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电铸-电解组合法加工双向喇叭孔阵列
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作者 明平美 包晓慧 +1 位作者 郝巧玲 王俊涛 《航空学报》 EI CAS CSCD 北大核心 2014年第7期2049-2062,共14页
为解决双向喇叭形金属微小孔阵列的高效低成本制造难题,提出了一种基于镂空型惰性金属模板的、由电铸加工与掩模电解加工步骤串接而成的组合式加工方法。基于建立的数学模型,在证实该组合加工可行性的基础上,进一步仿真分析与试验研究... 为解决双向喇叭形金属微小孔阵列的高效低成本制造难题,提出了一种基于镂空型惰性金属模板的、由电铸加工与掩模电解加工步骤串接而成的组合式加工方法。基于建立的数学模型,在证实该组合加工可行性的基础上,进一步仿真分析与试验研究了惰性金属模板结构参数对被加工孔阵列几何结构形状的影响规律,并进行了参数优选,数值分析与试验结果基本一致。研究结果表明:被加工孔阵列的几何特征参数严重受惰性金属模板结构参数的影响;采用大厚度、大于90°开口角的惰性金属模板有利于获得最小孔径更小且出入口廓形对称性更好的双向喇叭形孔;模板筋宽越小,越易于实现大孔深、高对称性的双向喇叭孔;模板孔径越大,喇叭孔金属层的极限厚度越大,但出入口廓形的对称性越差。此外,在小筋宽、90°开口角的惰性金属模板上更易电解加工生成""形喇叭孔。基于优化的惰性金属模板,能电铸-电解组合加工出出入口廓形对称性好的、最小孔径比被复制模板孔小的、网片厚度大且表面光滑的双向喇叭形金属微小孔阵列,其进出口的对称度、孔径偏差与出口相对于最小孔径的扩口率等分别为88.8%、9.7%和110.1%。 展开更多
关键词 喇叭形孔 孔阵列 电铸 掩模电解加工 惰性金属电极
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Analysis of the current density characteristics in through-mask electrochemical micromachining(TMEMM) for fabrication of micro-hole arrays on invar alloy film 被引量:5
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作者 Da-som JIN Kwang-ho CHUN Eun-sang LEE 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2017年第3期1231-1241,共11页
Invar alloy consisting of 64% iron and 36% nickel has been widely used for the production of shadow masks for organic light emitting diodes(OLEDs) because of its low thermal expansion coefficient(1.86 × 10^-6c... Invar alloy consisting of 64% iron and 36% nickel has been widely used for the production of shadow masks for organic light emitting diodes(OLEDs) because of its low thermal expansion coefficient(1.86 × 10^-6cm/°C).To fabricate micro-hole arrays on 30 lm invar alloy film,through-mask electrochemical micromachining(TMEMM) was developed and combined with a portion of the photolithography etching process.For precise hole shapes,patterned photoresist(PR) film was applied as an insulating mask.To investigate the relationship between the current density and the material removal rate,the principle of the electrochemical machining was studied with a focus on the equation.The finite element method(FEM) was used to verify the influence of each parameter on the current density on the invar alloy film surface.The parameters considered were the thickness of the PR mask,inter-electrode gap(IEG),and electrolyte concentration.Design of experiments(DOE) was used to figure out the contribution of each parameter.A simulation was conducted with varying parameters to figure out their relationships with the current density.Optimization was conducted to select the suitable conditions.An experiment was carried out to verify the simulation results.It was possible to fabricate micro-hole arrays on invar alloy film using TMEMM,which is a promising method that can be applied to fabrications of OLEDs shadow masks. 展开更多
关键词 electrochemical Invar alloy film micromachining OLED shadow mask Photoresist film mask(PR film mask Through-mask electrochemical micromachining(TMEMM)
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Electrochemical micromachining of microgroove arrays on phosphor bronze surface for improving the tribological performance 被引量:5
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作者 Xuan ZHOU Ningsong QU +1 位作者 Zhibao HOU Gai ZHAO 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2018年第7期1609-1618,共10页
A high friction coefficient and a low wear rate of contacted surfaces are essential elements to friction pairs between the stator and the rotor in ultrasonic motors. It has been shown that surface textures have a sign... A high friction coefficient and a low wear rate of contacted surfaces are essential elements to friction pairs between the stator and the rotor in ultrasonic motors. It has been shown that surface textures have a significant effect on improving the tribological performance of friction pairs.In this paper, microgroove arrays are introduced to the stator surface for improving the tribological performance of friction pairs between the stator and the rotor in ultrasonic motors. Microgrooves were fabricated on a phosphor bronze surface by through-mask electrochemical micromachining(TMEMM). Parameters, namely, the electrolyte inlet pressure, applied voltage, pulse duty cycle,and frequency, were varied to investigate their influences on the dimensions and morphology of the microgrooves. Results showed that the width and depth of the microgrooves were strongly affected by the applied voltage and frequency, while the morphology of the microgrooves was dependent on the electrolyte inlet pressure and the pulse duty cycle. Compared with a smooth surface, the friction coefficient increased from 0.245 to 0.334 and less abrasion was obtained when a surface was textured with microgrooves of which the width and depth were 185.6 and 57.6 lm,respectively. Microgroove arrays might play an important role in enhancing the performance of ultrasonic motors. 展开更多
关键词 Friction coefficient MICROGROOVES Through-mask electrochemical micromachining Ultrasonic motors WEAR
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移动阴极式掩膜电解加工微沟槽阵列均匀性研究 被引量:2
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作者 杜立群 温义奎 +3 位作者 关发龙 翟科 叶作彦 王超 《电化学》 CAS CSCD 北大核心 2021年第6期658-670,共13页
掩膜电解加工是一种高效率、大规模加工微结构的特种加工方法。然而,由于电流分布的边缘效应,在微结构的掩膜电解加工过程中往往存在着严重的加工尺寸不一致问题。针对这一问题,本文提出了一种移动阴极式掩膜电解加工方法。首先,利用COM... 掩膜电解加工是一种高效率、大规模加工微结构的特种加工方法。然而,由于电流分布的边缘效应,在微结构的掩膜电解加工过程中往往存在着严重的加工尺寸不一致问题。针对这一问题,本文提出了一种移动阴极式掩膜电解加工方法。首先,利用COMSOL有限元分析软件对微沟槽阵列掩膜电解加工过程中的电流分布和阳极轮廓形状进行了数值仿真。仿真结果表明,相对于常规阴极结构的掩膜电解加工,采用移动阴极结构的掩膜电解加工方法能够获得尺寸更加均匀的微沟槽阵列结构。其次,在数值仿真的基础上,开展了掩膜电解加工实验研究。实验结果表明,移动阴极式掩膜电解加工方法能够有效地改善微沟槽阵列加工的尺寸均匀性。相对于常规阴极结构的掩膜电解加工过程,移动阴极式掩膜电解加工微沟槽阵列的均匀性提高了68.3%,并且随着阴阳极间距的增大,微沟槽深度不均匀度呈现出先减小后增大的趋势。随着阴极宽度的增大,微沟槽深度不均匀度逐渐增大;随着阴极移动速度的增大,微沟槽深度不均匀度逐渐减小,仿真与实验结果趋势一致。 展开更多
关键词 移动阴极 微沟槽结构 掩膜电解加工 刻蚀均匀性
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基于光致抗蚀干膜的掩膜制备及其应用研究
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作者 曾永彬 蔡伟伟 +2 位作者 李寒松 陈晓磊 张西方 《电加工与模具》 2014年第5期24-27,40,共5页
在传统工艺流程中,必须先将干膜贴于工件表面,然后进行光刻,但干膜不可重复使用。现提出一种新型干膜光刻工艺流程,在干膜贴于工件表面之前,先对干膜单独进行光刻试验研究。基于该新型工艺流程,研究了杜邦干膜GPM220的曝光及显影特性。... 在传统工艺流程中,必须先将干膜贴于工件表面,然后进行光刻,但干膜不可重复使用。现提出一种新型干膜光刻工艺流程,在干膜贴于工件表面之前,先对干膜单独进行光刻试验研究。基于该新型工艺流程,研究了杜邦干膜GPM220的曝光及显影特性。经过对曝光量(曝光时间)及显影时间的参数优化,最终在干膜上获得了平均直径为99.7μm的通孔阵列,并将其作为掩膜应用于微细电解加工,通过选择合理的加工参数,在工件表面获得了平均直径为125μm、平均深度为10μm的微坑阵列。电解实验后的干膜易与工件分离,可实现重复使用,提高了干膜的利用率。 展开更多
关键词 光致抗蚀剂(干膜) 曝光 显影 掩膜电解
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