InAs/GaSb superlattiee （SL） midwave infrared photovoltaic detectors are grown by molecular beam epitaxy on GaSb（001） residud p-type substrates. A thick GaSb layer is grown under the optimized growth condition as a...InAs/GaSb superlattiee （SL） midwave infrared photovoltaic detectors are grown by molecular beam epitaxy on GaSb（001） residud p-type substrates. A thick GaSb layer is grown under the optimized growth condition as a buffer layer. The detectors containing a 320-period 8ML/SML InAs/GaS5 SL active layer are fabricated with a series pixel area using anode sulfide passivation. Corresponding to 50% cutoff wavelengths of 5.0 μm at 77K, the peak directivity of the detectors is 1.6 × 10^10 cm.Hz^1/2 W^-1 at 77K.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 60625405, and the National Basic Research Program of China under Grant Nos 2007CB936304 and 2010CB327601.
文摘InAs/GaSb superlattiee （SL） midwave infrared photovoltaic detectors are grown by molecular beam epitaxy on GaSb（001） residud p-type substrates. A thick GaSb layer is grown under the optimized growth condition as a buffer layer. The detectors containing a 320-period 8ML/SML InAs/GaS5 SL active layer are fabricated with a series pixel area using anode sulfide passivation. Corresponding to 50% cutoff wavelengths of 5.0 μm at 77K, the peak directivity of the detectors is 1.6 × 10^10 cm.Hz^1/2 W^-1 at 77K.
