As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact...As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.展开更多
在纳米数字锁存器中,多节点翻转(multiple-node upset,MNU)正持续增加.虽然现有基于互连单元的抗辐射加固设计(radiation hardening by design,RHBD)的锁存器可以恢复所有MNU,但是需要更多的敏感节点和晶体管.为了在获得高可靠性的同时...在纳米数字锁存器中,多节点翻转(multiple-node upset,MNU)正持续增加.虽然现有基于互连单元的抗辐射加固设计(radiation hardening by design,RHBD)的锁存器可以恢复所有MNU,但是需要更多的敏感节点和晶体管.为了在获得高可靠性的同时降低硬件开销,提出利用辐射翻转机制进行加固的方法.首先,通过使用屏蔽晶体管减少敏感节点,进而降低使用的晶体管数;然后,将2个单元内的上拉晶体管进行交叉互连,从而构造出一个可抗MNU翻转的RHBD锁存器.在65 nm工艺下,与现有基于互连技术的RHBD锁存器相比,提出的RHBD锁存器可平均减少12.82%的面积,319.22%的延迟和10.66%的功耗.展开更多
基金supported by the National Natural Science Foundation of China (Grant Nos.60725415 and 60971066)the National High-tech Program (Grant Nos.2009AA01Z258 and 2009AA01Z260)the National Key Lab Foundation (Grant No.ZHD200904)
文摘As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.
