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304不锈钢表面Cr/a-C:H薄膜的制备及其抗腐蚀性能
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作者 刘龙 周升国 +2 位作者 刘正兵 王跃臣 马利秋 《材料保护》 CAS CSCD 北大核心 2016年第8期46-48,8,共3页
采用直流反应磁控溅射技术在304不锈钢表面制备Cr/a-C:H薄膜进行表面改性,有望提高其在NaCl溶液中的耐蚀性能。采用Raman光谱仪、X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)和原子力显微镜(AFM)研究了Cr/a-C:H薄膜的微观结构和表面形... 采用直流反应磁控溅射技术在304不锈钢表面制备Cr/a-C:H薄膜进行表面改性,有望提高其在NaCl溶液中的耐蚀性能。采用Raman光谱仪、X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)和原子力显微镜(AFM)研究了Cr/a-C:H薄膜的微观结构和表面形貌;利用接触角测量仪和动电位极化曲线研究了304不锈钢表面沉积Cr/a-C:H薄膜前后的润湿性和抗腐蚀性能。结果表明:所制备薄膜为Cr_3C_2纳米晶镶嵌非晶碳的典型纳米晶/非晶复合薄膜;薄膜表面光滑、结构均匀致密;沉积Cr/a-C:H薄膜后304不锈钢表面由亲水性转为疏水性,水接触角达到95°;在3.5%NaCl溶液中304不锈钢表面沉积Cr/a-C:H薄膜体系的自腐蚀电位约为-0.06 V,腐蚀电流密度为2.95×10^(-8)A/cm^2,极化电阻为14.07×10~5Ω·cm^2,相比于表面无薄膜防护的304不锈钢,该体系的抗腐蚀性能得到明显提升。 展开更多
关键词 304不锈钢 磁控溅射 cr/a-c:h薄膜 抗腐蚀性能
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The Effect of Nitrogen Gas Flow Rate on the Cr-Containing DLC (Diamond-Like Carbon) Coating by AEGD Hybrid-CVD Coating Process 被引量:1
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作者 Yong-Ki Cho Jae-Hoon Lee +1 位作者 Masahiro Okumiya Sang-Gweon Kim 《Advances in Materials Physics and Chemistry》 2017年第5期198-211,共14页
The development of electric and hybrid automobiles has gained momentum with the growth of interest in the field of miniaturization of electrode materials. In particular, technologies that improve the electrical proper... The development of electric and hybrid automobiles has gained momentum with the growth of interest in the field of miniaturization of electrode materials. In particular, technologies that improve the electrical property of stainless steel, while maintaining corrosion resistance, are gaining interest in terms of maintaining specific resistivity. The study on metal doping in diamond-like carbon coating is currently in progress to enhance the characteristics of conductivity and corrosion resistance with excellent properties such as corrosion resistance and lubrication coating. It is the process of using Cr arc with DLC coating to actuate AEGD. The change of I(D)/I(G) (Graphite peak (G) and disordered bond peak (D)) ratio and G-peak position in Cr-containing DLC film causes graphitization and thus lowers the basic electric resistance. Simultaneous input of nitrogen gas leads to deposition of CrN by a specific ratio of Cr and N in the DLC coating, and the nitrogen atoms replace hydrogen in bonding to increase the sp3 bond structure in the DLC film, in which CrN is not deposited, to result in specific resistivity of a specific value or less. 展开更多
关键词 cr(N)-c:h film Nitrogen DOPING Graphitic carbon Electrical RESISTIVITY Plasma cVD Arc Enhanced GLOW Discharge (AEGD)
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