High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppressio...High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppression ratio of 49.53 dB. The current- and temperature-tuning rates of the DFB mode wavelength are 0.01 nm/mA and 0.13 nm/℃, respectively. A characteristic temperature of 51 K is also confirmed. The DFB laser demonstrates good performance and can be apt）lied to H2O concentration sensing.展开更多
用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激...用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激光器泵浦方式实现了低阈值光泵激射 ,测出单个微碟激光器的阈值光功率为 15 0μW,激射波长约为 1.6μm,品质因数 Q=80 0 ,激射光谱线宽为 2 nm,同时指出微碟激光器激射线宽比 F-展开更多
报道了气态分子束外延 ( GSMBE)生长 1.8— 2 .0μm波段 In Ga As/ In Ga As P应变量子阱激光器的研究结果 .1.8μm波段采用平面电极条形结构 ,已制备成功 10μm和 80μm条宽器件 ,器件腔长 5 0 0μm,室温下光致发光中心波长约为 1.82...报道了气态分子束外延 ( GSMBE)生长 1.8— 2 .0μm波段 In Ga As/ In Ga As P应变量子阱激光器的研究结果 .1.8μm波段采用平面电极条形结构 ,已制备成功 10μm和 80μm条宽器件 ,器件腔长 5 0 0μm,室温下光致发光中心波长约为 1.82μm,在 77K温度下以脉冲方式激射 ,阈值电流分别约为 2 5 0 m A和 6 0 0 m A ,中心波长分别在 1.6 9μm和 1.73μm附近 .2 .0μm波段 ,制备成功 8μm宽脊波导结构器件 ,器件腔长 5 0 0μm,室温光致发光中心波长约为1.98μm ,77K温度下以脉冲方式激射 ,阈值电流约为 2 0 m A ,中心波长约为 1.89μm。展开更多
GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed r...GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.展开更多
We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are g...We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are grown on GaAs substrates by low-pressure metal organic chemical vapor deposition technology. Then, high- quality MQWs laser structures are grown on the InP buffer layer. Under quasi-continuous wave （QCW） condition, a threshold current of 476 mA and slope efficiency of 0.15 mW/mA are achieved for a broad area device with 50 μm wide strip and 500 μm long cavity at room-temperature. The peak wavelength of emission spectrum is 1549.5 nm at 700 mA. The device is operating for more than 2000 h at room-temperature and 600 mA.展开更多
基金supported by the National "863" Project of China(No.2012AA012203)the National "973" Program of China(No.2011CB301702)
文摘High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppression ratio of 49.53 dB. The current- and temperature-tuning rates of the DFB mode wavelength are 0.01 nm/mA and 0.13 nm/℃, respectively. A characteristic temperature of 51 K is also confirmed. The DFB laser demonstrates good performance and can be apt）lied to H2O concentration sensing.
文摘用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激光器泵浦方式实现了低阈值光泵激射 ,测出单个微碟激光器的阈值光功率为 15 0μW,激射波长约为 1.6μm,品质因数 Q=80 0 ,激射光谱线宽为 2 nm,同时指出微碟激光器激射线宽比 F-
文摘GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.
基金supported by the National Natural Science Foundation of China(Nos.61274044 and61020106007)the National Basic Research Program of China(No.2010CB327600)+3 种基金the Natural Science Foundational Science and Technology Cooperation Projects(No.2011RR000100)the 111 Project of China(No.B07005)the Fundamental Research Funds for the Central University(No.2013RC1205)the Specialized Research Fund for the Doctoral Program of Higher Education(No.20130005130001)
文摘We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are grown on GaAs substrates by low-pressure metal organic chemical vapor deposition technology. Then, high- quality MQWs laser structures are grown on the InP buffer layer. Under quasi-continuous wave （QCW） condition, a threshold current of 476 mA and slope efficiency of 0.15 mW/mA are achieved for a broad area device with 50 μm wide strip and 500 μm long cavity at room-temperature. The peak wavelength of emission spectrum is 1549.5 nm at 700 mA. The device is operating for more than 2000 h at room-temperature and 600 mA.
