A number of zinc oxide（Zn O） films are deposited on silicon substrates using the magnetron sputtering method.After undergoing thermal treatment under different conditions, those films exhibit hexagonal wurtzite stru...A number of zinc oxide（Zn O） films are deposited on silicon substrates using the magnetron sputtering method.After undergoing thermal treatment under different conditions, those films exhibit hexagonal wurtzite structures and different photoluminescent characteristics. Besides the notable ultraviolet emission, which is related to the free exciton effect, a distinct blue fluorescence around 475 nm is found in some special samples.The blue photoluminescence emission of the Zn O film is believed to be caused by oxygen vacancies.展开更多
基金supported by the Natural Science Foundation of Shanghai (No. 13ZR1402600)the National Natural Science Foundation of China (No. 60578047)+3 种基金the National "973" Program of China (Nos. 2012CB934303 and 2009CB929201)the Shanghai Commission of Science and Technology (No. 06DJ14007)the National "02" Project of China (No. 2011ZX02402)the Natural Science Foundation of Shandong Province (No. 2011ZRFL019)
文摘A number of zinc oxide（Zn O） films are deposited on silicon substrates using the magnetron sputtering method.After undergoing thermal treatment under different conditions, those films exhibit hexagonal wurtzite structures and different photoluminescent characteristics. Besides the notable ultraviolet emission, which is related to the free exciton effect, a distinct blue fluorescence around 475 nm is found in some special samples.The blue photoluminescence emission of the Zn O film is believed to be caused by oxygen vacancies.
