对于N单元变形镜,模型式无波前探测自适应光学系统只需N+1次远场光斑测量,收敛速度快。使用88单元变形镜、CCD成像器件等建立自适应光学系统仿真平台,分别从理论分析和仿真实验出发探讨模型式无波前探测自适应光学系统在噪声情况下的波...对于N单元变形镜,模型式无波前探测自适应光学系统只需N+1次远场光斑测量,收敛速度快。使用88单元变形镜、CCD成像器件等建立自适应光学系统仿真平台,分别从理论分析和仿真实验出发探讨模型式无波前探测自适应光学系统在噪声情况下的波前校正性能。结果表明:噪声条件下,基于模型的无波前探测自适应光学系统收敛速度保持不变;相同湍流条件时,不同噪声水平下的校正效果接近。与噪声水平50 d B时的结果相比,按照给定湍流条件从弱到强,噪声水平为30 d B时校正后平均RMS相对误差分别为4.75%、4.04%和2.58%。上述结果验证了基于模型的无波前探测自适应光学系统具有较强的抗噪能力。展开更多
We developed an adaptive optics system to correct the wave-front distortion of an intense fs laser beam from our multi-TW laser system, Jiguang II. In this paper, the instruments of the adaptive optical system are des...We developed an adaptive optics system to correct the wave-front distortion of an intense fs laser beam from our multi-TW laser system, Jiguang II. In this paper, the instruments of the adaptive optical system are described and the experimental results of the closed-loop wave-front correction are presented. A distorted laser wave-front of 20 wavelengths of P-V values was corrected to 0.15 wavelength of P-V values. The beam quality of the laser system varies from 3.5 diffraction limit to 1.5 diffraction limit.展开更多
文摘对于N单元变形镜,模型式无波前探测自适应光学系统只需N+1次远场光斑测量,收敛速度快。使用88单元变形镜、CCD成像器件等建立自适应光学系统仿真平台,分别从理论分析和仿真实验出发探讨模型式无波前探测自适应光学系统在噪声情况下的波前校正性能。结果表明:噪声条件下,基于模型的无波前探测自适应光学系统收敛速度保持不变;相同湍流条件时,不同噪声水平下的校正效果接近。与噪声水平50 d B时的结果相比,按照给定湍流条件从弱到强,噪声水平为30 d B时校正后平均RMS相对误差分别为4.75%、4.04%和2.58%。上述结果验证了基于模型的无波前探测自适应光学系统具有较强的抗噪能力。
基金This work was partly supported by the National Natural Science Foundation of China(Grant Nos.60225005,60308001)the NKBRSF(Grant No.G1999075202)the National Hi-tech ICF program.
文摘We developed an adaptive optics system to correct the wave-front distortion of an intense fs laser beam from our multi-TW laser system, Jiguang II. In this paper, the instruments of the adaptive optical system are described and the experimental results of the closed-loop wave-front correction are presented. A distorted laser wave-front of 20 wavelengths of P-V values was corrected to 0.15 wavelength of P-V values. The beam quality of the laser system varies from 3.5 diffraction limit to 1.5 diffraction limit.
