The Cr-Mo-N films were deposited on high speed steel（HSS） substrates by a DC reactive magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage（Vb）...The Cr-Mo-N films were deposited on high speed steel（HSS） substrates by a DC reactive magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage（Vb）,substrate temperature（Ts） and gas flow ratio（R= N2/（N2+ Ar）） on the microstructure,morphology,as well as the mechanical and tribological properties of the Cr-Mo-N films were investigated by virtue of X-ray diffraction（XRD） analysis,X-ray photoelectron spectroscopy（XPS）,field emission scanning electron microscopy（FESEM）,atomic force microscopy（AFM）,nano-indentation test,ball-on-disk tribometer,and Rockwell indenter et al.With increasing Vbto-100 V,the preferred orientation of the films changed from（111） to（200） and their mechanical and tribological properties were improved gradually,too.It was also found that Tsgave a significant effect on mechanical property enhancement.When the Tsreached 300 ℃,the film obtained the highest hardness and effective elastic modulus of approximately 30.1 and 420.5 GPa,respectively and its critical load increased to about 54 N.With increasing R,the phase transformation from body-centered-cubic（bcc） Cr and hexagonal CrMoNxmultiphase to single face-centered-cubic（fcc） solid solution phase was observed.The correlations between values of hardness（H）,effective elastic modulus（E*）,HIE*,H3/E*2,elastic recovery（1/14） and tribological properties of the films were also investigated.The results showed that the elastic recovery played an important role in the tribological behavior.展开更多
Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical ...Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical and electrical properties of IWO thin films were investigated. The thickness and surface morphology of the films are both closely dependent on the sputtering power and the substrate temperature. The transparency of the films decreases with the increase of the sputtering power but is not seriously influenced by substrate temperature. All the IWO thin film samples have high transmittance in near-infrared spectral range. With either the sputtering power or the growth temperature increases, the resistivity of the film decreases at the beginning and increases after the optimum parameters. The as-deposited IWO films with minimum resistivity of 6.4 10 4 cm were obtained at a growth temperature of225 C and sputteringpower of 40 W, with carrier mobility of 33.0 cm 2 V 1 s 1 and carrier concentration of 2.8 10 20 cm 3 and the average transmittance of about 81% in near-infrared region and about 87% in visible region.展开更多
Nanocrystalline ZrB2 film and nanocomposite Zr-B-O-N films were prepared by non-reactive as well as re- active magnetron sputtering techniques, respectively. By means of X-ray diffraction analysis, electron probe micr...Nanocrystalline ZrB2 film and nanocomposite Zr-B-O-N films were prepared by non-reactive as well as re- active magnetron sputtering techniques, respectively. By means of X-ray diffraction analysis, electron probe microanalysis, X-ray photoelectron spectroscopy, and scanning electron microscopy, the influence of nitrogen flow ratio on the film microstructure and characteristics were investigated systematically, including the depo- sition rate, chemical compositions, phase constituents, grain size, chemical bonding, as well as cross-sectional morphologies. Meanwhile, the hardness and adhesion of above films were also evaluated by micro-indentation method and a scratch tester. With increasing the nitrogen flow ratio, the deposition rate of above films de- creased approximately linearly, whereas the contents of N and O in the films increased gradually and tended to saturation. Moreover, the film microstructure was also altered gradually from a fine columnar microstructure to a featureless glass-structure. As the nitrogen flow ratio was 11.7%, the Zr-B-O-N film possessed an typical nanocomposite structure and presented good mechanical properties. During the process of reactive sputtering of metal borides, the introduction of nitrogen can show a pronounced suppression of columnar grain growth and strong nanocomposite structure forming ability.展开更多
基金supported by the National Key Basic Research Program of China (973 Program, No. 2012CB625100)the National Natural Science Foundation of China (NSFC, No. 51171197)the Natural Science Foundation of Liaoning Province of China (No. 2013020093)
文摘The Cr-Mo-N films were deposited on high speed steel（HSS） substrates by a DC reactive magnetron sputtering equipment coupled with two horizontal magnetron sources.The effects of substrate negative bias voltage（Vb）,substrate temperature（Ts） and gas flow ratio（R= N2/（N2+ Ar）） on the microstructure,morphology,as well as the mechanical and tribological properties of the Cr-Mo-N films were investigated by virtue of X-ray diffraction（XRD） analysis,X-ray photoelectron spectroscopy（XPS）,field emission scanning electron microscopy（FESEM）,atomic force microscopy（AFM）,nano-indentation test,ball-on-disk tribometer,and Rockwell indenter et al.With increasing Vbto-100 V,the preferred orientation of the films changed from（111） to（200） and their mechanical and tribological properties were improved gradually,too.It was also found that Tsgave a significant effect on mechanical property enhancement.When the Tsreached 300 ℃,the film obtained the highest hardness and effective elastic modulus of approximately 30.1 and 420.5 GPa,respectively and its critical load increased to about 54 N.With increasing R,the phase transformation from body-centered-cubic（bcc） Cr and hexagonal CrMoNxmultiphase to single face-centered-cubic（fcc） solid solution phase was observed.The correlations between values of hardness（H）,effective elastic modulus（E*）,HIE*,H3/E*2,elastic recovery（1/14） and tribological properties of the films were also investigated.The results showed that the elastic recovery played an important role in the tribological behavior.
基金supported by the National Natural Science Foundation of China (No. 50902006)the National High Technology Development 863 Program of China (No.2009AA03Z428)
文摘Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical and electrical properties of IWO thin films were investigated. The thickness and surface morphology of the films are both closely dependent on the sputtering power and the substrate temperature. The transparency of the films decreases with the increase of the sputtering power but is not seriously influenced by substrate temperature. All the IWO thin film samples have high transmittance in near-infrared spectral range. With either the sputtering power or the growth temperature increases, the resistivity of the film decreases at the beginning and increases after the optimum parameters. The as-deposited IWO films with minimum resistivity of 6.4 10 4 cm were obtained at a growth temperature of225 C and sputteringpower of 40 W, with carrier mobility of 33.0 cm 2 V 1 s 1 and carrier concentration of 2.8 10 20 cm 3 and the average transmittance of about 81% in near-infrared region and about 87% in visible region.
基金funded the National Core Research Center(NCRC)Program through the National Research Foundation of Koreafunded by the Ministry of Education,Science and Technology(No.2012-0000-957)+1 种基金by the Fundamental R&D Program for Core Technology of Materials funded by the Ministry of Knowledge Economy,Republic of Koreafunded by the Shenyang Science&Technology Plan Project for the Special of Tackling Key Problems of Industrial Science and Technology(No.F12-012-2-00)
文摘Nanocrystalline ZrB2 film and nanocomposite Zr-B-O-N films were prepared by non-reactive as well as re- active magnetron sputtering techniques, respectively. By means of X-ray diffraction analysis, electron probe microanalysis, X-ray photoelectron spectroscopy, and scanning electron microscopy, the influence of nitrogen flow ratio on the film microstructure and characteristics were investigated systematically, including the depo- sition rate, chemical compositions, phase constituents, grain size, chemical bonding, as well as cross-sectional morphologies. Meanwhile, the hardness and adhesion of above films were also evaluated by micro-indentation method and a scratch tester. With increasing the nitrogen flow ratio, the deposition rate of above films de- creased approximately linearly, whereas the contents of N and O in the films increased gradually and tended to saturation. Moreover, the film microstructure was also altered gradually from a fine columnar microstructure to a featureless glass-structure. As the nitrogen flow ratio was 11.7%, the Zr-B-O-N film possessed an typical nanocomposite structure and presented good mechanical properties. During the process of reactive sputtering of metal borides, the introduction of nitrogen can show a pronounced suppression of columnar grain growth and strong nanocomposite structure forming ability.
