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Experimental Investigation of the Anisotropic Thermal Conductivity of C/SiC Composite Thin Slab
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作者 毋克凡 张虎 唐桂华 《Chinese Physics Letters》 SCIE EI CAS CSCD 2024年第3期48-60,共13页
Fiber-reinforced composites possess anisotropic mechanical and heat transfer properties due to their anisotropic fibers and structure distribution.In C/Si C composites,the out-of-plane thermal conductivity has mainly ... Fiber-reinforced composites possess anisotropic mechanical and heat transfer properties due to their anisotropic fibers and structure distribution.In C/Si C composites,the out-of-plane thermal conductivity has mainly been studied,whereas the in-plane thermal conductivity has received less attention due to their limited thickness. 展开更多
关键词 cOMPOsiTES c/si ANISOTROPIc
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硅钢中碳和硅的火花源原子发射光谱分析 被引量:6
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作者 廖义兵 黄荣青 +2 位作者 傅韬 梁晓兰 马蔚清 《冶金分析》 CAS CSCD 北大核心 2004年第z1期45-47,共3页
在选定的分析条件下,对硅钢中的C,Si进行火花源原子射光谱分析.
关键词 火花源原子发射光谱仪 硅钢 c:si
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C/SiC复合材料钻削工具载荷及磨损研究 被引量:5
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作者 丁凯 傅玉灿 +2 位作者 苏宏华 徐鸿翔 崔方方 《工具技术》 北大核心 2016年第7期15-19,共5页
采用HAM PCD焊刃麻花钻、KENNA CVD涂层麻花钻、金刚石套料钻(普通钻削与超声辅助钻削两种方法)三种工具对C/Si C复合材料进行了钻削试验,并对工具磨损情况、钻削力及扭矩进行了对比分析。结果表明:累计钻削深度lT=160mm后,套料钻普通... 采用HAM PCD焊刃麻花钻、KENNA CVD涂层麻花钻、金刚石套料钻(普通钻削与超声辅助钻削两种方法)三种工具对C/Si C复合材料进行了钻削试验,并对工具磨损情况、钻削力及扭矩进行了对比分析。结果表明:累计钻削深度lT=160mm后,套料钻普通钻削、超声辅助钻削磨损程度较轻,而HAM PCD焊刃麻花钻,KENNA CVD涂层麻花钻磨损严重。不同工具钻削加工时钻削力及扭矩随着工艺条件的变化呈现不同的变化趋势;采用套料钻加工时,与普通钻削相比,超声辅助钻削可有效降低钻削力及扭矩,最大降低幅度分别达到23%、56%。整体而言,套料钻超声辅助钻削加工时钻削力及扭矩较小、工具磨损较轻,是一种适合于C/Si C复合材料制孔的工艺方法。 展开更多
关键词 c/si c复合材料 钻削 超声辅助钻削 工具磨损 钻削力 扭矩
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Reversing Site-Selectivity in Formal Cross-Dimerization of Benzocyclobutenones and Silacyclobutanes
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作者 Jinyu Zhang Deng Pan +3 位作者 Hao-Xiang Zhang Nuo Yan Xiao-Song Xue Dongbing Zhao 《CCS Chemistry》 CSCD 2023年第8期1753-1762,共10页
Formal cross-dimerization of two different strained rings represents an innovative strategy toward specific ring systems that are otherwise inaccessible.Yet,formidable challenges remain in controlling the reactivity a... Formal cross-dimerization of two different strained rings represents an innovative strategy toward specific ring systems that are otherwise inaccessible.Yet,formidable challenges remain in controlling the reactivity and site-selectivity.Herein,we realized the reversal of site-selectivity in formal crossdimerization of benzocyclobutenones(BCBs)and silacyclobutanes(SCBs)by development of a nickel/magnesium synergistic catalytic system,in which the C(sp3)−C(carbonyl)bond of BCBs was exclusively cleaved,providing previously inaccessible eight-membered benzosilacycles.The catalytic cycle,the origin of this unconventional site-selectivity,and the role of MgCl2 have explicitly been elucidated by density functional theory calculations.Combined experimental and computational studies have clearly illustrated that the C1-C8 cleavage selectivity of BCBs in our reaction are mainly attributed to both the steric hindrance by introduction of substituents at the C3-and the proper choice of the Ni/Mg synergistic catalytic system. 展开更多
关键词 ring expansion silacycles c-si bond cleavage c-c bond cleavage nickel catalysis
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Improving intrinsic stability for perovskite/silicon tandem solar cells
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作者 Tailai Xu Yihua Chen Qi Chen 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2023年第1期85-105,共21页
Monolithic hybrid halide perovskite/crystalline silicon(c-Si)tandem solar cells have demonstrated their great potential to surpass the theoretical efficiency limit of single-junction devices.However,the stability of p... Monolithic hybrid halide perovskite/crystalline silicon(c-Si)tandem solar cells have demonstrated their great potential to surpass the theoretical efficiency limit of single-junction devices.However,the stability of perovskite sub-cells is inferior to that of the c-Si solar cells that have been commercialized,casting serious doubt about the lifetime of the entire device.During device operation,light and heat are inevitable,which requires special attention.Herein,we review the current understandings of the intrinsic stability of perovskite/c-Si tandems upon light and/or heat aging.First,we summarize the recent understandings regarding light facilitated ion migration,materials decomposition,and phase segregation.In addition,the reverse bias effect on the stability of tandem modules caused by uneven illumination is discussed.Second,this review also summarizes the thermalinduced degradation and mismatch issue,which underlines the system design of perovskite/c-Si tandems.Third,recent strategies to improve the intrinsic stability of perovskite/c-Si tandems under light and/or heat are reviewed,such as composition engineering,crystallinity enhancement,interface modification,material optimization,and device structure modification.At last,we present several potential research directions that have been overlooked,and hope those are helpful for future research on perovskite based tandem solar cells. 展开更多
关键词 PEROVSKITE c-si tandem solar cell light stability thermal stability photovoltaic module
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基于一维光子晶体陷光的超薄晶硅太阳电池光学结构优化 被引量:4
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作者 陆晓东 张鹏 +4 位作者 周涛 赵洋 王泽来 吕航 张明 《人工晶体学报》 EI CAS CSCD 北大核心 2014年第11期2918-2922,2934,共6页
先选择增透膜、Ag底面反射镜和三角带型一维光子晶体结构作为超薄晶硅电池(有源层厚度为12μm)的陷光结构,然后利用有限差分频域法对这一陷光结构进行了优化,最后通过吸收光谱和光电流密度谱对优化的陷光结构性能进行了评估。计算表明:... 先选择增透膜、Ag底面反射镜和三角带型一维光子晶体结构作为超薄晶硅电池(有源层厚度为12μm)的陷光结构,然后利用有限差分频域法对这一陷光结构进行了优化,最后通过吸收光谱和光电流密度谱对优化的陷光结构性能进行了评估。计算表明:在300 nmλ800 nm的波长范围内,优化陷光结构实现了Yablonovith陷光极限;在800 nmλ1100 nm的波长范围内,该优化陷光结构的性能略低于Yablonovith陷光极限,但明显高于矩形条带式一维光子晶体陷光结构的陷光性能。 展开更多
关键词 太阳电池 晶硅 陷光结构 光子晶体
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An industrial solution to light-induced degradation of crystalline silicon solar cells 被引量:2
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作者 Meng XIE Changrui REN +3 位作者 Liming FU Xiaodong QIU Xuegong YU Deren YANG 《Frontiers in Energy》 SCIE CSCD 2017年第1期67-71,共5页
Boron-oxygen defects can cause serious lightinduced degradation (LID) of commercial solar cells based on the boron-doped crystalline silicon (c-Si), which are formed under the injection of excess carriers induced ... Boron-oxygen defects can cause serious lightinduced degradation (LID) of commercial solar cells based on the boron-doped crystalline silicon (c-Si), which are formed under the injection of excess carriers induced either by illumination or applying forward bias. In this contribution, we have demonstrated that the passivation process of boron-oxygen defects can be induced by applying forward bias for a large quantity of solar cells, which is much more economic than light illumination. We have used this strategy to trigger the passivation process of batches of aluminum back surface field (A1-BSF) solar cells and passivated emitter and rear contact (PERC) solar cells. Both kinds of the treated solar cells show high stability in efficiency and suffer from very little LID under further illumination at room temperature. This technology is of significance for the suppression of LID of c-Si solar cells for the industrial manufacture. 展开更多
关键词 Boron-oxygen defects c-si solar cells lightinduced degradation PASsiVATION forward bias
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Thin Film Characterization Using Rotating Polarizer Analyzer Ellipsometer with a Speed Ratio 1:3 被引量:1
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作者 Sofyan A. Taya Taher M. El-Agez Anas A. Alkanoo 《Journal of Electromagnetic Analysis and Applications》 2011年第9期351-358,共8页
In a recent previous work, we proposed a rotating polarizer-analyzer ellipsometer (RPAE) in which the two elements are rotating synchronously in the same direction with a speed ratio 1:3. We applied this technique to ... In a recent previous work, we proposed a rotating polarizer-analyzer ellipsometer (RPAE) in which the two elements are rotating synchronously in the same direction with a speed ratio 1:3. We applied this technique to bulk samples. In this work, we present theoretically the characterization of 100 nm SiO2 thin film using this spectroscopic RPAE. We assume a structure consisting of air (ambient)/SiO2 (thin film)/c-Si (substrate). The ellipsometric parameters ψ and Δ are calculated when a clean signal is received by the detector and when a hypothetical noise is imposed on this signal. The film thickness and the optical constants of the film are calculated for the noisy signal in the spectrum range 200 - 800 nm. The results are compared with the proposed thickness and with the accepted values for SiO2 optical constants. 展开更多
关键词 ELLIPSOMETRY ROTATING Polarizer-Analyzer ELLIPSOMETER Thin Film cHARAcTERIZATION Optical constants c-si siO2
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热压工艺对硅掺杂碳复合靶材的性能影响研究
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作者 白雪 刘宇阳 +3 位作者 桂涛 王星奇 杨磊 王星明 《稀有金属》 EI CAS CSCD 北大核心 2022年第4期538-544,共7页
以碳粉、碳化硅粉体为原料,添加不同含量的硅粉为烧结助剂,在不同的热压工艺参数下制备C/Si 80%/20%(原子分数)复合靶材,通过扫描电镜(SEM)分析微观形貌、四探针测试电阻率、X射线衍射(XRD)分析晶体结构、压汞法测试气孔分布,分析Si粉... 以碳粉、碳化硅粉体为原料,添加不同含量的硅粉为烧结助剂,在不同的热压工艺参数下制备C/Si 80%/20%(原子分数)复合靶材,通过扫描电镜(SEM)分析微观形貌、四探针测试电阻率、X射线衍射(XRD)分析晶体结构、压汞法测试气孔分布,分析Si粉的添加量、液相保温时间、原料预处理工艺对靶材致密化和均匀性的影响,优化硅碳复合(C/Si 80%/20%)靶材的热压烧结工艺。结果如下:(1)随着Si粉添加量增加,体系中液相含量增加,扩散传质速率加快,硅碳化合反应生成3C-SiC,体系中的Si元素全部以3C-SiC的形式存在,靶材的致密度逐渐增加,Si粉添加量为14%时,靶材的密度达到2.51 g·cm^(-3);开孔孔径分布随Si粉添加量的增加而逐渐减小至20 nm以下;靶材电阻率随Si粉添加量的增加而逐渐降低,Si粉添加量为14%时,电阻率降低50%。(2)在1350~1450℃,随着液相保温时间的增加,硅元素挥发并逸出,产生反致密化的现象,Si含量越高,反致密化越明显,密度降低至2.2 g·cm^(-3)。(3)采用SiC/C/Si 6%/74%/14%组分体系,C/Si预球磨48 h后再添加纳米SiC粉体继续球磨2 h制备复合原料粉体,在1980℃,70 MPa下,液相保温时间为1 h 15 min所制备靶材致密度达到2.51 g·cm^(-3),组织结构均匀,形貌呈层片状生长,无闭合气孔,电阻率最低为2.06×10^(-3)Ω·cm。 展开更多
关键词 硅粉 液相烧结 靶材 热压 c/si
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Research on ZnO/Si heterojunction solar cells 被引量:1
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作者 Li Chen Xinliang Chen +2 位作者 Yiming Liu Ying Zhao Xiaodan Zhang 《Journal of Semiconductors》 EI CAS CSCD 2017年第5期62-72,共11页
We put forward an n-ZnO/p-Si heterojunction solar cell model based on AFORS-HET simulations and provide experimental support in this article.ZnO:B(B-doped ZnO) thin films deposited by metal-organic chemical vapor d... We put forward an n-ZnO/p-Si heterojunction solar cell model based on AFORS-HET simulations and provide experimental support in this article.ZnO:B(B-doped ZnO) thin films deposited by metal-organic chemical vapor deposition(MOCVD) are planned to act as electrical emitter layer on p-type c-Si substrate for photovoltaic applications.We investigate the effects of thickness,buffer layer,ZnO:B affinity and work function of electrodes on performances of solar cells through computer simulations using AFORS-HET software package.The energy conversion efficiency of the ZnO:B(n)/ZnO/c-Si(p) solar cell can achieve 17.16%(V(oc):675.8 mV,J(sc):30.24 mA/cm^2,FF:83.96%) via simulation.On a basis of optimized conditions in simulation,we carry out some experiments,which testify that the ZnO buffer layer of 20 nm contributes to improving performances of solar cells.The influences of growth temperature,thickness and diborane(B2H6) flow rates are also discussed.We achieve an appropriate condition for the fabrication of the solar cells using the MOCVD technique.The obtained conversion efficiency reaches2.82%(V(oc):294.4 mV,J(sc):26.108 mA/cm^2,FF:36.66%). 展开更多
关键词 textured surface ZnO films p-type c-si substrates MOcVD technique AFORS-HET software solar cells
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Engineering in-plane silicon nanowire springs for highly stretchable electronics 被引量:1
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作者 Zhaoguo Xue Taige Dong +3 位作者 Zhimin Zhu Yaolong Zhao Ying Sun Linwei Yu 《Journal of Semiconductors》 EI CAS CSCD 2018年第1期2-15,共14页
Crystalline silicon(c-Si) is unambiguously the most important semiconductor that underpins the development of modern microelectronics and optoelectronics, though the rigid and brittle nature of bulk c-Si makes it di... Crystalline silicon(c-Si) is unambiguously the most important semiconductor that underpins the development of modern microelectronics and optoelectronics, though the rigid and brittle nature of bulk c-Si makes it difficult to implement directly for stretchable applications. Fortunately, the one-dimensional(1 D) geometry, or the line-shape, of Si nanowire(SiNW) can be engineered into elastic springs, which indicates an exciting opportunity to fabricate highly stretchable 1 D c-Si channels. The implementation of such line-shape-engineering strategy demands both a tiny diameter of the SiNWs, in order to accommodate the strains under large stretching, and a precise growth location, orientation and path control to facilitate device integration. In this review, we will first introduce the recent progresses of an in-plane self-assembly growth of SiNW springs, via a new in-plane solid-liquidsolid(IPSLS) mechanism, where mono-like but elastic SiNW springs are produced by surface-running metal droplets that absorb amorphous Si thin film as precursor. Then, the critical growth control and engineering parameters, the mechanical properties of the SiNW springs and the prospects of developing c-Si based stretchable electronics, will be addressed. This efficient line-shape-engineering strategy of SiNW springs, accomplished via a low temperature batch-manufacturing, holds a strong promise to extend the legend of modern Si technology into the emerging stretchable electronic applications, where the high carrier mobility, excellent stability and established doping and passivation controls of c-Si can be well inherited. 展开更多
关键词 c-si nanowires in-plane solid-liquid-solid self-assembly stretchable electronics
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Status of Selective Emitters for p-Type c-Si Solar Cells 被引量:1
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作者 Mohammad Ziaur Rahman 《Optics and Photonics Journal》 2012年第2期129-134,共6页
Crystalline silicon (c-Si) solar cells have the lion share in world PV market. Solar cells made from crystalline silicon have lower conversion efficiency, hence optimization of each process steps are very important. A... Crystalline silicon (c-Si) solar cells have the lion share in world PV market. Solar cells made from crystalline silicon have lower conversion efficiency, hence optimization of each process steps are very important. Achieving low-cost photovoltaic energy in the coming years will depend on the development of third-generation solar cells. Given the trend towards these Si materials, the most promising selective emitter methods are identified to date. Current industrial monocrystalline Cz Si solar cells based on screen-printing technology for contact formation and homogeneous emitter have an efficiency potential of around 18.4%. Limitations at the rear side by the fully covering Al-BSF can be changed by selective emitter designs allowing a decoupling and separate optimization of the metallised and non-metallised areas. Several selective emitter concepts that are already in industrial mass production or close to it are presented, and their specialties and status concerning cell performance are demonstrated. Key issues that are considered here are the cost-effectiveness, added complexity, additional benefits, reliability and efficiency potential of each selective emitter tech- niques. 展开更多
关键词 Solar cell SELEcTIVE EMITTER Efficiency c-si
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银基钎料活性钎焊C/SiC-Ti55与Al_2O_3-Ti55接头界面组织 被引量:1
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作者 沈元勋 李正林 +2 位作者 郝传勇 张劲松 龙伟民 《焊接学报》 EI CAS CSCD 北大核心 2017年第9期75-78,共4页
以Ag-28Cu和Ag-9Pd-9Ga两种银基钎料钎焊C/SiC复合材料和Al_2O_3陶瓷与Ti55钛合金接头,考察了钎料和钎焊工艺对接头焊缝组织形貌变化影响.结果表明,采用Ag-28Cu钎料在850~920℃温度区间钎焊C/SiCTi55和Al_2O_3-Ti55接头均在陶瓷基体近... 以Ag-28Cu和Ag-9Pd-9Ga两种银基钎料钎焊C/SiC复合材料和Al_2O_3陶瓷与Ti55钛合金接头,考察了钎料和钎焊工艺对接头焊缝组织形貌变化影响.结果表明,采用Ag-28Cu钎料在850~920℃温度区间钎焊C/SiCTi55和Al_2O_3-Ti55接头均在陶瓷基体近钎焊界面区域开裂,原因为Ti55合金中Ti元素大量溶解扩散并与铜反应生成的大量脆性Cu-Ti化合物恶化焊缝塑性.Ag-9Pd-9Ga钎料则可以获得完整接头,钎焊过程中Pd,Ga元素在Ti55侧钎焊界面富集并与Ti元素反应生成PdTi,Ti2Ga,Ti4Pd化合物的反应层,有效抑制了元素往焊缝中的溶解扩散. 展开更多
关键词 c/si c复合材料 AL2O3陶瓷 钛合金 界面组织 扩散
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C/SiC复合材料的在线气相穿刺连接 被引量:1
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作者 童巧英 成来飞 《电子元件与材料》 CAS CSCD 北大核心 2014年第11期77-80,共4页
提出了一种C/SiC复合材料的连接方法:在线气相穿刺连接。该方法是在C/SiC复合材料制备的最后一步——SiC沉积过程中,对待连接件进行C纤维束穿刺,穿刺后继续沉积SiC,最终在完成复合材料制备的同时,结束复合材料的连接过程。采用该方法,... 提出了一种C/SiC复合材料的连接方法:在线气相穿刺连接。该方法是在C/SiC复合材料制备的最后一步——SiC沉积过程中,对待连接件进行C纤维束穿刺,穿刺后继续沉积SiC,最终在完成复合材料制备的同时,结束复合材料的连接过程。采用该方法,对2D和3DC/SiC复合材料进行了在线气相穿刺连接。结果表明:在线气相穿刺连接所得接头热物理和热化学相容性好,连接应力低,拉伸强度可达82MPa,连接过程不影响构件的使用温度,是一种适合于纤维增韧陶瓷基复合材料的连接方法。 展开更多
关键词 c/si c 复合材料 连接 在线 气相穿刺 拉伸强度
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C_f/ZrC-SiC复合材料抗氧化烧蚀性能研究 被引量:1
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作者 郭倩 朱时珍 +2 位作者 乔亚男 刘玲 马壮 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2015年第S1期520-523,共4页
Cf/Zr C-Si C超高温陶瓷基复合材料利用碳纤维的增韧、Zr C的高熔点、高硬度、优异的耐超高温性能以及Si C-Zr C复合基体良好的抗氧化特性成为了超高温材料中的研究热点。对基体Zr:Si(质量)分别为2:1、4:1、8:1、16:1的带有Si C涂层的Cf... Cf/Zr C-Si C超高温陶瓷基复合材料利用碳纤维的增韧、Zr C的高熔点、高硬度、优异的耐超高温性能以及Si C-Zr C复合基体良好的抗氧化特性成为了超高温材料中的研究热点。对基体Zr:Si(质量)分别为2:1、4:1、8:1、16:1的带有Si C涂层的Cf/Zr C-Si C超高温陶瓷基复合材料进行2700 K、600 s等离子风洞氧化烧蚀考核试验,评估基体组分配比对材料抗烧蚀性能的影响规律,利用SEM和EDS等分析手段,考察了基体组分配比对烧蚀层微观结构的影响。结果表明,2700 K下,烧蚀中心区表面的Si C快速氧化消耗,基体开始发生氧化烧蚀;基体中Zr的含量越高,试样抗氧化烧蚀性能越好。烧蚀影响层较厚,达毫米级。随着Si含量增加,表层以内生成的Si O2增多,其本身易挥发,烧蚀层孔隙增多,氧气更容易进入内部,烧蚀越严重。随着Si含量增加,Zr C氧化生成的致密Zr O2减少,对碳纤维的保护减弱,碳纤维烧蚀越严重。 展开更多
关键词 cf/Zr c-si c 组分配比 烧蚀 性能
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Effect of H treatment on performance of HIT solar cells
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作者 REN Bingyan WANG Minhua LIU Xiaoping XU Ying 《Rare Metals》 SCIE EI CAS CSCD 2006年第z1期133-136,共4页
Hydrogen is a ubiquitous element in semiconductor processing and particularly in amorphous and microcrystalline silicon where it plays a crucial role in the growth processes as well as in the material properties. Beca... Hydrogen is a ubiquitous element in semiconductor processing and particularly in amorphous and microcrystalline silicon where it plays a crucial role in the growth processes as well as in the material properties. Because of its low mass it can easily diffuse through the silicon network and leads to the passivation of dangling bonds but it may also play a role in the stabilization of metastable defects. Thus a lot of work has been devoted to the study of hydrogen diffusion, bonding and structure in disordered semiconductors. The sequence, deposition-exposure to H plasma-deposition was used to fabricate the microcrystalline emitter. A proper atomic H pretreatment of c-Si surface before depositions i layer was expected to clean the surface and passivatates the surface states, as a result improing the device parameters. In this study, H2 pretreatment of c-si surface was used at different time, power and temperature. It is found that a proper H pretreatment improves passivation of c-si surface and improves the device parameters by AFM and testing I-V. 展开更多
关键词 H pretreatment HIT solar cell c-si buffer layer
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Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment
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作者 Xiaoyu Chen Youwen Zhao +5 位作者 Zhiyuan Dong Guiying Shen Yongbiao Bai Jingming Liu Hui Xie Jiangbian He 《Journal of Semiconductors》 EI CAS CSCD 2017年第11期60-65,共6页
SiNx/SiOx passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after t... SiNx/SiOx passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after the double P-diffusion treatment. In addition to better surface passivation effect, SiNx/SiOx layer has lower reflectivity in long wavelength range than conventional SiNx film. As a consequence, such solar cells exhibit higher conversion efficiency and better internal quantum efficiency, compared with conventional c-Si solar cells. 展开更多
关键词 c-si solar cell double diffusion siNx/siOx passivation
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硅掺杂碳靶材的制备及溅射薄膜生长模式分析
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作者 白雪 刘宇阳 +4 位作者 王星奇 桂涛 杨磊 王星明 储茂友 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2020年第12期4207-4214,共8页
以石墨、碳化硅、硅粉体为原料,采用预处理工艺得到复合原料粉体,热压烧结制备C/Si 80/20 at%靶材。将制备的靶材在不同基片上溅射镀膜,分析薄膜的形貌及其生长模式。通过扫描电镜观察微观形貌、四探针测试电阻率、XRD结合拉曼光谱分析... 以石墨、碳化硅、硅粉体为原料,采用预处理工艺得到复合原料粉体,热压烧结制备C/Si 80/20 at%靶材。将制备的靶材在不同基片上溅射镀膜,分析薄膜的形貌及其生长模式。通过扫描电镜观察微观形貌、四探针测试电阻率、XRD结合拉曼光谱分析晶体结构,结果如下:(1)石墨和硅粉球磨混合48 h可获得Si元素均匀分布的C/Si复合粉体;该粉体在1900℃下真空热处理时,C/Si通过互扩散生成等轴晶3C-SiC;(2)不同粒径的β-SiC粉体在1900℃真空热处理时,颈部生长速率和晶体结构转变存在显著差异。在高温下,纳米β-SiC粉体蒸气压高,颈部增长速率快,通过蒸发-凝聚再结晶后可获得球形度良好的3C-SiC微米颗粒;(3)以C/Si/SiC 70/10/10 at%及C/Si 60/20 at%2种粉体为原料,采用球磨和高温真空热处理得到预处理粉体并热压制备C/Si 80/20 at%靶材,结果表明:与C/SiC 60/20 at%二元组分体系相比,三元组分预处理粉体制备靶材的均匀性好,平均电阻率3.9 mΩ·cm,极差0.59 mΩ·cm,密度2.35 g/cm^3,石墨化度0.17,石墨晶体完整性好;(4)将制备的C/Si80/20at%靶材分别在硅片、玻璃以及陶瓷基片上磁控溅射制备类金刚石薄膜,结果发现:在Si基体表面薄膜呈纵向生长模式,膜层微粒小于20nm;在玻璃基体表面膜层呈层状生长模式且结合紧密;在陶瓷基体表面薄膜呈片状生长模式,膜层由微米级颗粒结合组成,与陶瓷基体的微观组织相似。 展开更多
关键词 c/si 靶材 Β-sic 热处理 热压
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单层n型MoS2/p型c-Si异质结太阳电池数值模拟
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作者 陈云 蔡厚道 《人工晶体学报》 EI CAS 北大核心 2020年第12期2287-2291,2307,共6页
单层二硫化钼(MoS2)是一种具有优异光电性能的半导体材料,在太阳能能量转换中表现出很大的应用潜力。本文基于AMPS模拟软件,对单层n型MoS2/p型c-Si异质结太阳电池进行了数值模拟与分析。通过模拟优化,n型MoS2的电子亲和能为3.75 eV、掺... 单层二硫化钼(MoS2)是一种具有优异光电性能的半导体材料,在太阳能能量转换中表现出很大的应用潜力。本文基于AMPS模拟软件,对单层n型MoS2/p型c-Si异质结太阳电池进行了数值模拟与分析。通过模拟优化,n型MoS2的电子亲和能为3.75 eV、掺杂浓度为1018 cm^-3,p型c-Si的掺杂浓度为1017 cm^-3时,太阳电池能够取得最高22.1%的转换效率。最后模拟了n型MoS2/p型c-Si异质结界面处的界面态对太阳电池性能的影响,发现界面态密度超过1011 cm^-2·eV-1时会严重影响太阳电池的光伏性能。 展开更多
关键词 二硫化钼 c-si 异质结太阳电池 转换效率 二维材料 数值模拟
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Influence of silicon cluster on epitaxial growth of silicon carbide 被引量:1
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作者 LI ZheYang LI Yun +1 位作者 CHEN Chen HAN Pin 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2011年第9期1579-1582,共4页
Precursor concentration dependences of growth rate, doping concentration and surface morphology have been investigated in the epitaxial growth of 4H-SiC(0001) epilayers with horizontal hot-wall CVD system using vari... Precursor concentration dependences of growth rate, doping concentration and surface morphology have been investigated in the epitaxial growth of 4H-SiC(0001) epilayers with horizontal hot-wall CVD system using various precursor concentrations under constant C/Si ratio. Form the experimental data it is found that silicon cluster which is formed through gas phase nucleation plays an important role in controlling the doping concentration and epitaxial growth rate of the silicon carbide. It was observed that the concentration of silicon clusters cannot reach the equilibrium value in the process by using a low Sill4 concentration, and this phenomenon has not been reported by others. 展开更多
关键词 4H-sic horizontal hot-wall cVD c/si ratio growth rate doping concentration silicon cluster
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