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Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma
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作者 王森 张权治 +2 位作者 马方方 Maksudbek YUSUPOV 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第6期79-87,共9页
A two-dimensional fluid model based on COMSOL Multiphysics is developed to investigate the modulation of static magnetic field on plasma homogeneity in a capacitively coupled plasma(CCP)chamber. To generate a static m... A two-dimensional fluid model based on COMSOL Multiphysics is developed to investigate the modulation of static magnetic field on plasma homogeneity in a capacitively coupled plasma(CCP)chamber. To generate a static magnetic field, direct current is applied to a circular coil located at the top of the chamber. By adjusting the magnetic field's configuration, which is done by altering the coil current and position, both the plasma uniformity and density can be significantly modulated. In the absence of the magnetic field, the plasma density exhibits an inhomogeneous distribution characterized by higher values at the plasma edge and lower values at the center. The introduction of a magnetic field generated by coils results in a significant increase in electron density near the coils. Furthermore, an increase in the sets of coils improves the uniformity of the plasma. By flexibly adjusting the positions of the coils and the applied current,a substantial enhancement in overall uniformity can be achieved. These findings demonstrate the feasibility of using this method for achieving uniform plasma densities in industrial applications. 展开更多
关键词 COMSOL capacitively coupled plasma plasma uniformity magnetic field
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Effect of a negative DC bias on a capacitively coupled Ar plasma operated at different radiofrequency voltages and gas pressures
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作者 相垚君 王晓坤 +1 位作者 刘永新 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第5期62-71,共10页
The effect of a negative DC bias,|V_(dc)|,on the electrical parameters and discharge mode is investigated experimentally in a radiofrequency(RF)capacitively coupled Ar plasma operated at different RF voltage amplitude... The effect of a negative DC bias,|V_(dc)|,on the electrical parameters and discharge mode is investigated experimentally in a radiofrequency(RF)capacitively coupled Ar plasma operated at different RF voltage amplitudes and gas pressures.The electron density is measured using a hairpin probe and the spatio-temporal distribution of the electron-impact excitation rate is determined by phase-resolved optical emission spectroscopy.The electrical parameters are obtained based on the waveforms of the electrode voltage and plasma current measured by a voltage probe and a current probe.It was found that at a low|V_(dc)|,i.e.inα-mode,the electron density and RF current decline with increasing|V_(dc)|;meanwhile,the plasma impedance becomes more capacitive due to a widened sheath.Therefore,RF power deposition is suppressed.When|V_(dc)|exceeds a certain value,the plasma changes toα–γhybrid mode(or the discharge becomes dominated by theγ-mode),manifesting a drastically growing electron density and a moderately increasing RF current.Meanwhile,the plasma impedance becomes more resistive,so RF power deposition is enhanced with|V_(dc)|.We also found that the electrical parameters show similar dependence on|V_(dc)|at different RF voltages,andα–γmode transition occurs at a lower|V_(dc)|at a higher RF voltage.By increasing the pressure,plasma impedance becomes more resistive,so RF power deposition and electron density are enhanced.In particular,theα–γmode transition tends to occur at a lower|V_(dc)|with increase in pressure. 展开更多
关键词 RF capacitively coupled plasma DC-overlapped RF discharge power deposition discharge mode transition
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Magnetic probe diagnostics of nonlinear standing waves and bulk ohmic electron power absorption in capacitive discharges
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作者 Kai ZHAO Yongxin LIU +2 位作者 Quanzhi ZHANG Demetre J ECONOMOU younian wang 《Plasma Science and Technology》 SCIE EI CAS CSCD 2021年第11期74-83,共10页
It is recognized that standing wave effects appearing in large-area,very-high-frequency capacitively coupled plasma(CCP)reactors cause center-high plasma non-uniformity.Using a high-frequency magnetic probe,we present... It is recognized that standing wave effects appearing in large-area,very-high-frequency capacitively coupled plasma(CCP)reactors cause center-high plasma non-uniformity.Using a high-frequency magnetic probe,we present a direct experimental diagnostic of the nonlinear standing waves and bulk ohmic electron power absorption dynamics in low pressure CCP discharges for different driving frequencies of 13.56,30,and 60 MHz.The design,principle,calibration,and validation of the probe are described in detail.Spatial structures of the harmonics of the magnetic field,determined by the magnetic probe,were used to calculate the distributions of the harmonic current and the corresponding ohmic electron power deposition,providing insights into the behavior of nonlinear harmonics.At a low driving frequency,i.e.13.56 MHz,no remarkable nonlinear standing waves were identified and the bulk ohmic electron power absorption was observed to be negligible.The harmonic magnetic field/current was found to increase dramatically with the driving frequency,due to decreased sheath reactance and more remarkable nonlinear standing waves at a higher driving frequency,leading to the enhancements of the ohmic heating and the plasma density in the bulk,specifically at the electrode center.At a high driving frequency,i.e.60 MHz,the high-order harmonic current density and the corresponding ohmic electron power absorption exhibited a similar node structure,with the main peak on axis,and one or more minor peaks between the electrode center and the edge,contributing to the center-high profile of the plasma density. 展开更多
关键词 capacitively coupled plasmas magnetic probe nonlinear standing waves ohmic heating
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3D fluid model analysis on the generation of negative hydrogen ions for negative ion source of NBI
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作者 邢思雨 高飞 +3 位作者 张钰如 王英杰 雷光玖 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第10期105-116,共12页
A radio-frequency(RF) inductively coupled negative hydrogen ion source(NHIS) has been adopted in the China Fusion Engineering Test Reactor(CFETR) to generate negative hydrogen ions.By incorporating the level-lumping m... A radio-frequency(RF) inductively coupled negative hydrogen ion source(NHIS) has been adopted in the China Fusion Engineering Test Reactor(CFETR) to generate negative hydrogen ions.By incorporating the level-lumping method into a three-dimensional fluid model,the volume production and transportation of H^(-) in the NHIS,which consists of a cylindrical driver region and a rectangular expansion chamber,are investigated self-consistently at a large input power(40 k W) and different pressures(0.3–2.0 Pa).The results indicate that with the increase of pressure,the H^(-) density at the bottom of the expansion region first increases and then decreases.In addition,the effect of the magnetic filter is examined.It is noteworthy that a significant increase in the H^(-) density is observed when the magnetic filter is introduced.As the permanent magnets move towards the driver region,the H^(-) density decreases monotonically and the asymmetry is enhanced.This study contributes to the understanding of H-distribution under various conditions and facilitates the optimization of volume production of negative hydrogen ions in the NHIS. 展开更多
关键词 negative hydrogen ion sources China Fusion Engineering Test Reactor three-dimensional fluid model(Some figures may appear in colour only in the online journal)
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Fluid simulation of the effect of a dielectric window with high temperature on plasma parameters in inductively coupled plasma
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作者 李娜 韩道满 +3 位作者 张权治 刘旭辉 王英杰 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第3期51-61,共11页
To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature... To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature.This high temperature can modulate the plasma characteristics to a large degree.We thus study the effect of dielectric window temperature on plasma parameters in two different ICP structures based on COMSOL software.The distributions of various plasma species are examined at different dielectric window temperatures.The concentration of neutral gas is found to be largely modulated at high dielectric window temperature,which further affects the electron collision probability with neutrals and the electron temperature.However,the electron density profiles are barely affected by the dielectric window temperature,which is mainly concentrated at the center of the reactor due to the fixed power input and pressure. 展开更多
关键词 fluid simulation metastable argon dielectric window temperature inductively coupled plasma
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A fast hybrid simulation approach of ion energy and angular distributions in biased inductively coupled Ar plasmas
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作者 赵明亮 张钰如 +1 位作者 高飞 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第7期61-71,共11页
In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at dif... In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at different radial positions in a biased argon inductively coupled plasma.The results indicate that when the bias voltage amplitude increases or the bias frequency decreases,the ion energy peak separation width becomes wider.Besides,the widths of the ion energy peaks at the edge of the substrate are smaller than those at the center due to the lower plasma density there,indicating the nonuniformity of the ion energy distribution function(IEDF)along the radial direction.As the pressure increases from 1 to 10 Pa,the discrepancy of the IEDFs at different radial positions becomes more obvious,i.e.the IEDF at the radial edge is characterized by multiple low energy peaks.When a dual frequency bias source is applied,the IEDF exhibits three or four peaks,and it could be modulated efficiently by the relative phase between the two bias frequencies.The results obtained in this work could help to improve the radial uniformity of the IEDF and thus the etching process. 展开更多
关键词 biased inductively coupled plasma 2D hybrid model IEADs
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