0.5 MnO3(LMMO) films on current-voltage(I-V) characterist... Ag/La0.5 Mg0.5 MnO3/p+-Si resistance switching device for nonvolatile memory application was fabricated by sol-gel method. The thickness effects of La0.5 Mg0.5 MnO3(LMMO) films on current-voltage(I-V) characteristics, resistance switching behaviour and endurance characteristics of Ag/LMMO/p+-Si device were investigated. The same crystallisation and phase structure were confirmed in the LMMO films with increased film thickness. The Ag/LMMO/p+-Si device exhibits the typical bipolar resistive switching behaviour. As the LMMO thickness and the stable repetition switching cycle numbers increase, VSet, and VReset of the device will increase, but the RHRS/RLRS will decrease. The Ag/LMMO/p+-Si device with 165 nm thick LMMO films exhibit the best performance, in which the RHRS/RLRS exceeds 104 for 1 000 switching cycles, and its degradation is invisible for more than 106 s. 展开更多
关键词 la0.5mg0.5mno3 thickness RRAM SOL-GEL
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