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碳化硼
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《金属加工工艺与设备:英文版》 2005年第2期38-40,共3页
An improved interface characterization technique for a full-range profiling of oxide damage in ultra-thin gate oxide CMOS devices;An intelligent system for advanced dynamic security assessment;Ancient raw copper fro... An improved interface characterization technique for a full-range profiling of oxide damage in ultra-thin gate oxide CMOS devices;An intelligent system for advanced dynamic security assessment;Ancient raw copper from primary smelting sites in Cyprus;Anthropogenic plutonium in soils of the Ural 展开更多
关键词 碳化硼 表面特征 互补金属氧化半导体 超薄氧化薄膜 门二极管
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