With in situ optical emission spectroscopy （OES） diagnosis on VHF-generated H2 ＋ SiH4 plasmas,and with the measurements of deposition rate and structure of μc-Si. H thin films fabricated with VHFPECVD technique at...With in situ optical emission spectroscopy （OES） diagnosis on VHF-generated H2 ＋ SiH4 plasmas,and with the measurements of deposition rate and structure of μc-Si. H thin films fabricated with VHFPECVD technique at different substracte temperature, influence of substrate temperature on the deposition of μc-Si.H thin film and on its structural properties have been investigated. The results show that with the increase of substrate temperature,the crystalline volume fraction Xc and average grain size d are enhanced monotonously, but the deposition rate increases firstly and then decreases. The optimized substrate temperature for μc-Si：H thin films deposition under our current growth system is about 210 ℃ ,at which deposition rate O. 8 nm/s of pc-Si;H thin film with Xc-60% and d-9 nm can be obtained.展开更多
The relationship between structure and electronic properties of phosphorus-doped hydrogenated amorphous silicon(a-Si:H) thin films was investigated.Samples with different features were prepared by plasma enhanced chem...The relationship between structure and electronic properties of phosphorus-doped hydrogenated amorphous silicon(a-Si:H) thin films was investigated.Samples with different features were prepared by plasma enhanced chemical vapor deposition(PECVD) at various substrate temperatures.Raman spectroscopy and Fourier transform infrared(FTIR) spectroscopy were used to evaluate the structural evolution,meanwhile,electronic-spin resonance(ESR) and optical measurement were applied to explore the electronic properties of P-doped a-Si:H thin films.The results revealed that the changes in materials structure affect directly the electronic properties and the doping efficiency of dopant.展开更多
A method to control the size of nanoscale silicon grown in thermally annealed hydrogenated amorphous silicon （a-Si：H） films is reported. Using the characterizing techniques of micro-Raman scattering, X-ray diffract...A method to control the size of nanoscale silicon grown in thermally annealed hydrogenated amorphous silicon （a-Si：H） films is reported. Using the characterizing techniques of micro-Raman scattering, X-ray diffraction and computer simulation, it is found that the sizes of the formed silicon particles change with the temperature rising rate in thermally annealing the a-Si ： H films. When the a-Si：H films have been annealed with high rising rate（～100℃/s）, the sizes of nanoscale silicon particles are in the range of 1.6～15nm. On the other hand, if the a-Si：H films have been annealed with low temperature rising rate（～1℃/s）, the sizes of nanoscale silicon particles are in the range of 23～46nm. Based on the theory of crystal nucleation and growth, the effect of temperature rising rate on the sizes of the formed silicon particles is discussed. Under high power laser irradiation, in situ nanocrystallization and subsequent nc-Si clusters are small enough for visible light emission, authors have not detected any visible photoluminescence（PL） from these nc-Si clusters before surface passivation. After electrochemical oxidization in hydrofluoric acid, however, intense red PL has been detected. Cyclic hydrofluoric oxidization and air exposure can cause subsequent blue shift in the red emission. The importance of surface passivation and quantum confinement in the visible emissions has been discussed.展开更多
文摘With in situ optical emission spectroscopy （OES） diagnosis on VHF-generated H2 ＋ SiH4 plasmas,and with the measurements of deposition rate and structure of μc-Si. H thin films fabricated with VHFPECVD technique at different substracte temperature, influence of substrate temperature on the deposition of μc-Si.H thin film and on its structural properties have been investigated. The results show that with the increase of substrate temperature,the crystalline volume fraction Xc and average grain size d are enhanced monotonously, but the deposition rate increases firstly and then decreases. The optimized substrate temperature for μc-Si：H thin films deposition under our current growth system is about 210 ℃ ,at which deposition rate O. 8 nm/s of pc-Si;H thin film with Xc-60% and d-9 nm can be obtained.
基金supported by the Fundamental Research Funds for the Central Universities
文摘The relationship between structure and electronic properties of phosphorus-doped hydrogenated amorphous silicon(a-Si:H) thin films was investigated.Samples with different features were prepared by plasma enhanced chemical vapor deposition(PECVD) at various substrate temperatures.Raman spectroscopy and Fourier transform infrared(FTIR) spectroscopy were used to evaluate the structural evolution,meanwhile,electronic-spin resonance(ESR) and optical measurement were applied to explore the electronic properties of P-doped a-Si:H thin films.The results revealed that the changes in materials structure affect directly the electronic properties and the doping efficiency of dopant.
文摘A method to control the size of nanoscale silicon grown in thermally annealed hydrogenated amorphous silicon （a-Si：H） films is reported. Using the characterizing techniques of micro-Raman scattering, X-ray diffraction and computer simulation, it is found that the sizes of the formed silicon particles change with the temperature rising rate in thermally annealing the a-Si ： H films. When the a-Si：H films have been annealed with high rising rate（～100℃/s）, the sizes of nanoscale silicon particles are in the range of 1.6～15nm. On the other hand, if the a-Si：H films have been annealed with low temperature rising rate（～1℃/s）, the sizes of nanoscale silicon particles are in the range of 23～46nm. Based on the theory of crystal nucleation and growth, the effect of temperature rising rate on the sizes of the formed silicon particles is discussed. Under high power laser irradiation, in situ nanocrystallization and subsequent nc-Si clusters are small enough for visible light emission, authors have not detected any visible photoluminescence（PL） from these nc-Si clusters before surface passivation. After electrochemical oxidization in hydrofluoric acid, however, intense red PL has been detected. Cyclic hydrofluoric oxidization and air exposure can cause subsequent blue shift in the red emission. The importance of surface passivation and quantum confinement in the visible emissions has been discussed.
