Y-modified Cr-Al coatings were co-deposited on DZ125 alloy by a pack cementation process,and the microstructures,constituent phases,and formation mechanisms of the obtained coatings were studied.The oxidation resistan...Y-modified Cr-Al coatings were co-deposited on DZ125 alloy by a pack cementation process,and the microstructures,constituent phases,and formation mechanisms of the obtained coatings were studied.The oxidation resistance of the coatings was also investigated.The experimental results show that the coating prepared by co-depositing Cr-Al-Y at 1050℃for 2 h has a multi-layered structure with an outer layer composed of Cr and Ni_(3)Cr_(2),a middle layer composed of Ni_(3)Cr_(2) and Al_(13)Co_(4),and an inner layer composed of Ni_(3)Al.The co-deposited Y is mainly present in the outer and middle layers of the coating.The coating formation process follows a sequential deposition mechanism in which Al is deposited during the initial stage,followed by Cr deposition.After oxidation at 1100℃for 100 h,a dense Cr_(2)O_(3)·Al_(2)O_(3) scale forms on the obtained coating,which effectively protects the DZ125 alloy from oxidation by preventing the inward diffusion of oxygen.展开更多
The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under...The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.展开更多
基金Funded by the Basic Scientific Research of the North Minzu University(FWNX42)the Natural Science Foundation of Ningxia(2020AAC02025)+1 种基金the National Natural Science Foundation of China(51961003 and 52161009)the Ningxia Youth Talents Supporting Program(TJGC2019040)。
文摘Y-modified Cr-Al coatings were co-deposited on DZ125 alloy by a pack cementation process,and the microstructures,constituent phases,and formation mechanisms of the obtained coatings were studied.The oxidation resistance of the coatings was also investigated.The experimental results show that the coating prepared by co-depositing Cr-Al-Y at 1050℃for 2 h has a multi-layered structure with an outer layer composed of Cr and Ni_(3)Cr_(2),a middle layer composed of Ni_(3)Cr_(2) and Al_(13)Co_(4),and an inner layer composed of Ni_(3)Al.The co-deposited Y is mainly present in the outer and middle layers of the coating.The coating formation process follows a sequential deposition mechanism in which Al is deposited during the initial stage,followed by Cr deposition.After oxidation at 1100℃for 100 h,a dense Cr_(2)O_(3)·Al_(2)O_(3) scale forms on the obtained coating,which effectively protects the DZ125 alloy from oxidation by preventing the inward diffusion of oxygen.
基金supported by a 2-Year Research Grant of Pusan National University,Korea
文摘The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.
