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溅射制备的Al_2O_3薄膜的光学性质 被引量:4
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作者 骆红 廖国进 《沈阳农业大学学报》 CAS CSCD 北大核心 2010年第4期468-472,共5页
采用中频反应磁控溅射技术,在石英基片上制备了氧化铝薄膜。研究了氧化铝薄膜的XRD谱和Al 2p核心能级的XPS谱随不同制备氧分压比的演变规律。结果表明:随着制备氧分压比的增加,薄膜中的铝元素从金属态逐渐升高到正3价,同时薄膜由晶态逐... 采用中频反应磁控溅射技术,在石英基片上制备了氧化铝薄膜。研究了氧化铝薄膜的XRD谱和Al 2p核心能级的XPS谱随不同制备氧分压比的演变规律。结果表明:随着制备氧分压比的增加,薄膜中的铝元素从金属态逐渐升高到正3价,同时薄膜由晶态逐渐转变成非晶态。当氧分压比为11%时,可以得到符合化学计量比的、非晶态的、表面非常光滑的氧化铝薄膜,该薄膜具有较高的折射率和较低的消光系数。AFM表面相貌图片显示:随氧分压比增加薄膜表面形貌呈现逐渐光滑的趋势。薄膜在300~1100nm波段有很高的透射率。以上性质表明用中频反应磁控溅射技术制备的氧化铝薄膜在光学领域有着广泛的应用前景。 展开更多
关键词 中频反应磁控溅射 氧化铝薄膜 x射线光电子能谱(xps) 光学特性
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Surface Analysis of ZIRLO Alloy Implanted with Carbon
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作者 彭德全 白新德 +2 位作者 潘峰 孙辉 陈宝山 《Journal of Rare Earths》 SCIE EI CAS CSCD 2005年第S1期373-377,共5页
ZIRLO alloy specimens were implanted with carbon ions with fluence range from 1×10 16 to 1×10 18ions·cm -2, using a MEVVA source at an extraction voltage of 40 kV at maximum temperature of 380 ℃. The s... ZIRLO alloy specimens were implanted with carbon ions with fluence range from 1×10 16 to 1×10 18ions·cm -2, using a MEVVA source at an extraction voltage of 40 kV at maximum temperature of 380 ℃. The surfaces of the implanted samples were then analyzed and the TRIM 96 computer code was used to simulate the depth distribution of carbon. The valences of elements in the implanted surface of ZIRLO alloy were analyzed by X-ray photoemission spectroscopy (XPS); and then the depth distributions of the elements on the surface of the samples were obtained by Auger electron spectroscopy (AES). Scanning electron microscopy (SEM) was used to examine the micro-morphology of implanted samples. Glancing angle X-ray diffraction (GAXRD) at 0.30 incident angles was employed to examine the phase transformations of implanted samples. It shows that the as-received ZIRLO alloy is mainly composed of hexagonal alpha zirconium, as for implanted samples, there appeared hexagonal zirconia (H-ZrO_ 0.35) and sigma zirconium carbide (δ-Zr_3C_2), and the δ-Zr_3C_2 increased when increasing the fluence. When the fluence reached 1×10 18 ions·cm -2, the concentration of δ-Zr_3C_2 is the maximum in all the samples. The micro-morphology of implanted samples are similar, there are many pits with diameters ranging from 1 to 3 μm on the implanted surfaces. 展开更多
关键词 ZIRLO alloy carbon ion implantation x-ray photoemission spectroscopy (xps) auger electron spectroscopy (AES) glancing angle x-ray diffraction (GAxRD)
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Effect of copper ions implantation on the corrosion behavior of ZIRLO alloy in 1 mol/L H_2SO_4
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作者 Dequan Peng Xinde Bai Baoshan Chen 《Journal of University of Science and Technology Beijing》 CSCD 2006年第2期158-163,共6页
In order to study the effect of copper ion implantation on the aqueous corrosion behavior of ZIRLO alloy, specimens were implanted with copper ions with fluences ranging from 1×10^16 to 1×10^ ions/cm^2, usin... In order to study the effect of copper ion implantation on the aqueous corrosion behavior of ZIRLO alloy, specimens were implanted with copper ions with fluences ranging from 1×10^16 to 1×10^ ions/cm^2, using a metal vapor vacuum arc source (MEVVA) at an extraction voltage of 40 kV, The valence states and depth distributions of elements in the surface layer of the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), respectively. Glancing angle X-ray diffraction (GAXRD) was employed to examine the phase transformation due to the copper ion implantation. The potcntiodynamic polarization technique was used to evaluate the aqueous corrosion resistance of implanted ZIRLO alloy in a 1 mol/L H2SO4 solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of ZIRLO alloy implanted with copper ions when the fluence is 5×10^16 ions/cm^2. When the fluence is 1×10^16 or 1×10^17 ions/cm^2, the corrosion resistance of implanted sanaples was bad. Finally, the mechanism of the corrosion behavior of copper-implanted ZIRLO alloy was discussed. 展开更多
关键词 ZIRLO alloy corrosion resistance copper ion implantation x-ray photoemission spectroscopy xps Auger electron spectroscopy (AES)
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Irradiation damage simulation of Zircaloy-4 using argon ions bombardment
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作者 Dequan Peng Xinde Bai Feng Pan 《Journal of University of Science and Technology Beijing》 CSCD 2008年第3期285-289,共5页
To simulate irradiation damage, argon ion was implanted in the Zircaloy-4 with the fluence ranging from 1 × 10^16 to 1 × 10^17 cm^-2, using accelerating implanter at an extraction voltage of 190 kV and liqui... To simulate irradiation damage, argon ion was implanted in the Zircaloy-4 with the fluence ranging from 1 × 10^16 to 1 × 10^17 cm^-2, using accelerating implanter at an extraction voltage of 190 kV and liquid nitrogen temperature. Then the influence of argon ion implantation on the aqueous corrosion behavior of Zircaloy-4 was studied. The valence states of elements in the surface layer of the samples were analyzed using X-ray photoelectron spectroscopy (XPS). Transmission electron microscopy (TEM) was used to examine the microstructure of the argon-implanted samples. The potentiodynamic polarization technique was employed to evaluate the aqueous corrosion resistance of implanted Zircaloy-4 in 1 mol/L HzSO4 solution. It is found that there appear bubbles on the surface of the samples when the argon fluence is 1 × 10^16 cm^-2. The microstructure of argon-implanted samples changes from amorphous to partial amorphous, then to polycrystalline, and again to amorphous. The corrosion resistance of implanted samples linearly declines with the increase of fluence approximately, which is attributed to the linear increase of the irradiation damage. 展开更多
关键词 ZIRCALOY-4 corrosion resistance argon ion implantation x-ray photoemission spectroscopy xps transmission electron microscopy (TEM)
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高灵敏度低能离子散射谱在多相催化研究中的应用
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作者 郑燕萍 陈明树 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2020年第5期651-663,共13页
多相催化反应大多在催化剂表层发生,研究催化剂的表面组成、结构、化学态和催化性能之间的关系对于设计、优化工业催化剂具有重要意义.高灵敏度低能离子散射谱(HS-LEIS)既可测定样品(包括粉末及块状样品、导体和半导体等)最外原子层的... 多相催化反应大多在催化剂表层发生,研究催化剂的表面组成、结构、化学态和催化性能之间的关系对于设计、优化工业催化剂具有重要意义.高灵敏度低能离子散射谱(HS-LEIS)既可测定样品(包括粉末及块状样品、导体和半导体等)最外原子层的元素组成和相对含量,又可推断催化剂的表面结构,因此被广泛应用于各类催化反应研究中.本文介绍了HS-LEIS的基本原理,并概述了其在催化研究中的一些应用,包括催化剂表面组成、表面活性位、双金属催化剂表面偏析和表面结构、核壳结构等的研究.同时还对比分析了目前在表面研究中应用广泛的X-射线光电子能谱(XPS)和HS-LEIS表征结果的差异,进一步说明HS-LEIS能够更为准确地获得催化剂表面的真实情况. 展开更多
关键词 高灵敏度低能离子散射谱 低能离子散射谱 x-射线光电子能谱 多相催化 表面组成 催化剂构效关系
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