Two-dimensional transition metal chalcogenides(2D-TMDs)have attracted much attention because of their unique layered structure and physical properties for transistor applications.Mechanically transferred metal contact...Two-dimensional transition metal chalcogenides(2D-TMDs)have attracted much attention because of their unique layered structure and physical properties for transistor applications.Mechanically transferred metal contacts on these low-dimensional materials or their homogeneous and heterogeneous multilayers have generated huge interest to avoid deposition damages.In this paper,we show that there are large physical gaps at both the edge contact and surface contact between the transferred electrodes and the 2D materials.A method called laser shock induced superplastic deformation(LSISD)is proposed to tackle this issue and enhance the performance of the transistors.The enhancement mechanism was investigated by molecular dynamics(MD)simulations of the nanoforming process,atomic force microscopy(AFM),scanning electron microscopy(SEM),transmission electron microscopy(TEM)characterizations of the interfaces,and density functional theory(DFT)modeling.The force effect of laser shock can reduce the contact gap between metals and semiconductors.The electrical performances of the transistors before and after LSISD,along with MD simulations,are used to find the optimal process parameters.In addition,this paper applies the LSISD method to the short-channel MoS_(2)/graphene vertical transistors to show potential improvement in interface contact and electrical properties.This paper demonstrates the first report on using mechanical force induced by laser shock to enhance metal–semiconductor interfaces and transistor performances.展开更多
A main challenge for the development of two-dimensional devices based on atomically thin transition-metal dichalcogenides(TMDs)is the realization of metal–semiconductor junctions(MSJs)with low contact resistance and ...A main challenge for the development of two-dimensional devices based on atomically thin transition-metal dichalcogenides(TMDs)is the realization of metal–semiconductor junctions(MSJs)with low contact resistance and high charge transport capability.However,traditional metal–TMD junctions usually suffer from strong Fermi-level pinning(FLP)and chemical disorder at the interfaces,resulting in weak device performance and high energy consump-tion.By means of high-throughput first-principles calculations,we report an attractive solution via the formation of van der Waals(vdW)contacts between metallic and semiconducting TMDs.We apply a phase-engineering strategy to create a monolayer TMD database for achieving a wide range of work func-tions and band gaps,hence offering a large degree of freedom to construct TMD vdW MSJs with desired contact types.The Schottky barrier heights and contact types of 728 MSJs have been identified and they exhibit weak FLP(-0.62 to-0.90)as compared with the traditional metal–TMD junctions.We find that the interfacial interactions of the MSJs bring a delicate competition between the FLP strength and carrier tunneling efficiency,which can be uti-lized to screen high-performance MSJs.Based on a set of screening criteria,four potential TMD vdW MSJs(e.g.,NiTe_(2)/ZrSe_(2),NiTe_(2)/PdSe_(2),HfTe_(2)/PdTe_(2),TaSe_(2)/MoTe_(2))with Ohmic contact,weak FLP,and high carrier tunneling probability have been predicted.This work not only provides a fundamental understanding of contact properties of TMD vdW MSJs but also renders their huge potential for electronics and optoelectronics.展开更多
Two-dimensional(2D)heterostructures based on layered transition metal dichalcogenides(TMDs)have attracted increasing attention for the applications of the nextgeneration high-performance integrated electronics and opt...Two-dimensional(2D)heterostructures based on layered transition metal dichalcogenides(TMDs)have attracted increasing attention for the applications of the nextgeneration high-performance integrated electronics and optoelectronics.Although various TMD heterostructures have been successfully fabricated,epitaxial growth of such atomically thin metal-semiconductor heterostructures with a clean and sharp interface is still challenging.In addition,photodetectors based on such heterostructures have seldom been studied.Here,we report the synthesis of high-quality vertical NbS2/MoS2metallic-semiconductor heterostructures.By using NbS2as the contact electrodes,the field-effect mobility and current on-off ratio of MoS2can be improved at least 6-fold and two orders of magnitude compared with the conventional Ti/Au contact,respectively.By using NbS2as contact,the photodetector performance of MoS2is much improved with higher responsivity and less response time.Such facile synthesis of atomically thin metal-semiconductor heterostructures by a simple chemical vapor deposition strategy and its effectiveness as ultrathin 2D metal contact open the door for the future application of electronics and optoelectronics.展开更多
以磁控溅射制备的ZnO纳米晶薄膜作为籽晶层,用水热法在80℃氧化铟锡(indium tin oxide,ITO)玻璃衬底上,实现了大面积ZnO纳米线阵列膜的取向生长,制备了3种金属-半导体-金属(metal-semiconductor-metal,MSM)结构的ZnO半导体纳米线阵列膜...以磁控溅射制备的ZnO纳米晶薄膜作为籽晶层,用水热法在80℃氧化铟锡(indium tin oxide,ITO)玻璃衬底上,实现了大面积ZnO纳米线阵列膜的取向生长,制备了3种金属-半导体-金属(metal-semiconductor-metal,MSM)结构的ZnO半导体纳米线阵列膜样品,测试了薄膜样品的光学特性和I-V特性。结果表明:在相同的生长液浓度下,籽晶层对所生长的纳米线尺度分布有显著影响。所制备的纳米线薄膜在室温下具有显著的紫外带边发射特性。ZnO纳米线/Ag和ZnO纳米线/Al的金属-半导体接触均具有明显的Schottky接触特性,而ZnO纳米线/Au的金属-半导体接触具有明显Ohmic接触特性。展开更多
Employing a simple and efficient method of electro-chemical anodization, ZnO nanowire films are fabricated on Zn foil, and an ultraviolet （UV） sensor prototype is formed for investigating the electronic transport th...Employing a simple and efficient method of electro-chemical anodization, ZnO nanowire films are fabricated on Zn foil, and an ultraviolet （UV） sensor prototype is formed for investigating the electronic transport through back-to-back double junctions. The UV （365 nm） responses of surface-contacted ZnO film are provided by I-V measurement, along with the current evolution process by on/off of UV illumination. In this paper, the back-to-back metal-seconductor-metal （M-S-M） model is used to explain the electronic transport of a ZnO nanowire film based structure. A thermionic-field electron emission mechanism is employed to fit and explain the as-observed UV sensitive electronic transport properties of ZnO film with surface-modulation by oxygen and water molecular coverage.展开更多
Sub-threshold characteristics of the dual material gate 4H-SiC MESFET （DMGFET） are investigated and the analytical models to describe the drain-induced barrier lowering （DIBL） effect are derived by solving one- an...Sub-threshold characteristics of the dual material gate 4H-SiC MESFET （DMGFET） are investigated and the analytical models to describe the drain-induced barrier lowering （DIBL） effect are derived by solving one- and two- dimensional Poisson＇s equations. Using these models, we calculate the bottom potential of the channel and the threshold voltage shift, which characterize the drain-induced barrier lowering （DIBL） effect. The calculated results reveal that the dual material gate （DMG） structure alleviates the deterioration of the threshold voltage and thus suppresses the DIBL effect due to the introduced step function, which originates from the work function difference of the two gate materials when compared with the conventional single material gate metal-semiconductor field-effect transistor （SMGFET）.展开更多
The geometries and electronic properties of SnSe/metal contact have been investigated using first-principles calcula- tion. It is found that the geometries of monolayer SnSe were affected slightly when SnSe adsorbs on...The geometries and electronic properties of SnSe/metal contact have been investigated using first-principles calcula- tion. It is found that the geometries of monolayer SnSe were affected slightly when SnSe adsorbs on M （M = Ag,Au,Ta） substrate. Compared with the corresponding free-standing monolayer SnSe, the adsorbed SnSe undergoes a semiconductor- to-metal transition. The potential difference AV indicates that SnSefra contact is the best candidate for the Schottky contact of the three SnSe/M contacts. Two types of current-in-plane （CIP） structure, where a freestanding monolayer SnSe is con- nected to SnSe/M, are identified as the n-type CIP structure in SnSe/Ag contact and p-type CIP structure in SnSe/Au and SnSe/Ta contact. The results can stimulate further investigation for the multifunctional SnSe/metal contact.展开更多
基金supported by the National Natural Science Foundation of China(No.51901162).
文摘Two-dimensional transition metal chalcogenides(2D-TMDs)have attracted much attention because of their unique layered structure and physical properties for transistor applications.Mechanically transferred metal contacts on these low-dimensional materials or their homogeneous and heterogeneous multilayers have generated huge interest to avoid deposition damages.In this paper,we show that there are large physical gaps at both the edge contact and surface contact between the transferred electrodes and the 2D materials.A method called laser shock induced superplastic deformation(LSISD)is proposed to tackle this issue and enhance the performance of the transistors.The enhancement mechanism was investigated by molecular dynamics(MD)simulations of the nanoforming process,atomic force microscopy(AFM),scanning electron microscopy(SEM),transmission electron microscopy(TEM)characterizations of the interfaces,and density functional theory(DFT)modeling.The force effect of laser shock can reduce the contact gap between metals and semiconductors.The electrical performances of the transistors before and after LSISD,along with MD simulations,are used to find the optimal process parameters.In addition,this paper applies the LSISD method to the short-channel MoS_(2)/graphene vertical transistors to show potential improvement in interface contact and electrical properties.This paper demonstrates the first report on using mechanical force induced by laser shock to enhance metal–semiconductor interfaces and transistor performances.
基金National Natural Science Foundation of China,Grant/Award Number:62174151Natural Science Foundation of Zhejiang Province,Grant/Award Numbers:LZ22F040003,Q21A050007。
文摘A main challenge for the development of two-dimensional devices based on atomically thin transition-metal dichalcogenides(TMDs)is the realization of metal–semiconductor junctions(MSJs)with low contact resistance and high charge transport capability.However,traditional metal–TMD junctions usually suffer from strong Fermi-level pinning(FLP)and chemical disorder at the interfaces,resulting in weak device performance and high energy consump-tion.By means of high-throughput first-principles calculations,we report an attractive solution via the formation of van der Waals(vdW)contacts between metallic and semiconducting TMDs.We apply a phase-engineering strategy to create a monolayer TMD database for achieving a wide range of work func-tions and band gaps,hence offering a large degree of freedom to construct TMD vdW MSJs with desired contact types.The Schottky barrier heights and contact types of 728 MSJs have been identified and they exhibit weak FLP(-0.62 to-0.90)as compared with the traditional metal–TMD junctions.We find that the interfacial interactions of the MSJs bring a delicate competition between the FLP strength and carrier tunneling efficiency,which can be uti-lized to screen high-performance MSJs.Based on a set of screening criteria,four potential TMD vdW MSJs(e.g.,NiTe_(2)/ZrSe_(2),NiTe_(2)/PdSe_(2),HfTe_(2)/PdTe_(2),TaSe_(2)/MoTe_(2))with Ohmic contact,weak FLP,and high carrier tunneling probability have been predicted.This work not only provides a fundamental understanding of contact properties of TMD vdW MSJs but also renders their huge potential for electronics and optoelectronics.
基金financially supported by the National Key R&D Program of China(2018YFA0306900 and 2018YFA0305800)the National Natural Science Foundation of China(51872012)。
文摘Two-dimensional(2D)heterostructures based on layered transition metal dichalcogenides(TMDs)have attracted increasing attention for the applications of the nextgeneration high-performance integrated electronics and optoelectronics.Although various TMD heterostructures have been successfully fabricated,epitaxial growth of such atomically thin metal-semiconductor heterostructures with a clean and sharp interface is still challenging.In addition,photodetectors based on such heterostructures have seldom been studied.Here,we report the synthesis of high-quality vertical NbS2/MoS2metallic-semiconductor heterostructures.By using NbS2as the contact electrodes,the field-effect mobility and current on-off ratio of MoS2can be improved at least 6-fold and two orders of magnitude compared with the conventional Ti/Au contact,respectively.By using NbS2as contact,the photodetector performance of MoS2is much improved with higher responsivity and less response time.Such facile synthesis of atomically thin metal-semiconductor heterostructures by a simple chemical vapor deposition strategy and its effectiveness as ultrathin 2D metal contact open the door for the future application of electronics and optoelectronics.
文摘以磁控溅射制备的ZnO纳米晶薄膜作为籽晶层,用水热法在80℃氧化铟锡(indium tin oxide,ITO)玻璃衬底上,实现了大面积ZnO纳米线阵列膜的取向生长,制备了3种金属-半导体-金属(metal-semiconductor-metal,MSM)结构的ZnO半导体纳米线阵列膜样品,测试了薄膜样品的光学特性和I-V特性。结果表明:在相同的生长液浓度下,籽晶层对所生长的纳米线尺度分布有显著影响。所制备的纳米线薄膜在室温下具有显著的紫外带边发射特性。ZnO纳米线/Ag和ZnO纳米线/Al的金属-半导体接触均具有明显的Schottky接触特性,而ZnO纳米线/Au的金属-半导体接触具有明显Ohmic接触特性。
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11274082 and 51172194)the Excellent Young Scientist Research Award Fund of Shandong Province,China(Grant No.BS2011CL002)
文摘Employing a simple and efficient method of electro-chemical anodization, ZnO nanowire films are fabricated on Zn foil, and an ultraviolet （UV） sensor prototype is formed for investigating the electronic transport through back-to-back double junctions. The UV （365 nm） responses of surface-contacted ZnO film are provided by I-V measurement, along with the current evolution process by on/off of UV illumination. In this paper, the back-to-back metal-seconductor-metal （M-S-M） model is used to explain the electronic transport of a ZnO nanowire film based structure. A thermionic-field electron emission mechanism is employed to fit and explain the as-observed UV sensitive electronic transport properties of ZnO film with surface-modulation by oxygen and water molecular coverage.
基金Project supported by the Pre-research Foundation from the National Ministries and Commissions of China (GrantNo.51308030201)
文摘Sub-threshold characteristics of the dual material gate 4H-SiC MESFET （DMGFET） are investigated and the analytical models to describe the drain-induced barrier lowering （DIBL） effect are derived by solving one- and two- dimensional Poisson＇s equations. Using these models, we calculate the bottom potential of the channel and the threshold voltage shift, which characterize the drain-induced barrier lowering （DIBL） effect. The calculated results reveal that the dual material gate （DMG） structure alleviates the deterioration of the threshold voltage and thus suppresses the DIBL effect due to the introduced step function, which originates from the work function difference of the two gate materials when compared with the conventional single material gate metal-semiconductor field-effect transistor （SMGFET）.
基金supported by the National Natural Science Foundation of China(Grant Nos.U1304518 and U1404109)
文摘The geometries and electronic properties of SnSe/metal contact have been investigated using first-principles calcula- tion. It is found that the geometries of monolayer SnSe were affected slightly when SnSe adsorbs on M （M = Ag,Au,Ta） substrate. Compared with the corresponding free-standing monolayer SnSe, the adsorbed SnSe undergoes a semiconductor- to-metal transition. The potential difference AV indicates that SnSefra contact is the best candidate for the Schottky contact of the three SnSe/M contacts. Two types of current-in-plane （CIP） structure, where a freestanding monolayer SnSe is con- nected to SnSe/M, are identified as the n-type CIP structure in SnSe/Ag contact and p-type CIP structure in SnSe/Au and SnSe/Ta contact. The results can stimulate further investigation for the multifunctional SnSe/metal contact.
