The adsorption and diffusion behavior of Cl^- on sputtering Fe-20 Cr nanocrystalline（NC） thin film compared with corresponding coarse crystalline（CC） alloy has been studied in HCl ＋ NaCl solution（pH = 2,[Cl^-]=0...The adsorption and diffusion behavior of Cl^- on sputtering Fe-20 Cr nanocrystalline（NC） thin film compared with corresponding coarse crystalline（CC） alloy has been studied in HCl ＋ NaCl solution（pH = 2,[Cl^-]=0.1 mol/L） by electrochemical techniques,X-ray photoelectron spectroscopy（XPS） and the firstprinciples calculations.The XPS results show that adsorption and diffusion of Cl^- in the passive film has been inhibited on NC thin film.Ultra-violet photoelectron spectroscopy（UPS） results show that the work function Φ s of NC thin film（4.7 eV） is higher than that of CC alloy（4.5 eV）.The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.展开更多
Ta / NiFe/Bi （ Ag, Cu ）/FeMn/Ta and Ta / NiFe1/FeMn / Bi （ Ag, Cu ）/NiFen/Ta films were prepared by magnetic sputtering. The texture and the dependences of the exchange-coupling field on the thickness of Bi, Ag, a...Ta / NiFe/Bi （ Ag, Cu ）/FeMn/Ta and Ta / NiFe1/FeMn / Bi （ Ag, Cu ）/NiFen/Ta films were prepared by magnetic sputtering. The texture and the dependences of the exchange-coupling field on the thickness of Bi, Ag, and Cu in Ta/NiFe/Bi（Ag, Cu） /FeMn/Ta and Ta/NiFe/FeMn/Bi（Ag, Cu）/NiFe/Ta films were studied. XPS results indicate that the Bi atoms migrated into the FeMn layer during the deposition process and a FeMnBi alloy was probably formed or the Bi atoms existed as an impurity in the FeMn layer in Ta/NiFe/Bi（Ag, Cu ）/FeMn/Ta. Otherwise, in Ta/NiFe/FeMn/Bi （Ag, Cu）/NiFe/Ta films, Bi, Ag, and Cu atoms do not remain entirely at the interface of the FeMn/ NiFeⅡfilm, but at least partly segregate to the surface of the NiFe film.展开更多
基金supported by the National Basic Research Program of China (No.2014CB643303)the National Natural Science Foundation of China (Nos.50801063 and 51271187)
文摘The adsorption and diffusion behavior of Cl^- on sputtering Fe-20 Cr nanocrystalline（NC） thin film compared with corresponding coarse crystalline（CC） alloy has been studied in HCl ＋ NaCl solution（pH = 2,[Cl^-]=0.1 mol/L） by electrochemical techniques,X-ray photoelectron spectroscopy（XPS） and the firstprinciples calculations.The XPS results show that adsorption and diffusion of Cl^- in the passive film has been inhibited on NC thin film.Ultra-violet photoelectron spectroscopy（UPS） results show that the work function Φ s of NC thin film（4.7 eV） is higher than that of CC alloy（4.5 eV）.The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.
基金This work was supported by the National Natural Science Foundation （No. 50471093） Postdoctoral Science Foundation of China （No. 2005037580 ）.
文摘Ta / NiFe/Bi （ Ag, Cu ）/FeMn/Ta and Ta / NiFe1/FeMn / Bi （ Ag, Cu ）/NiFen/Ta films were prepared by magnetic sputtering. The texture and the dependences of the exchange-coupling field on the thickness of Bi, Ag, and Cu in Ta/NiFe/Bi（Ag, Cu） /FeMn/Ta and Ta/NiFe/FeMn/Bi（Ag, Cu）/NiFe/Ta films were studied. XPS results indicate that the Bi atoms migrated into the FeMn layer during the deposition process and a FeMnBi alloy was probably formed or the Bi atoms existed as an impurity in the FeMn layer in Ta/NiFe/Bi（Ag, Cu ）/FeMn/Ta. Otherwise, in Ta/NiFe/FeMn/Bi （Ag, Cu）/NiFe/Ta films, Bi, Ag, and Cu atoms do not remain entirely at the interface of the FeMn/ NiFeⅡfilm, but at least partly segregate to the surface of the NiFe film.
