An empirical formula for composition demixing analysis in cathodic arc ion plating using alloy target is established based on the concepts of average charged state and relative demixing parameter. The level of composi...An empirical formula for composition demixing analysis in cathodic arc ion plating using alloy target is established based on the concepts of average charged state and relative demixing parameter. The level of composition demixing effect is presented by demixing degree of one element. For binary constituent alloy target, the composition change trend in coating is discussed and the limit of demixing degree for each element is determined. The content of one element with higher average charged state gets larger in coating than in alloy target, at meantime, the content of one element with lower average charged state gets less. For each one of the two constituents, the less the atom percent in alloy target, the larger the difference of its contents between the coating and the target. For triple constituent alloy target, the content change of one element with moderate average charged state is discussed in detail. Its content in coating getting larger or less is determined by the combination result of the contents of the other two elements in alloy target. For a given content of the element with moderate average charged state in triple alloy target, the content deviation level of that element from coating to alloy target will be not larger than that using binary alloy target containing only that element and one of the two others. According to the wanted coating composition, the composition design of alloy target is easily deduced from the formula.展开更多
The composition demixing effect has been found often in alloy coatings deposited by cathodic arc ion plating using various alloy cathode targets. The characteristics of composition demixing phenomena were summarized. ...The composition demixing effect has been found often in alloy coatings deposited by cathodic arc ion plating using various alloy cathode targets. The characteristics of composition demixing phenomena were summarized. Beginning with the ionization zone near the surface of the cathode target, a physical model in terms of the ions generated in the ionization zone and their movement in the plating room modified by bias electric field was proposed. Based on the concept of electric charge state, the simulation calculation of the composition demixing effect was carried out. The percentage of atoms of an element in coating and from the alloy target was demonstrated by direct comparison. The influences of the composition change of the alloy target and the bias electric field on the composition demixing effect were discussed in detail. It is also proposed that the average charge states of the elements may be used to calculate the composition demixing effect and to design the composition of the alloy target.展开更多
针对磁控溅射和阴极弧离子镀沉积技术存在的局限性,采用有限元分析方法(Finite element method,FEM)进行磁场模拟,优化设计外加电磁线圈的结构和磁场分布位形,并应用于磁控溅射沉积透明导电氧化物和阴极弧离子镀沉积硬质薄膜中。分析了...针对磁控溅射和阴极弧离子镀沉积技术存在的局限性,采用有限元分析方法(Finite element method,FEM)进行磁场模拟,优化设计外加电磁线圈的结构和磁场分布位形,并应用于磁控溅射沉积透明导电氧化物和阴极弧离子镀沉积硬质薄膜中。分析了外加电磁线圈磁场对磁控溅射等离子体辉光变化、磁控靶磁场平衡度/非平衡度、以及线圈位置对等离子体特性和靶材利用率的影响。设计和制作了轴对称磁场和旋转磁场,研究了它们对阴极弧离子镀弧斑运动形貌和薄膜表面大颗粒等特性的影响。通过控制弧斑运动状态,可以得到不同程度的颗粒分布,实现颗粒的可控沉积,减少薄膜表面大颗粒的污染。展开更多
To investigate the evolution of microstructure and wear behavior of TiSiN coatings with the variation of Si in targets and lays the foundation for its controllable mass production, Ti1-xSixN composite coatings were de...To investigate the evolution of microstructure and wear behavior of TiSiN coatings with the variation of Si in targets and lays the foundation for its controllable mass production, Ti1-xSixN composite coatings were deposited onto Si(100) and cemented carbide substrates using TiSi targets with different Si content by cathodic arc ion plating. The influences of Si on the microstructure and mechanical properties were studied. Nano-amorphous composite structure appeared in the Ti1-xSixN coatings when Si content in TiSi target was higher than 5 at%. However, further increase of Si content in TiSi target exhibited a negligible effect on the microstructure of Ti1-xSixN coatings. Hardness and deformation resistance were correlated to the content of Si in TiSi targets. Maximum hardness was obtained as the Si content in target increased up to 20 at%. Friction coefficient and wear rate significantly decreased with addition of Si in TiN coating, and then dually increased with the increase of Si content in targets.展开更多
采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂...采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂层表面主要成分为Ti、Al、Si和N元素,各元素分布均匀,未产生富集现象;高硬度的Ti Al N是由Al原子以置换方式取代Ti N中部分Ti原子生成的,且Ti N和Al N晶粒得到细化,形成较为致密的结构,使涂层硬度得到了提高;Ti、Al、Si、N等原子在结合界面处发生相互扩散,是形成冶金结合的主要机制;Ti Al SN涂层/H13钢体系具有较好的结合强度,用划痕法测得涂层界面结合强度为44 N。展开更多
The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates ...The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates by cathodic arc ion plating technology as a metallic IR reflector layer in SSAC. The thickness of Cr thin films was optimized to achieve the minimum thermal emittance. The effects of structural, microstructural, optical, surface and cross-sectional morphological properties of Cr thin films were investigated on the emittance. An optimal thickness about 450 nm of the Cr thin film for the lowest total thermal emittance of 0.05 was obtained. The experimental results suggested that the Cr metallic thin film with optimal thickness could be used as an effective infrared reflector for the development of SSAC structure.展开更多
文摘An empirical formula for composition demixing analysis in cathodic arc ion plating using alloy target is established based on the concepts of average charged state and relative demixing parameter. The level of composition demixing effect is presented by demixing degree of one element. For binary constituent alloy target, the composition change trend in coating is discussed and the limit of demixing degree for each element is determined. The content of one element with higher average charged state gets larger in coating than in alloy target, at meantime, the content of one element with lower average charged state gets less. For each one of the two constituents, the less the atom percent in alloy target, the larger the difference of its contents between the coating and the target. For triple constituent alloy target, the content change of one element with moderate average charged state is discussed in detail. Its content in coating getting larger or less is determined by the combination result of the contents of the other two elements in alloy target. For a given content of the element with moderate average charged state in triple alloy target, the content deviation level of that element from coating to alloy target will be not larger than that using binary alloy target containing only that element and one of the two others. According to the wanted coating composition, the composition design of alloy target is easily deduced from the formula.
文摘The composition demixing effect has been found often in alloy coatings deposited by cathodic arc ion plating using various alloy cathode targets. The characteristics of composition demixing phenomena were summarized. Beginning with the ionization zone near the surface of the cathode target, a physical model in terms of the ions generated in the ionization zone and their movement in the plating room modified by bias electric field was proposed. Based on the concept of electric charge state, the simulation calculation of the composition demixing effect was carried out. The percentage of atoms of an element in coating and from the alloy target was demonstrated by direct comparison. The influences of the composition change of the alloy target and the bias electric field on the composition demixing effect were discussed in detail. It is also proposed that the average charge states of the elements may be used to calculate the composition demixing effect and to design the composition of the alloy target.
文摘针对磁控溅射和阴极弧离子镀沉积技术存在的局限性,采用有限元分析方法(Finite element method,FEM)进行磁场模拟,优化设计外加电磁线圈的结构和磁场分布位形,并应用于磁控溅射沉积透明导电氧化物和阴极弧离子镀沉积硬质薄膜中。分析了外加电磁线圈磁场对磁控溅射等离子体辉光变化、磁控靶磁场平衡度/非平衡度、以及线圈位置对等离子体特性和靶材利用率的影响。设计和制作了轴对称磁场和旋转磁场,研究了它们对阴极弧离子镀弧斑运动形貌和薄膜表面大颗粒等特性的影响。通过控制弧斑运动状态,可以得到不同程度的颗粒分布,实现颗粒的可控沉积,减少薄膜表面大颗粒的污染。
基金Funded by the National Natural Science Foundation of China(U1832127)
文摘To investigate the evolution of microstructure and wear behavior of TiSiN coatings with the variation of Si in targets and lays the foundation for its controllable mass production, Ti1-xSixN composite coatings were deposited onto Si(100) and cemented carbide substrates using TiSi targets with different Si content by cathodic arc ion plating. The influences of Si on the microstructure and mechanical properties were studied. Nano-amorphous composite structure appeared in the Ti1-xSixN coatings when Si content in TiSi target was higher than 5 at%. However, further increase of Si content in TiSi target exhibited a negligible effect on the microstructure of Ti1-xSixN coatings. Hardness and deformation resistance were correlated to the content of Si in TiSi targets. Maximum hardness was obtained as the Si content in target increased up to 20 at%. Friction coefficient and wear rate significantly decreased with addition of Si in TiN coating, and then dually increased with the increase of Si content in targets.
文摘采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂层表面主要成分为Ti、Al、Si和N元素,各元素分布均匀,未产生富集现象;高硬度的Ti Al N是由Al原子以置换方式取代Ti N中部分Ti原子生成的,且Ti N和Al N晶粒得到细化,形成较为致密的结构,使涂层硬度得到了提高;Ti、Al、Si、N等原子在结合界面处发生相互扩散,是形成冶金结合的主要机制;Ti Al SN涂层/H13钢体系具有较好的结合强度,用划痕法测得涂层界面结合强度为44 N。
基金Funded by the National Natural Science Foundation of China(No.51402208)the Project by State Key Laboratory of Advanced Technology for Materials Synthesis and Processing(Wuhan University of Technology)(No.2016-KF-11)
文摘The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates by cathodic arc ion plating technology as a metallic IR reflector layer in SSAC. The thickness of Cr thin films was optimized to achieve the minimum thermal emittance. The effects of structural, microstructural, optical, surface and cross-sectional morphological properties of Cr thin films were investigated on the emittance. An optimal thickness about 450 nm of the Cr thin film for the lowest total thermal emittance of 0.05 was obtained. The experimental results suggested that the Cr metallic thin film with optimal thickness could be used as an effective infrared reflector for the development of SSAC structure.
