微焦点X射线源透射式阳极靶的参数优化,对于增加微焦点X射线管的出光强度、减小X射线焦斑尺寸、提高X射线成像分辨率有着重要的意义。本工作中依据理论分析,通过蒙特卡罗法MCNP软件描述了能量为20到160 ke V的电子束条件下生成X射线的...微焦点X射线源透射式阳极靶的参数优化,对于增加微焦点X射线管的出光强度、减小X射线焦斑尺寸、提高X射线成像分辨率有着重要的意义。本工作中依据理论分析,通过蒙特卡罗法MCNP软件描述了能量为20到160 ke V的电子束条件下生成X射线的强度变化,确定薄层透射阳极靶的最佳厚度;利用有限元法分析大束流密度电子束轰击阳极靶时内部的温度场分布,明确了阳极靶的局域热负荷能力;采用磁控溅射方式生长阳极靶材,结合表征分析和出光实验测量的结果,初步确定了透射式阳极靶的结构及实验工艺,为高亮度点X射线管的开发提供了必要的理论和实验基础。展开更多
A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of...A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of sputtering target areaup to 60%. The multipole magnetic field is put in the anode, which makes theunbalanced magnetron atomsource run in a higher discharge current at a lower arcvoltage condition. Meanwhile, the sputtering atoms through out the anode can beionized partially, because the electron reaching the anode have to suffer multiplecollisions in order to advallce across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the secting atoms in film growth andimprove the property of film depositing.展开更多
文摘微焦点X射线源透射式阳极靶的参数优化,对于增加微焦点X射线管的出光强度、减小X射线焦斑尺寸、提高X射线成像分辨率有着重要的意义。本工作中依据理论分析,通过蒙特卡罗法MCNP软件描述了能量为20到160 ke V的电子束条件下生成X射线的强度变化,确定薄层透射阳极靶的最佳厚度;利用有限元法分析大束流密度电子束轰击阳极靶时内部的温度场分布,明确了阳极靶的局域热负荷能力;采用磁控溅射方式生长阳极靶材,结合表征分析和出光实验测量的结果,初步确定了透射式阳极靶的结构及实验工艺,为高亮度点X射线管的开发提供了必要的理论和实验基础。
文摘A small unbalanced maglletron atom source with multipole cusp magnetic field anode is described. The co-axial magnetron principle is extended to the circularplanar magnetron atom source, which raises the efficiency of sputtering target areaup to 60%. The multipole magnetic field is put in the anode, which makes theunbalanced magnetron atomsource run in a higher discharge current at a lower arcvoltage condition. Meanwhile, the sputtering atoms through out the anode can beionized partially, because the electron reaching the anode have to suffer multiplecollisions in order to advallce across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the secting atoms in film growth andimprove the property of film depositing.
