New visible transparent, UV absorption, and high infrared reflection properties have been realized by depositing multilayer Si O2/Zn O: Al/Ce O2-Ti O2/Si O2 films onto glass substrates at low temperature by radio freq...New visible transparent, UV absorption, and high infrared reflection properties have been realized by depositing multilayer Si O2/Zn O: Al/Ce O2-Ti O2/Si O2 films onto glass substrates at low temperature by radio frequency magnetron sputtering. Optimum thickness of Si O2, Zn O: Al(ZAO) and Ce O2-Ti O2(CTO) films were designed with the aid of thin film design software. The degree of antireflection can be controlled by adjusting the thickness and refractive index. The outer Si O2 film can diminish the interference coloring and increase the transparency; the inner Si O2 film improves the adhesion of the coating on the glass substrate and prevents Ca2+, Na+ in the glass substrate from entering the ZAO film. The average transmittance in the visible light range increases by nearly 18%-20%, as compared to double layer ZAO/CTO films. And the films display high infrared reflection rate of above 75% in the wavelength range of 10-25 μm and good UV absorption(> 98%) properties. These systems are easy to produce on a large scale at low cost and exhibit high mechanical and chemical durability. The triple functional films with high UV absorption, antireflective and high infrared reflection rate will adapt to application in flat panel display and architectural coating glass, automotive glass, with diminishing light pollution as well as decreasing eye fatigue and increasing comfort.展开更多
采用4种不同用量的硅烷偶联剂KH-550对纳米SiO_2表面进行改性,并检测改性后纳米SiO_2粒径的大小;研究了改性后纳米SiO_2的添加量对芳纶纸性能的影响;通过扫描电镜(SEM)观察添加改性纳米SiO_2后芳纶纸的表观形貌,并将纳米SiO_2添加前后...采用4种不同用量的硅烷偶联剂KH-550对纳米SiO_2表面进行改性,并检测改性后纳米SiO_2粒径的大小;研究了改性后纳米SiO_2的添加量对芳纶纸性能的影响;通过扫描电镜(SEM)观察添加改性纳米SiO_2后芳纶纸的表观形貌,并将纳米SiO_2添加前后纸张抗张强度和介电强度进行了对比。结果表明,随着硅烷偶联剂用量的增加,改性纳米SiO_2的粒径有所减小;当纳米SiO_2与硅烷偶联剂KH-550配比为5 g∶20 m L、改性纳米SiO_2添加量为5%时,芳纶纸的抗张强度提高了66.2%,硅烷偶联剂用量的增加对纸张伸长率有一定影响,其紧度变化不明显;SEM图显示改性纳米SiO_2粒子填充在纸张空隙处利于纸张性能的增强;添加改性纳米SiO_2较未添加纳米SiO_2和添加未改性纳米SiO_2芳纶纸的抗张强度和介电强度均有所提高。展开更多
基金Funded by the Natural Science Foundation of Hubei Province(No.2014CFB563)the key Technology Innovation Project of Hubei Province(No.2013AAA005)China Postdoctoral Science Foundation(Nos.2013T60752 and 2012M511689)
文摘New visible transparent, UV absorption, and high infrared reflection properties have been realized by depositing multilayer Si O2/Zn O: Al/Ce O2-Ti O2/Si O2 films onto glass substrates at low temperature by radio frequency magnetron sputtering. Optimum thickness of Si O2, Zn O: Al(ZAO) and Ce O2-Ti O2(CTO) films were designed with the aid of thin film design software. The degree of antireflection can be controlled by adjusting the thickness and refractive index. The outer Si O2 film can diminish the interference coloring and increase the transparency; the inner Si O2 film improves the adhesion of the coating on the glass substrate and prevents Ca2+, Na+ in the glass substrate from entering the ZAO film. The average transmittance in the visible light range increases by nearly 18%-20%, as compared to double layer ZAO/CTO films. And the films display high infrared reflection rate of above 75% in the wavelength range of 10-25 μm and good UV absorption(> 98%) properties. These systems are easy to produce on a large scale at low cost and exhibit high mechanical and chemical durability. The triple functional films with high UV absorption, antireflective and high infrared reflection rate will adapt to application in flat panel display and architectural coating glass, automotive glass, with diminishing light pollution as well as decreasing eye fatigue and increasing comfort.
文摘采用4种不同用量的硅烷偶联剂KH-550对纳米SiO_2表面进行改性,并检测改性后纳米SiO_2粒径的大小;研究了改性后纳米SiO_2的添加量对芳纶纸性能的影响;通过扫描电镜(SEM)观察添加改性纳米SiO_2后芳纶纸的表观形貌,并将纳米SiO_2添加前后纸张抗张强度和介电强度进行了对比。结果表明,随着硅烷偶联剂用量的增加,改性纳米SiO_2的粒径有所减小;当纳米SiO_2与硅烷偶联剂KH-550配比为5 g∶20 m L、改性纳米SiO_2添加量为5%时,芳纶纸的抗张强度提高了66.2%,硅烷偶联剂用量的增加对纸张伸长率有一定影响,其紧度变化不明显;SEM图显示改性纳米SiO_2粒子填充在纸张空隙处利于纸张性能的增强;添加改性纳米SiO_2较未添加纳米SiO_2和添加未改性纳米SiO_2芳纶纸的抗张强度和介电强度均有所提高。
