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High densities of magnetic nanoparticles supported on graphene fabricated by atomic layer deposition and their use as efficient synergistic microwave absorbers 被引量:37
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作者 Guizhen wang Zhe Gao +3 位作者 Gengping Wan Shiwei Lin Peng Yang Yong Qin 《Nano Research》 SCIE EI CAS CSCD 2014年第5期704-716,共13页
An atomic layer deposition (ALD) method has been employed to synthesize Fe3O4/graphene and Ni/graphene composites. The structure and microwave absorbing properties of the as-prepared composites are investigated. The... An atomic layer deposition (ALD) method has been employed to synthesize Fe3O4/graphene and Ni/graphene composites. The structure and microwave absorbing properties of the as-prepared composites are investigated. The surfaces of graphene are densely covered by Fe3O4 or Ni nanoparticles with a narrow size distribution, and the magnetic nanoparticles are well distributed on each graphene sheet without significant conglomeration or large vacancies. The coated graphene materials exhibit remarkably improved electromagnetic (EM) absorption properties compared to the pristine graphene. The optimal reflection loss (RL) reaches -46.4 dB at 15.6 GHz with a thickness of only 1.4 mm for the Fe3O4/graphene composites obtained by applying 100 cycles of Fe2O3 deposition followed by a hydrogen reduction. The enhanced absorption ability arises from the effective impedance matching, multiple interfacial polarization and increased magnetic loss from the added magnetic constituents. Moreover, compared with other recently reported materials, the composites have a lower filling ratio and smaller coating thickness resulting in significantly increased EM absorption properties. This demonstrates that nanoscale surface modification of magnetic particles on graphene by ALD is a very promising way to design lightweight and high-efficiency microwave absorbers. 展开更多
关键词 atomic layer deposition(ALD) GRAPHENE magnetic nanoparticles microwave absorption
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Enhancing both selectivity and coking-resistance of a single-atom Pd1/C3N4 catalyst for acetylene hydrogenation 被引量:22
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作者 Xiaohui Huang Yujia Xia +10 位作者 Yuanjie Cao Xusheng Zheng Haibin Pan Junfa Zhu Chao Ma Hengwei Wang Junjie Li Rui You Shiqiang Wei Weixin Huang Junling Lu 《Nano Research》 SCIE EI CAS CSCD 2017年第4期1302-1312,共11页
Selective hydrogenation is an important industrial catalytic process in chemical upgrading, where Pd-based catalysts are widely used because of their high hydrogenation activities. However, poor selectivity and short ... Selective hydrogenation is an important industrial catalytic process in chemical upgrading, where Pd-based catalysts are widely used because of their high hydrogenation activities. However, poor selectivity and short catalyst lifetime because of heavy coke formation have been major concerns. In this work, atomically dispersed Pd atoms were successfully synthesized on graphitic carbon nitride (g-C3N4) using atomic layer deposition. Aberration-corrected high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) confirmed the dominant presence of isolated Pd atoms without Pd nanoparticle (NP) formation. During selective hydrogenation of acetylene in excess ethylene, the g-C3N4-supported Pd NP catalysts had strikingly higher ethylene selectivities than the conventional Pd/Al2O3 and Pd/SiO2 catalysts. In-situ X-ray photoemission spectroscopy revealed that the considerable charge transfer from the Pd NPs to g-C3N4 likely plays an important role in the catalytic performance enhancement. More impressively, the single-atom Pd1/C3N4 catalyst exhibited both higher ethylene selectivity and higher coking resistance. Our work demonstrates that the single-atom Pd catalyst is a promising candidate for improving both selectivity and coking-resistance in hydrogenation reactions. 展开更多
关键词 single-atom catalyst Pd catalyst atomic layer deposition acetylene hydrogenation C3N4 SELECTIVITY coke formation support effect
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原子层沉积氧化铝包覆羰基铁粉的抗腐蚀性及吸波性能 被引量:19
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作者 刘彦峰 李磊削 +1 位作者 王韫宇 李昌烽 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2017年第7期751-757,共7页
为了提高羰基铁粉的抗腐蚀能力及改善其电磁性能,以TMA和H_2O为前驱体,利用原子层沉积(ALD)方法对羰基铁粉进行表面包覆改性,在羰基铁粉表面包覆不同厚度的氧化铝。通过扫描电镜(SEM)、透射电镜(TEM)、综合热分析仪(TGA)、红外光谱(FTIR... 为了提高羰基铁粉的抗腐蚀能力及改善其电磁性能,以TMA和H_2O为前驱体,利用原子层沉积(ALD)方法对羰基铁粉进行表面包覆改性,在羰基铁粉表面包覆不同厚度的氧化铝。通过扫描电镜(SEM)、透射电镜(TEM)、综合热分析仪(TGA)、红外光谱(FTIR)和矢量网络分析仪等技术手段系统分析了改性前后羰基铁粉性能指标。结果表明,通过ALD方法可在羰基铁粉表面生长纳米级别具有良好保型的氧化铝薄膜,形成了极佳的羰基铁/氧化铝壳层结构复合材料。与原样品相比,包覆改性后的羰基铁粉热稳定性与抗腐蚀性有极大的提高,且随着包覆厚度的增加,抗氧化能力增强,最大抗氧化温度可超过550℃。同时羰基铁粉包覆氧化铝后,其介电常数明显减小,磁导率变化相对较小,改善了原羰基铁粉的电磁参数与吸波性能。 展开更多
关键词 原子层沉积 羰基铁粉 氧化铝 吸波材料 抗腐蚀性
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原子层淀积Al_2O_3薄膜的热稳定性研究 被引量:16
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作者 卢红亮 徐敏 +2 位作者 丁士进 任杰 张卫 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2006年第5期1217-1222,共6页
以Al(CH3)3和H2O为反应源,在270℃下用原子层淀积(ALD)技术在Si衬底上生长了Al2O3薄膜.采用X射线衍射(XRD)、X射线光电子能谱(XPS)、原子力显微镜(AFM)和傅立叶变换红外光谱(FTIR)等分析手段对Al2O3薄膜的热稳定性进行了研究.结果表... 以Al(CH3)3和H2O为反应源,在270℃下用原子层淀积(ALD)技术在Si衬底上生长了Al2O3薄膜.采用X射线衍射(XRD)、X射线光电子能谱(XPS)、原子力显微镜(AFM)和傅立叶变换红外光谱(FTIR)等分析手段对Al2O3薄膜的热稳定性进行了研究.结果表明刚淀积的薄膜中含有少量Al-OH基团,高温退火后,Al-OH基团几乎消失,这归因于Al-OH基团之间发生反应而脱水.退火后的薄膜中O和Al元素的相对比例(1.52)比退火前的(1.57)更接近化学计量比的Al2O3.FTIR分析表明,在刚淀积的Al2O3中有少量的-CH3存在,-CH3含量会随热处理温度的升高而减少.此外,在高温快速热退火后,Al2O3薄膜的表面平均粗糙度(RMS)明显改善,900℃热退火后其RMS达到1.15nm. 展开更多
关键词 AL2O3薄膜 原子层淀积(ALD) X射线光电子能谱(XPS)
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单原子层沉积原理及其应用 被引量:13
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作者 吴宜勇 李邦盛 王春青 《电子工业专用设备》 2005年第6期6-10,17,共6页
传统的薄膜材料制造方法已不能满足未来元器件和集成电路制造的要求,原子层沉积技术由于具有精确的厚度控制、沉积厚度均匀性和一致性等特点,已成为解决微电子制造相关超薄膜材料制造问题的主要解决方法之一,也将成为新的纳米材料和纳... 传统的薄膜材料制造方法已不能满足未来元器件和集成电路制造的要求,原子层沉积技术由于具有精确的厚度控制、沉积厚度均匀性和一致性等特点,已成为解决微电子制造相关超薄膜材料制造问题的主要解决方法之一,也将成为新的纳米材料和纳米结构的制造方法之一。综述了原子层沉积技术的原理、技术设备要求和应用。 展开更多
关键词 单原子层沉积 深亚微米器件 理论和应用
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原子层沉积技术及其在半导体中的应用 被引量:12
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作者 申灿 刘雄英 黄光周 《真空》 CAS 北大核心 2006年第4期1-6,共6页
首先简述原子层沉积(ALD)技术的发展背景,通过分析ALD的互补性和自限制性等工艺基础,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势,着重列举ALD在半导体互连技术、高k电介质等方面的应用。同时指出了目前ALD工艺中存在... 首先简述原子层沉积(ALD)技术的发展背景,通过分析ALD的互补性和自限制性等工艺基础,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势,着重列举ALD在半导体互连技术、高k电介质等方面的应用。同时指出了目前ALD工艺中存在的主要问题。 展开更多
关键词 原子层沉积 前驱体 半导体
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原子层沉积技术的发展现状及应用前景 被引量:14
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作者 魏呵呵 何刚 +2 位作者 邓彬 李文东 李太申 《真空科学与技术学报》 EI CAS CSCD 北大核心 2014年第4期413-420,共8页
随着微电子行业的发展,集成度不断提高、器件尺寸持续减小,使得许多传统微电子材料和科技面临巨大挑战,然而原子层沉积(ALD)技术作为一种优异的镀膜技术,因其沉淀的薄膜纯度高、均匀性及保行性好,还能十分精确地控制薄膜的厚度与成分,... 随着微电子行业的发展,集成度不断提高、器件尺寸持续减小,使得许多传统微电子材料和科技面临巨大挑战,然而原子层沉积(ALD)技术作为一种优异的镀膜技术,因其沉淀的薄膜纯度高、均匀性及保行性好,还能十分精确地控制薄膜的厚度与成分,仍然备受关注并被广泛应用于半导体、光学、光电子、太阳能等诸多领域。本文简要介绍了ALD技术的原理、沉积周期、特征、优势、化学吸附自限制ALD技术和顺次反应自限制ALD技术及ALD本身作为一种技术的发展状况(T-ALD,PEALD和EC-ALD等);重点叙述了ALD技术在半导体领域(高k材料、IC互连技术等)、光学薄膜方面、纳米材料方面、催化剂的应用和新成果。最后,对ALD未来的发展应用前景进行了展望。 展开更多
关键词 原子层沉积技术 薄膜沉积 高K材料 光学薄膜 催化剂
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In vitro corrosion resistance of a Ta2O5 nanofilm on MAO coated magnesium alloy AZ31 by atomic layer deposition 被引量:14
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作者 Chang-Yang Li Chi Yu +4 位作者 Rong-Chang Zeng Bo-Cheng Zhang Lan-Yue Cui Jun Wan Yang Xia 《Bioactive Materials》 SCIE 2020年第1期34-43,共10页
Micro-arc oxidation(MAO)coating with outstanding adhesion strength to Mg alloys has attracted more and more attention.However,owing to the porous structure,aggressive ions easily invaded the MAO/substrate interface th... Micro-arc oxidation(MAO)coating with outstanding adhesion strength to Mg alloys has attracted more and more attention.However,owing to the porous structure,aggressive ions easily invaded the MAO/substrate interface through the through pores,limiting long-term corrosion resistance.Therefore,a dense and biocompatible tantalum oxide(Ta2O5)nanofilm was deposited on MAO coated Mg alloy AZ31 through atomic layer deposition(ALD)technique to seal the micropores and regulate the degradation rate.Surface micrography,chemical compositions and crystallographic structure were characterized using FE-SEM,EDS,XPS and XRD.The corrosion resistance of all samples was evaluated through electrochemical and hydrogen evolution tests.Results revealed that the Ta2O5 film mainly existed in the form of amorphousness.Moreover,uniform deposition of Ta2O5 film and effective sealing of micropores and microcracks in MAO coating were achieved.The current density(icorr)of the composite coating decreased three orders of magnitude than that of the substrate and MAO coating,improving corrosion resistance.Besides,the formation and corrosion resistance mechanisms of the composite coating were proposed. 展开更多
关键词 Magnesium alloys Micro-arc oxidation atomic layer deposition Coatings
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Ultrathin Al2O3-coated reduced graphene oxide membrane for stable lithium metal anode 被引量:12
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作者 Fan Zhang Fei Shen +5 位作者 ZhaoYang Fan Xin Ji Bin Zhao ZhouTing Sun YingYing Xuan XiaoGang Han 《Rare Metals》 SCIE EI CAS CSCD 2018年第6期510-519,共10页
Lithium (Li) metal has been considered as the most attractive anode materials for Li-ion batteries (LIBs) due to its high theoretic specific capacity. The formation of unstable solid electrolyte interphase (SEI)... Lithium (Li) metal has been considered as the most attractive anode materials for Li-ion batteries (LIBs) due to its high theoretic specific capacity. The formation of unstable solid electrolyte interphase (SEI) and dendritic Li on the metal anode, however, hindered its practical application. Herein, to address the issues, a Li-free electrode with ultrathin Al2O3 coated on reduced graphene oxide (rGO) membrane that covers a Cu foil current collector was developed. The composite electrode exhibits excellent interfacial protection of lithium metal deposited between Cu foil and rGO electrochemically. Firstly, it affords good Li^+ permeability from the electrolyte. Secondly, the ultrathin Al2O3 has sufficient mechanical strength to inhibit the penetration of Li dendrite. Li metal was observed uniformly deposited between rGO membrane and Cu collector, and stable cycle performance of Li plating/stripping with Coulombic efficiency of ~ 91.75% at the lOOth cycle is achieved in organic carbonate electrolyte without any additives. 展开更多
关键词 Lithium metal anode atomic layer deposition rGO membrane Li-free anode Li protection
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Single atom catalyst by atomic layer deposition technique 被引量:13
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作者 Niancai Cheng Xueliang(Andy) Sun 《Chinese Journal of Catalysis》 CSCD 北大核心 2017年第9期1508-1514,共7页
Noble single‐atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization.Atomic layer deposition(ALD)is an emerging powerful technique for large‐scale syn... Noble single‐atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization.Atomic layer deposition(ALD)is an emerging powerful technique for large‐scale synthesis of stable single atom.In this review,we summarize recent developments of single atom synthesized by ALD as well as explore future research direction and trends. 展开更多
关键词 Single‐atom atomic layer deposition CATALYSIS Noble catalyst MECHANISM
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微通道板分辨力提高研究 被引量:13
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作者 李晓峰 常乐 +3 位作者 曾进能 李廷涛 赵恒 汤文梅 《光子学报》 EI CAS CSCD 北大核心 2019年第12期114-120,共7页
在微通道板输出端镀制一层逸出功更高的金属膜以覆盖原有的镍铬电极,从而减小微通道板输出电子的动能以及在荧光屏上的弥散,提高微通道板的分辨力.实验结果表明,在微通道板的输出端镀制一层20 nm厚的银层(逸出功为4.3 eV)后,微光像增强... 在微通道板输出端镀制一层逸出功更高的金属膜以覆盖原有的镍铬电极,从而减小微通道板输出电子的动能以及在荧光屏上的弥散,提高微通道板的分辨力.实验结果表明,在微通道板的输出端镀制一层20 nm厚的银层(逸出功为4.3 eV)后,微光像增强器的分辨力从60 lp/mm提高到64 lp/mm,提高了6.6%;而镀制一层20 nm厚的铂层(逸出功为6.4 eV)后,超二代像增强器的分辨力从60 lp/mm提高到68 lp/mm,提高13%.在分辨力提高的同时,微通道板的增益会下降,镀银和镀铂后的微通道板,增益分别下降到原有值的74%和33%.金属膜的逸出功越高,分辨力提高的百分比越高,增益下降的百分比也越高.所以采用该方法来提高微通道板分辨力时,需要采用高增益的微通道板,从而使微通道板的增益下降以后仍能满足使用要求. 展开更多
关键词 微通道板 像增强器 分辨力 逸出功 二次电子发射系数 原子层沉积
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原子层沉积法制备微通道板发射层的性能 被引量:12
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作者 丛晓庆 邱祥彪 +3 位作者 孙建宁 李婧雯 张智勇 王健 《红外与激光工程》 EI CSCD 北大核心 2016年第9期217-222,共6页
随着微通道板的不断发展与完善,通过改善传统工艺提升其性能越来越困难,开发提升微通道板性能的新技术迫在眉睫。纳米薄膜材料的发展及其制备技术的成熟为微通道板的发展提供了契机,利用原子层沉积技术在通道内壁沉积一层氧化铝纳米薄膜... 随着微通道板的不断发展与完善,通过改善传统工艺提升其性能越来越困难,开发提升微通道板性能的新技术迫在眉睫。纳米薄膜材料的发展及其制备技术的成熟为微通道板的发展提供了契机,利用原子层沉积技术在通道内壁沉积一层氧化铝纳米薄膜,作为二次电子发射功能层,可以增强通道内壁的二次电子发射能力,从而提升微通道板的增益性能。通过优化原子层沉积工艺参数可以在微通道板的通道内壁沉积厚度均匀的氧化铝薄膜。研究结果表明,微通道板增益随沉积氧化铝厚度的变化而变化,在氧化铝厚度为60 cycles时,施加偏压800 V时增益可达56 000,约为正常微通道板增益的12倍。 展开更多
关键词 微通道板 原子层沉积 氧化铝纳米薄膜 二次电子发射层
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Atomic-Scale Layer-by-Layer Deposition of Fe SiAl@ZnO@Al_(2)O_(3) Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands 被引量:12
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作者 Wei Tian Jinyao Li +5 位作者 Yifan Liu Rashad Ali Yang Guo Longjiang Deng Nasir Mahmood Xian Jian 《Nano-Micro Letters》 SCIE EI CAS CSCD 2021年第10期308-321,共14页
Developing highly efficient magnetic microwave absorb-ers(MAs)is crucial,and yet challenging for anti-corrosion properties in extremely humid and salt-induced foggy environments.Herein,a dual-oxide shell of ZnO/Al_(2)... Developing highly efficient magnetic microwave absorb-ers(MAs)is crucial,and yet challenging for anti-corrosion properties in extremely humid and salt-induced foggy environments.Herein,a dual-oxide shell of ZnO/Al_(2)O_(3) as a robust barrier to FeSiAl core is introduced to mitigate corrosion resistance.The FeSiAl@ZnO@Al_(2)O_(3) layer by layer hybrid structure is realized with atomic-scale precision through the atomic layer deposition technique.Owing to the unique hybrid structure,the FeSiAl@ZnO@Al_(2)O_(3) exhibits record-high micro-wave absorbing performance in low-frequency bands covering L and S bands with a minimum reflection loss(RLmin)of-50.6 dB at 3.4 GHz.Compared with pure FeSiAl(RLmin of-13.5 dB,a bandwidth of 0.5 GHz),the RLmin value and effective bandwidth of this designed novel absorber increased up to~3.7 and~3 times,respectively.Fur-thermore,the inert ceramic dual-shells have improved 9.0 times the anti-corrosion property of FeSiAl core by multistage barriers towards corrosive medium and obstruction of the electric circuit.This is attributed to the large charge transfer resistance,increased impedance modulus|Z|0.01 Hz,and frequency time constant of FeSiAl@ZnO@Al_(2)O_(3).The research demonstrates a promising platform toward the design of next-generation MAs with improved anti-corrosion properties. 展开更多
关键词 atomic layer deposition Magnetic alloy Dual-oxide-shells Microwave absorption ANTI-CORROSION
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Application of atomic layer deposition in fabricating high-efficiency electrocatalysts 被引量:12
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作者 Huimin Yang Yao Chen Yong Qin 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 北大核心 2020年第2期227-241,共15页
Electrocatalysis is a promising approach to clean energy conversion due to its high efficiency and low environmental pollution. Noble metal materials have been studied to show high activity toward electrocatalyltic re... Electrocatalysis is a promising approach to clean energy conversion due to its high efficiency and low environmental pollution. Noble metal materials have been studied to show high activity toward electrocatalyltic reactions, although such applications remain restricted by the high cost and poor durability of the noble metals. By precisely adjusting the catalyst composition, size, and structure, electrocatalysts with excellent performance can be obtained. Atomic layer deposition(ALD) is a technique used to produce ultrathin films and ultrafine nanoparticles at the atomic level. It possesses unique advantages for the controllable design and synthesis of electrocatalysts. Furthermore, the homogenous composition and structure of the electrocatalysts prepared by ALD favor the exploration of structure-reactivity relationships and catalytic mechanisms. In this review, the mechanism, characteristics, and advantages of ALD in fabricating nanostructures are introduced first. Subsequently, the problems associated with existing electrocatalysts and a series of recently developed ALD strategies to enhance the activity and durability of electrocatalysts are presented. For example, the deposition of ultrafine Pt nanoparticles to increase the utilization and activity of Pt, fabrication of core–shell, overcoat, nanotrap, and other novel structures to protect the noble-metal nanoparticles and enhance the catalyst stability. In addition, ALD developments in synthesizing non-noble metallic electrocatalysts are summarized and discussed. Finally, based on the current studies, an outlook for the ALD application in the design and synthesis of electrocatalysts is presented. 展开更多
关键词 atomic layer deposition ELECTROCATALYSIS PT Catalyst stability Metal-support interaction
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原子层沉积技术及其在光学薄膜中的应用 被引量:11
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作者 何俊鹏 章岳光 +2 位作者 沈伟东 刘旭 顾培夫 《真空科学与技术学报》 EI CAS CSCD 北大核心 2009年第2期173-179,共7页
回顾了原子层沉积(ALD)技术的发展背景,通过分析ALD的基本工艺,并与传统薄膜制备工艺进行了对比研究,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势。着重列举ALD在减反膜、紫外截止膜、折射率可调的薄膜、抗激光损伤薄... 回顾了原子层沉积(ALD)技术的发展背景,通过分析ALD的基本工艺,并与传统薄膜制备工艺进行了对比研究,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势。着重列举ALD在减反膜、紫外截止膜、折射率可调的薄膜、抗激光损伤薄膜及复杂结构光子晶体等方面的应用。同时指出了目前ALD工艺在光学薄膜应用中存在的主要问题,并对ALD未来的发展进行了展望。 展开更多
关键词 原子层沉积 光学薄膜 前驱体 光子晶体
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A1_2O_3钝化及其在晶硅太阳电池中的应用 被引量:11
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作者 张祥 刘邦武 +3 位作者 夏洋 李超波 刘杰 沈泽南 《物理学报》 SCIE EI CAS CSCD 北大核心 2012年第18期444-452,共9页
介绍了Al_2O_3的材料性质及其原子层沉积制备方法,详细阐述了该材料的钝化机制(化学钝化和场效应钝化),并从薄膜厚度、热稳定性及叠层钝化等角度阐释其优化方案.概述了Al_2O_3钝化在晶体硅太阳电池中的应用,主要包括钝化发射极及背面局... 介绍了Al_2O_3的材料性质及其原子层沉积制备方法,详细阐述了该材料的钝化机制(化学钝化和场效应钝化),并从薄膜厚度、热稳定性及叠层钝化等角度阐释其优化方案.概述了Al_2O_3钝化在晶体硅太阳电池中的应用,主要包括钝化发射极及背面局部扩散电池和钝化发射极及背表面电池.最后,对Al_2O_3钝化工艺的未来研究方向和大规模的工业应用进行了展望. 展开更多
关键词 氧化铝(A1_2O_3) 原子层沉积 晶硅太阳电池 钝化
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柔性高阻隔薄膜材料的研究现状 被引量:10
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作者 徐汾丽 周美丽 陈强 《包装工程》 CAS 北大核心 2017年第17期70-76,共7页
目的为柔性高阻隔薄膜的应用提供理论指导。方法综述柔性高阻隔膜的应用现状及存在问题,总结热蒸发、化学气相沉积、原子层沉积等制备柔性高阻隔薄膜的方法、原理、特点及应用,展望高阻隔膜包装材料的发展前景。结果高阻隔薄膜制备工艺... 目的为柔性高阻隔薄膜的应用提供理论指导。方法综述柔性高阻隔膜的应用现状及存在问题,总结热蒸发、化学气相沉积、原子层沉积等制备柔性高阻隔薄膜的方法、原理、特点及应用,展望高阻隔膜包装材料的发展前景。结果高阻隔薄膜制备工艺趋向于单次制备,采用等离子体辅助原子层沉积技术是制备超高阻隔薄膜的首选,原子层沉积(ALD)和分子层沉积(MLD)结合也是获得超高阻隔薄膜的未来发展方向。结论快速、高效地制备柔性高阻隔薄膜是包装工业的发展趋势。 展开更多
关键词 柔性高阻隔薄膜 热蒸发 化学气相沉积 原子层沉积
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Engineering the surface of LiCoO2 electrodes using atomic layer deposition for stable high-voltage lithium ion batteries 被引量:9
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作者 Jin Xie Jie Zhao +7 位作者 Yayuan Liu Haotian Wang Chong Liu Tong Wu Po-Chun Hsu Dingchang Lin Yang Jin Yi Cui 《Nano Research》 SCIE EI CAS CSCD 2017年第11期3754-3764,共11页
Developing advanced technologies to stabilize positive electrodes of lithium ion batteries under high-voltage operation is becoming increasingly important,owing to the potential to achieve substantially enhanced energ... Developing advanced technologies to stabilize positive electrodes of lithium ion batteries under high-voltage operation is becoming increasingly important,owing to the potential to achieve substantially enhanced energy density for applications such as portable electronics and electrical vehicles.Here,we deposited chemically inert and ionically conductive LiAlO2 interfacial layers on LiCoO2 electrodes using the atomic layer deposition technique.During prolonged cycling at high-voltage,the LiAlO2 coating not only prevented interfacial reactions between the LiCoO2 electrode and electrolyte,as confirmed by electrochemical impedance spectroscopy and Raman characterizations,but also allowed lithium ions to freely diffuse into LiCoO2 without sacrificing the power density.As a result,a capacity value close to 200 mA&#183;h&#183;g-1 was achieved for the LiCoO2 electrodes with commercial level loading densities,cycled at the cut-off potential of 4.6 V vs.Li+/Li for 50 stable cycles;this represents a 40% capacity gain,compared with the values obtained for commercial samples cycled at the cut-off potential of 4.2 V vs.Li+/Li. 展开更多
关键词 Lithium ion batteries lithium cobalt oxide atomic layer deposition
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Flexible design of gradient multilayer nanofilms coated on carbon nanofibers by atomic layer deposition for enhanced microwave absorption performance 被引量:9
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作者 Shichao Zhao Lili Yan +6 位作者 Xiaodong Tian Yequn Liu Chaoqiu Chen Yunqin Li Jiankang Zhang Yan Song Yong Qin 《Nano Research》 SCIE EI CAS CSCD 2018年第1期530-541,共12页
Impedance matching is important for achieving high-efficiency microwave absorbers. The high conductivity of dielectric loss materials such as pure metals and carbon nanomaterials generally results in poor absorption o... Impedance matching is important for achieving high-efficiency microwave absorbers. The high conductivity of dielectric loss materials such as pure metals and carbon nanomaterials generally results in poor absorption owing to the low impedance matching between the absorbers and air. Carbon nanostructures are very promising candidates for high-efficiency absorption because of their attractive features including low density, high surface area, and good stability. Herein, a new strategy is proposed to improve the impedance matching of dielectric loss materials using electrospun carbon nanofibers as an example. The carbon nanofibers are coated with specifically designed gradient multilayer nanofilms with gradually increasing electroconductibility synthesized by doping ZnO with different A1203 content (AZO) by atomic layer deposition. The gradient nanofilms are composed of five layers of dielectric films, namely, pure A1203, AZO (5:1, the pulse cycle ratio of ZnO to A1203), pure ZnO, AZO (10:1), and AZO (20:1). The versatile gradient films serve as intermediate layers to tune the impedance matching between air and the carbon nanofiber surfaces. Therefore, the carbon nanofibers coated with gradient films of rationally selected thicknesses exhibit remarkably enhanced microwave absorption performance, and the optimal reflection loss reaches -58.5 dB at 16.2 GHz with a thickness of only 1.8 mm. This work can help further understand the contribution of impedance matching to microwave absorption. Our strategy is general and can be applied to improve the absorption properties of other dielectric loss materials and even for applications in other fields. 展开更多
关键词 atomic layer deposition conductive gradientmultilayer nanofilms electrospun carbonnanofiber microwave absorption dielectric material
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纳米TiO_2电子传输层制备方法及其钙钛矿太阳能电池性能 被引量:10
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作者 梁晓平 陈小强 +3 位作者 赵鸿滨 杨志民 魏峰 屠海令 《稀有金属》 EI CAS CSCD 北大核心 2019年第2期164-169,共6页
采用旋涂法(SC)、原子层沉积(ALD)和磁控溅射(MS)3种方法制备二氧化钛(TiO_2)致密籽晶层并生长TiO_2纳米柱层(TiO_2 nanorod layer),研究了由TiO_2致密层(TiO_2 compact layer)和TiO_2纳米柱层组成的纳米TiO_2层(nano-TiO_2 layer)的形... 采用旋涂法(SC)、原子层沉积(ALD)和磁控溅射(MS)3种方法制备二氧化钛(TiO_2)致密籽晶层并生长TiO_2纳米柱层(TiO_2 nanorod layer),研究了由TiO_2致密层(TiO_2 compact layer)和TiO_2纳米柱层组成的纳米TiO_2层(nano-TiO_2 layer)的形貌结构及其作为电子传输层(ETL)对钙钛矿太阳能电池(PSCs)性能的影响。通过X射线衍射(XRD)、扫描电子显微镜(SEM)和原子力显微镜(AFM)对制备的纳米TiO_2层的结构、形貌进行了表征。研究发现采用磁控溅射制备的TiO_2籽晶层的表面粗糙度最大,为26.6 nm,有利于生长TiO_2纳米柱层,生长的金红石型晶体结构的TiO_2纳米柱具有最好的结晶性。采用紫外可见吸收光谱(ultravioletvisible absorption spectroscopy)对掺氟的SnO_2透明导电玻璃(FTO)/纳米TiO_2层/钙钛矿层结构的光吸收性能进行分析。采用电流-电压曲线(I-V曲线)对不同纳米TiO_2层的钙钛矿太阳能电池性能进行了测试分析。结果表明,与旋涂法、原子层沉积方法相比,采用磁控溅射制备的纳米TiO_2层作为电子传输层的钙钛矿太阳能电池具有最佳的转换效率。 展开更多
关键词 钙钛矿太阳能电池 旋涂法 原子层沉积 磁控溅射 氧化钛 电子传输层
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