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Growth of pure zinc blende p-type GaAs nanowires by metal-organic chemical vapor deposition
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作者 李然 黄辉 +4 位作者 任晓敏 郭经纬 刘小龙 黄永清 蔡世伟 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第5期22-27,共6页
Vertical p-type gallium arsenide (GaAs) nanowires with pure zinc blende structure were grown on GaAs (111) B substrate by metal-organic chemical vapor deposition via a Au-catalyst vapor-liquid-solid mechanism. The... Vertical p-type gallium arsenide (GaAs) nanowires with pure zinc blende structure were grown on GaAs (111) B substrate by metal-organic chemical vapor deposition via a Au-catalyst vapor-liquid-solid mechanism. The p-type doping was investigated by additional diethyl zinc (DEZn). In the high Ⅱ/Ⅲ ratio range (Ⅱ/Ⅲ〉9.1%), there exists a critical length beyond which kinking takes place. Two possible reasons are discussed. Zn occurrence in the nanowires was verified by energy dispersive X-ray (EDX) analysis. Corresponding to Ⅱ/Ⅲ = 0.2%, the doping concentration is about 8 × 10^18 cm^-3. 展开更多
关键词 GaAs nanowire p-type doping metal organic chemical vapor position zinc-blende structure
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