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Barrier height and ideality factor dependency on identically produced small Au/p-Si Schottky barrier diodes
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作者 M.A.Yeganeh S.h.rahmatollahpur 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第7期16-21,共6页
Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-vol... Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-voltage (Ⅰ-Ⅴ) characteristics were measured by a conducting probe atomic force microscope(C-AFM).In spite of the identical preparation of the diodes there was a diode-to-diode variation in ideality factor and barrier height parameters.By extrapolating the plots the built in potential of the Au /p-Si contact was obtained as V_(bi)=0.5425 V and the barrier height valueΦ_(b(c-V)) was calculated to beΦ_(B(C-V))=0.7145 V for Au/p-Si.It is found that for the diodes with diameters smaller than 100μm,the diode barrier height and ideality factor dependency to their diameters and correlation between the diode barrier height and its ideality factor are nonlinear,where similar to the earlier reported different metal semiconductor diodes in the literature,these parameters for the here manufactured diodes with diameters more than 100μm are also linear.Based on the very obvious sub-nanometer C-AFM produced pictures the scientific evidence behind this controversy is also explained. 展开更多
关键词 Schottky barrier diodes conducting probe-atomic force microscope barrier height and ideality factor
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