Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrate...Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8±0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2 = 212.78 nm). The Cr nano-grating covers a 1000μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.展开更多
A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic fo...A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic force microscope with a large range, where a series of reference signs have been performed to locate the deposition area. Cosine error of the measurement result is analyzed and eliminated by the iterative angle calibration. The measurement result shows that the mean pitch of the grating is 212.66 ±0.02nm, which is very close to half of the standing laser wavelength (λ = 425.55 nm). This means that the grating has traceability with high accuracy and can substitute the laser interference technology for instrument calibration. Moreover, using the Cr deposition grating as a nano standard can shorten the traceability chain and improve the practical application.展开更多
基金supported by the Major Research Plan of the National Natural Science Foundation of China(Grant No.91123022)the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.10804084)
文摘Atom lithography with chromium can be utilized to fabricate a pitch standard, which is chrectly traceable to me wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8±0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2 = 212.78 nm). The Cr nano-grating covers a 1000μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.
基金Supported by the Nano Special Projects of Shanghai Science and Technology Commission under Grant No 11nm0560800, and the Young Scientists Fund of the National Natural Science Foundation of China under Grant Nos 11104284 and 61107077.
文摘A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic force microscope with a large range, where a series of reference signs have been performed to locate the deposition area. Cosine error of the measurement result is analyzed and eliminated by the iterative angle calibration. The measurement result shows that the mean pitch of the grating is 212.66 ±0.02nm, which is very close to half of the standing laser wavelength (λ = 425.55 nm). This means that the grating has traceability with high accuracy and can substitute the laser interference technology for instrument calibration. Moreover, using the Cr deposition grating as a nano standard can shorten the traceability chain and improve the practical application.