The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si fil...The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si films were examined. Numerical simulations of the magnetic field configuration showed that increasing the coil current significantly changed the magnetic field distribution between the substrate and targets. The saturated ion current density Ji in the substrate position measured by using a circular flat probe increased from 0.18 to 0.55 mA/cm2 with the coil current ranging from 0 to 6 A. X-ray diffraction and Raman results revealed that increasing the ion density near the substrate would benefit crystallization of films and the preferential growth along [lI1] orientation. From analysis of the surface morphology and the microstructure of Si films grown under different plasma conditions, it is found that with increasing the Ji, the surface of the film was smoothed and the alteration in the surface roughness was mainly correlated to the localized surface diffusion of the deposited species and the crystallization behavior of the films.展开更多
具有高折射率的 Ti O2 膜在反射型液晶显示器的关键部件高反射率背板膜系的制备中起重要作用。本文使用国内首家在线中频双靶反应磁控溅射设备进行了制备 Ti O2 膜的探索 ,完成了相应的膜层测试与分析。实验结果表明双靶磁控反应溅射可...具有高折射率的 Ti O2 膜在反射型液晶显示器的关键部件高反射率背板膜系的制备中起重要作用。本文使用国内首家在线中频双靶反应磁控溅射设备进行了制备 Ti O2 膜的探索 ,完成了相应的膜层测试与分析。实验结果表明双靶磁控反应溅射可以制备高折射率的 Ti O2 膜 ,实验还从折射率的角度证明中频双靶反应溅射与直流反应溅射的效果一致 。展开更多
基金partly supported by the project from the State Key Laboratory of Electronic Thin Films and Integrated Devices under grant No.KFJJ200902
文摘The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si films were examined. Numerical simulations of the magnetic field configuration showed that increasing the coil current significantly changed the magnetic field distribution between the substrate and targets. The saturated ion current density Ji in the substrate position measured by using a circular flat probe increased from 0.18 to 0.55 mA/cm2 with the coil current ranging from 0 to 6 A. X-ray diffraction and Raman results revealed that increasing the ion density near the substrate would benefit crystallization of films and the preferential growth along [lI1] orientation. From analysis of the surface morphology and the microstructure of Si films grown under different plasma conditions, it is found that with increasing the Ji, the surface of the film was smoothed and the alteration in the surface roughness was mainly correlated to the localized surface diffusion of the deposited species and the crystallization behavior of the films.
文摘具有高折射率的 Ti O2 膜在反射型液晶显示器的关键部件高反射率背板膜系的制备中起重要作用。本文使用国内首家在线中频双靶反应磁控溅射设备进行了制备 Ti O2 膜的探索 ,完成了相应的膜层测试与分析。实验结果表明双靶磁控反应溅射可以制备高折射率的 Ti O2 膜 ,实验还从折射率的角度证明中频双靶反应溅射与直流反应溅射的效果一致 。
