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Nd_xFe_(1-x)非晶膜及其晶化过程的TEM原位观察 被引量:2
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作者 吕曼祺 wagendristel A 《金属学报》 SCIE EI CAS CSCD 北大核心 1993年第4期B181-B186,共6页
用X射线衍射和透射电镜研究了用闪蒸法(Flash evaporation)在77K制备的Nd_xFe_(1-x)(X=0.06-0.90)非晶薄膜的室温稳定性及其晶化过程当0.19<X<0.50时,非晶Nd_xFe_(1-x)薄膜在室温是稳定的,晶化相呈沿膜面的薄片状生长,完全晶化后... 用X射线衍射和透射电镜研究了用闪蒸法(Flash evaporation)在77K制备的Nd_xFe_(1-x)(X=0.06-0.90)非晶薄膜的室温稳定性及其晶化过程当0.19<X<0.50时,非晶Nd_xFe_(1-x)薄膜在室温是稳定的,晶化相呈沿膜面的薄片状生长,完全晶化后的薄膜由Nd_2Fe_(17)相和金属Nd相构成。 展开更多
关键词 非晶薄膜 Nd-Fe薄膜 晶化
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非晶Nd-Fe薄膜电阻的温度效应与非晶稳定性 被引量:2
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作者 吕曼祺 A.wagendristel 《物理学报》 SCIE EI CAS CSCD 北大核心 1993年第5期840-846,共7页
用闪光蒸镀法在77K制备了Nd_xFe_(1-x)(x=0.06-0.80)非晶薄膜,原位测定了其电阻随温度的变化。结果表明:在0.19<x<0.50的成分范围内,非晶膜在室温下是稳定的。在晶化以前,薄膜的比电阻与温度的关系可分为三个阶段,即ρ(T)∝InT,ρ... 用闪光蒸镀法在77K制备了Nd_xFe_(1-x)(x=0.06-0.80)非晶薄膜,原位测定了其电阻随温度的变化。结果表明:在0.19<x<0.50的成分范围内,非晶膜在室温下是稳定的。在晶化以前,薄膜的比电阻与温度的关系可分为三个阶段,即ρ(T)∝InT,ρ(T)∝T^2和ρ(T)∝T。晶化不是在一个固定的温度,而是在一个温度区间发生。 展开更多
关键词 金属玻璃 薄膜 电阻 温度 稳定性
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Ti-N多层膜的显微结构和压痕行为 被引量:1
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作者 A.wagendristel 黄荣芳 +5 位作者 H.BANGERT 杨霞 吴立航 王海峰 H.PANGRATZ P.SKALICKY 《金属学报》 SCIE EI CAS CSCD 北大核心 1992年第7期B316-B322,T001,共8页
研究了Ti/TiN多层膜的显微结构,横截面试样的透射电镜研究和二次离子质谱深度分析均表明,该膜具有周期变化的多层结构,即:基体/FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN…Ti/Ti_2N/TiN.制备了压痕试样的断口试样,并用扫描电镜进行了观察.... 研究了Ti/TiN多层膜的显微结构,横截面试样的透射电镜研究和二次离子质谱深度分析均表明,该膜具有周期变化的多层结构,即:基体/FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN…Ti/Ti_2N/TiN.制备了压痕试样的断口试样,并用扫描电镜进行了观察.结果表明,多层硬膜在压痕试验时发生形变,出现压痕坑,在其周围形成材料堆积.随着所加载荷的增加,形变区扩大,越过膜/基界面进入基体,引起膜内的层间开裂和在膜/基界面上形成孔洞,研究结果表明,和单层TiN相比,Ti/TiN多层膜具有较好的韧性. 展开更多
关键词 Ti-N多层膜 显微结构 压痕
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MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM
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作者 wagendristel A BANGERTH +1 位作者 PANGRATZH SKALICKYP 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1993年第7期29-34,共6页
The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film h... The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film has a periodic alternate multilayered structure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,where FeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectional fracture surface of indentation samples had been obtained and studied with scanning electron microscopy.It was shown that the multilayer film deformed during indentation, formed an indentation pit and a pile-up of materials around the indentation pit.As the applied load increased deformation region extended beyond the film/substratc interface and into the substrate,the interlayer crack in the film and hole formation at the film /substrate interface were initiated.It is also shown that the multilayered Ti/TiN film offered better toughness in comparison with single layer TiN film. 展开更多
关键词 multilayer Ti-N film MICROSTRUCTURE INDENTATION
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非晶Nd-Fe薄膜的磁性
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作者 吕曼祺 M.Reissuer +1 位作者 W.Steiner A.wagendristel 《物理学报》 SCIE EI CAS CSCD 北大核心 1993年第8期1361-1369,共9页
在用闪蒸法制备的非晶Nd_xFe_(1-x)薄膜中Nd的原子磁矩呈散铁磁性排列,其有效磁矩随Nd含量增加而减小。磁有序温度T_c的值与外场和测量方法有关,表明了具有不同磁有序温度的磁性原子团的存在。交换交互作用,而不是自发磁化强度,明显地... 在用闪蒸法制备的非晶Nd_xFe_(1-x)薄膜中Nd的原子磁矩呈散铁磁性排列,其有效磁矩随Nd含量增加而减小。磁有序温度T_c的值与外场和测量方法有关,表明了具有不同磁有序温度的磁性原子团的存在。交换交互作用,而不是自发磁化强度,明显地受制备条件的影响。 展开更多
关键词 金属玻璃 薄膜 磁性 钕铁合金
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IN SITU TEM OBSERVATION OF AMORPHOUS Nd_(x)Fe_(1-x)THIN FILMS AND THEIR CRYSTALLIZATION
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作者 Manqi wagendristel A 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1993年第11期387-392,共6页
The room temperature stability and crystallization of amorphous Nd_xFe_(1-x)thin films with x=0.06—0.90,prepared by flash evaporation at 77 K,were investigated by X-ray diffraction and TEM observation.The amorphous N... The room temperature stability and crystallization of amorphous Nd_xFe_(1-x)thin films with x=0.06—0.90,prepared by flash evaporation at 77 K,were investigated by X-ray diffraction and TEM observation.The amorphous Nd_xFe_(1-x)films are stable at room temperature when 0.19<x<0.50.Crystallized phases grow along the surface of film as very thin flakes and become thick only at relatively high temperatures.After complete crystallization,the Nd_xFe_(1-x)films with x<0.50 are composed of Nd_2Fe-(17)and metal Nd,but no NdFe2,a phase expected to occur by phase diagram. 展开更多
关键词 amorphous film Nd-Fe film CRYSTALLIZATION
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