This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si（001） substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive ...This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si（001） substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average refiectances （400-1000 nm） is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.展开更多
基金supported by the Special Project of Shanghai Nano-technology (Grant No.0852nm02400)the National Natural Science Foundation of China (Grant Nos.10804072 and 60806031)the Key Fundamental Project of Shanghai (GrantNo.08JC1410400)
文摘This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si（001） substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average refiectances （400-1000 nm） is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.
