Metasurface optics have demonstrated vast potential for implementing traditional optical components in an ultracompact and lightweight form factor.Metasurfaces,however,suffer from severe chromatic aberrations,posing s...Metasurface optics have demonstrated vast potential for implementing traditional optical components in an ultracompact and lightweight form factor.Metasurfaces,however,suffer from severe chromatic aberrations,posing serious limitations on their practical use.Eixisting approaches for circumventing this involving dispersion engineering are limited to small apertures and often entail multiple scatterers per unit cell with small feature sizes.Here,we prescnt an alternative technique to mitigatc chromatic aberration and demonstrate high-quality,full-color imaging using extended depth of focus(EDOF)metalenses and computational reconstruction.Previous EDOF metalenses have relied on cubic phase masks,where the image quality suffers from asymmetric artefacts.Here we demonstrate the use of rotationally symmetric masks,including logarithmic-aspherical,and shifted axicon masks,to mitigate this problem.Our work will inspire further development in achromatic metalenses beyond dispersion engineering and hybrid optical-digital metasurface systems.展开更多
基金UW Reality LabGoogle+5 种基金FaccbookFutureweiAmazonSamsung Advanced Institute of TechnologyNationalScience Foundation(NSF-1825308)Part of this work was conducted at the Washington Nanofabrication Facility/Molecular Analysis Facility,a National Nanotechnology Coordinated Infrastructure(NNCI)sitc ar thc University of Washington,which is supported in part by funds from the National Sceience Foundation(NNCI-1542101,1337840,and 0335765),the Narional Institures of Health,the Molecular Engineering&Sciences Institute,the Clean Energy Institute,the Washington Research Foundation,the M.J.Murdock Charitable Trust,Altarech,Class One Technology,GCE Market,Google,and SPTS.
文摘Metasurface optics have demonstrated vast potential for implementing traditional optical components in an ultracompact and lightweight form factor.Metasurfaces,however,suffer from severe chromatic aberrations,posing serious limitations on their practical use.Eixisting approaches for circumventing this involving dispersion engineering are limited to small apertures and often entail multiple scatterers per unit cell with small feature sizes.Here,we prescnt an alternative technique to mitigatc chromatic aberration and demonstrate high-quality,full-color imaging using extended depth of focus(EDOF)metalenses and computational reconstruction.Previous EDOF metalenses have relied on cubic phase masks,where the image quality suffers from asymmetric artefacts.Here we demonstrate the use of rotationally symmetric masks,including logarithmic-aspherical,and shifted axicon masks,to mitigate this problem.Our work will inspire further development in achromatic metalenses beyond dispersion engineering and hybrid optical-digital metasurface systems.
