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多量子势垒双阻挡层结构对AlGaN基深紫外激光二极管的性能优化 被引量:1
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作者 王梦真 王瑶 +4 位作者 魏士钦 王芳 全智 刘俊杰 刘玉怀 《原子与分子物理学报》 CAS 北大核心 2022年第2期141-146,共6页
为提高AlGaN基深紫外激光二极管(Deep Ultraviolet Laser Diodes,DUV-LD)有源区内载流子浓度,减少载流子泄露,提出一种DUV-LD双阻挡层结构,相对于传统的单一电子阻挡层(Electron Blocking Layer,EBL)结构,又引入一空穴阻挡层(Hole Block... 为提高AlGaN基深紫外激光二极管(Deep Ultraviolet Laser Diodes,DUV-LD)有源区内载流子浓度,减少载流子泄露,提出一种DUV-LD双阻挡层结构,相对于传统的单一电子阻挡层(Electron Blocking Layer,EBL)结构,又引入一空穴阻挡层(Hole Blocking Layer,HBL),仿真结果证明空穴阻挡层的应用能很好地减少空穴泄漏.同时又对双阻挡层改用五周期Al_(0.98)Ga_(0.02)N/Al_(0.9)Ga_(0.1)N多量子势垒层结构,结果显示与矩形EBL和HBL激光二极管相比,多量子势垒EBL和HBL激光二极管有更好的斜率效率,并且有源区内电子和空穴载流子浓度以及辐射复合速率都有效提高,其中多量子势垒EBL在阻挡电子泄露方面效果更显著. 展开更多
关键词 多量子势垒 双阻挡层 深紫外激光二极管 载流子泄露
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Performance improvement of AlGaN-based deep ultraviolet light-emitting diodes with double electron blocking layers 被引量:4
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作者 张诚 孙慧卿 +4 位作者 李旭娜 孙浩 范宣聪 张柱定 郭志友 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第2期538-543,共6页
The AlGaN-based deep ultraviolet light-emitting diodes(LED) with double electron blocking layers(d-EBLs) on both sides of the active region are investigated theoretically. They possess many excellent performances ... The AlGaN-based deep ultraviolet light-emitting diodes(LED) with double electron blocking layers(d-EBLs) on both sides of the active region are investigated theoretically. They possess many excellent performances compared with the conventional structure with only a single electron blocking layer, such as a higher recombination rate, improved light output power and internal quantum efficiency(IQE). The reasons can be concluded as follows. On the one hand, the weakened electrostatic field within the quantum wells(QWs) enhances the electron–hole spatial overlap in QWs, and therefore increases the probability of radioactive recombination. On the other hand, the added n-AlGaN layer can not only prevent holes from overflowing into the n-side region but also act as another electron source, providing more electrons. 展开更多
关键词 double electron blocking layers ultraviolet light-emitting diodes n-A1GaN electrostatic field
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Study on characteristics of a double-conductible channel organic thin-film transistor with an ultra-thin hole-blocking layer
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作者 袁广才 徐征 +4 位作者 赵谡玲 张福俊 许娜 田雪雁 徐叙瑢 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第9期3990-3994,共5页
The properties of top-contact organic thin-film transistors (TC-OTFTs) using ultra-thin 2, 9-dimethyl-4, 7- diphenyl-1, 10-phenanthroline (BCP) as a hole-blocking interlayer have been improved significantly and a ... The properties of top-contact organic thin-film transistors (TC-OTFTs) using ultra-thin 2, 9-dimethyl-4, 7- diphenyl-1, 10-phenanthroline (BCP) as a hole-blocking interlayer have been improved significantly and a BCP interlayer was inserted into the middle of the pentacene active layer. This paper obtains a fire-new transport mode of an OTFT device with double-conductible channels. The accumulation and transfer of the hole carriers arc limited by the BCP interlayer in the vertical region of the channel. A huge amount of carriers is located not only at the interface between pentacene and the gate insulator, but also at the two interfaces of pentacene/BCP interlayer and pentacene/gate insulator, respectively. The results suggest that the BCP interlayer may be useful to adjust the hole accumulation and transfer, and can increase the hole mobility and output current of OTFTs. The TC-OTFTs with a BCP interlayer at VDS = --20 V showed excellent hole mobility μFE and threshold voltage VTH of 0.58 cm^2/(V-s) and -4.6 V, respectively. 展开更多
关键词 organic thin-film transistor ultra-thin hole-blocking layer double-conductible channels
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