The uniform luminescent porous silicon (PS) film on crystal Si wafer has been prepared by two-step chemical staining etching. The refractive index of the film ranges from 2.0 to 2.4. The photoluminescence (PL) and pho...The uniform luminescent porous silicon (PS) film on crystal Si wafer has been prepared by two-step chemical staining etching. The refractive index of the film ranges from 2.0 to 2.4. The photoluminescence (PL) and photoluminescence excitation (PLE) spectra and Fourier transform infrared (FTIR) spectra have been measured. The features of Qhemically stained PS are consistent with, those of anodized samples. It is. found trial the etching is induced by the electron transmitting through neutral NO2. Both oxidization by HNO2 and hydrogen action by HF make the chemically stained PS have similar FTIR spectra as anodized samples. The occurrence of bold spots during PS formation has been discussed. It is believed that there exists metasili-cate acid in the PS film.展开更多
基金Project supported by the National Natural Science Foundation of China.
文摘The uniform luminescent porous silicon (PS) film on crystal Si wafer has been prepared by two-step chemical staining etching. The refractive index of the film ranges from 2.0 to 2.4. The photoluminescence (PL) and photoluminescence excitation (PLE) spectra and Fourier transform infrared (FTIR) spectra have been measured. The features of Qhemically stained PS are consistent with, those of anodized samples. It is. found trial the etching is induced by the electron transmitting through neutral NO2. Both oxidization by HNO2 and hydrogen action by HF make the chemically stained PS have similar FTIR spectra as anodized samples. The occurrence of bold spots during PS formation has been discussed. It is believed that there exists metasili-cate acid in the PS film.
