DyPt2 films were prepared by alternate deposition thin Dy and Pt layers on glass substrates by DC magneto controlled sputtering method. The XRD data indicated that for as-deposited Dy/Pt films, and the periodic layere...DyPt2 films were prepared by alternate deposition thin Dy and Pt layers on glass substrates by DC magneto controlled sputtering method. The XRD data indicated that for as-deposited Dy/Pt films, and the periodic layered structures along thickness direction were evidenced with low angle X-ray scattering. With increasing annealing temperature, the compounds of DyPt, DyPt2 and DyPt3 were formed successively at temperature ranging from 300 to 400 ℃. It was found that the composition reaction DyPt+DyPt3→2DyPt2 took place at 500 ℃. After annealing at 500 ℃ for 1 h, the compounds DyPt and DyPt3 transformed completely into the DyPt2 compound.展开更多
基金Project supported bythe National Natural Science Foundation of China (50261002 ,50661002)Natural Science Foundaion of Guangxi Province (0575093)
文摘DyPt2 films were prepared by alternate deposition thin Dy and Pt layers on glass substrates by DC magneto controlled sputtering method. The XRD data indicated that for as-deposited Dy/Pt films, and the periodic layered structures along thickness direction were evidenced with low angle X-ray scattering. With increasing annealing temperature, the compounds of DyPt, DyPt2 and DyPt3 were formed successively at temperature ranging from 300 to 400 ℃. It was found that the composition reaction DyPt+DyPt3→2DyPt2 took place at 500 ℃. After annealing at 500 ℃ for 1 h, the compounds DyPt and DyPt3 transformed completely into the DyPt2 compound.
