TN252 2002053623传输损耗对条形波导中切伦科夫倍频的影响=Effect ofthe propagation loss on the Cherenkov SHG in achannel waveguide[刊,中]/钟开生,胡鸿璋,唐多强,陆樟献(天津大学理学院应用物理系.天津(300072))//光学学报.—200...TN252 2002053623传输损耗对条形波导中切伦科夫倍频的影响=Effect ofthe propagation loss on the Cherenkov SHG in achannel waveguide[刊,中]/钟开生,胡鸿璋,唐多强,陆樟献(天津大学理学院应用物理系.天津(300072))//光学学报.—2001,21(8).—901-904基于耦合模理论,分析了考虑传输损耗的条形波导中切伦科夫(Cherenkov)二次谐波(SHG)的问题。展开更多
TN256 2000021114波导光折变功能光栅的研究=Study of photorefractivefunctional waveguide-grating[刊,中]/陈铮,易庆胜（电子科技大学光电子技术系.四川,成都（610054））//光学学报.-1999,19（7）.-909-914提出一种新的波导光折变...TN256 2000021114波导光折变功能光栅的研究=Study of photorefractivefunctional waveguide-grating[刊,中]/陈铮,易庆胜（电子科技大学光电子技术系.四川,成都（610054））//光学学报.-1999,19（7）.-909-914提出一种新的波导光折变功能光栅制作技术,利用导波光与空间光干涉,在Ti:LiNbO<sub>3</sub>条形波导中通过光折变效应形成波导功能光栅。该方法也适用制作浮雕型波导光栅。用该方法。展开更多
An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure...An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure （20mtorr） etching conditions, a novel etch roughening phenomenon has been observed in the plasma, that is, the roughness of the etched front surface increases with the amount of material etched, independent of etch rate, RF power, and gas composition. Besides, the etched underlying side wall will be tapered as the upper SU-8 resist pattern degradation transfers downward. A process using double-layered mask, consisting of SU-8 resist and thin Chromium film, was developed for improving the side wall smoothness. Based on the studies, SiO2/Si channel waveguides with the propagation loss less than 0. 07dB/cm were fabricated at last.展开更多
A systematic analysis of the polymeric Mach-Zehnder rib waveguide is presented based on the calculation and optimization. The simulation is carried out with the Effective Index Method (EIM) and two-dimensional (2-D) F...A systematic analysis of the polymeric Mach-Zehnder rib waveguide is presented based on the calculation and optimization. The simulation is carried out with the Effective Index Method (EIM) and two-dimensional (2-D) Finite Difference Beam Propagation Method (FD-BPM). The large refractive index step between the consecutive polymer layers is reduced by using EIM and thus the precision of the calculation is ensured. The important param- eters of the waveguide such as Y-junction angle and the separation gap are discussed and their relationships with the optical power propagation and the loss characteristics are investigated in this paper. The total loss of the opti- mized structure is 0.258 dB.展开更多
文摘TN252 2002053623传输损耗对条形波导中切伦科夫倍频的影响=Effect ofthe propagation loss on the Cherenkov SHG in achannel waveguide[刊,中]/钟开生,胡鸿璋,唐多强,陆樟献(天津大学理学院应用物理系.天津(300072))//光学学报.—2001,21(8).—901-904基于耦合模理论,分析了考虑传输损耗的条形波导中切伦科夫(Cherenkov)二次谐波(SHG)的问题。
文摘TN256 2000021114波导光折变功能光栅的研究=Study of photorefractivefunctional waveguide-grating[刊,中]/陈铮,易庆胜（电子科技大学光电子技术系.四川,成都（610054））//光学学报.-1999,19（7）.-909-914提出一种新的波导光折变功能光栅制作技术,利用导波光与空间光干涉,在Ti:LiNbO<sub>3</sub>条形波导中通过光折变效应形成波导功能光栅。该方法也适用制作浮雕型波导光栅。用该方法。
文摘An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure （20mtorr） etching conditions, a novel etch roughening phenomenon has been observed in the plasma, that is, the roughness of the etched front surface increases with the amount of material etched, independent of etch rate, RF power, and gas composition. Besides, the etched underlying side wall will be tapered as the upper SU-8 resist pattern degradation transfers downward. A process using double-layered mask, consisting of SU-8 resist and thin Chromium film, was developed for improving the side wall smoothness. Based on the studies, SiO2/Si channel waveguides with the propagation loss less than 0. 07dB/cm were fabricated at last.
基金the foundation for Advance ResearchProgram of Weapon Equipment, China (Grant No.02040105DZ02).
文摘A systematic analysis of the polymeric Mach-Zehnder rib waveguide is presented based on the calculation and optimization. The simulation is carried out with the Effective Index Method (EIM) and two-dimensional (2-D) Finite Difference Beam Propagation Method (FD-BPM). The large refractive index step between the consecutive polymer layers is reduced by using EIM and thus the precision of the calculation is ensured. The important param- eters of the waveguide such as Y-junction angle and the separation gap are discussed and their relationships with the optical power propagation and the loss characteristics are investigated in this paper. The total loss of the opti- mized structure is 0.258 dB.
