Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three dimensional microstructure by means of three dimensional holographic lithogr...Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three dimensional microstructure by means of three dimensional holographic lithography technique. Argon ion laser with wavelength of 488 nm was used as light source in the experiments. Field emission microscope diagram showed the formation of three dimensional microstructure. It was found that the amount of photo initiator, the laser intensity and the exposure time are the key factors to obtain well defined three dimensional microstructure.展开更多
文摘Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three dimensional microstructure by means of three dimensional holographic lithography technique. Argon ion laser with wavelength of 488 nm was used as light source in the experiments. Field emission microscope diagram showed the formation of three dimensional microstructure. It was found that the amount of photo initiator, the laser intensity and the exposure time are the key factors to obtain well defined three dimensional microstructure.
