自由运行的半导体激光器由于谱线较宽而无法满足如拉曼散射等对线宽有要求的应用需求,因此获得线宽较窄、波长稳定的半导体激光器十分必要。采用反射式全息光栅作为谱线窄化元件,研究了在Littrow布局下的405 nm外腔半导体激光器。反射...自由运行的半导体激光器由于谱线较宽而无法满足如拉曼散射等对线宽有要求的应用需求,因此获得线宽较窄、波长稳定的半导体激光器十分必要。采用反射式全息光栅作为谱线窄化元件,研究了在Littrow布局下的405 nm外腔半导体激光器。反射式全息光栅的加入,使得光栅面和半导体激光器的输出面组成耦合外腔,这在很大程度上改善了405 nm半导体激光器的线宽性能。实验结果表明,通过加入2400 line/mm的反射式全息光栅形成外腔反馈,半导体激光器的阈值电流由31 m A下降到22 m A,谱线宽度从自由运行时的1 nm减小到0.03 nm以下,实现了窄线宽输出,并且在工作电流为100 m A时,得到窄线宽半导体激光器的输出功率为28 m W,为自由运行半导体激光器输出功率的31.7%。此外,通过调节反馈光栅的角度,实现了较大电流范围的激光波长的连续调谐,最大调谐范围达3.5 nm。展开更多
The temperature characteristics of cathode sheath in high-pressure volume discharge are investigated experimentally.The cathode sheath temperatures under various discharge conditions are derived from the speeds of the...The temperature characteristics of cathode sheath in high-pressure volume discharge are investigated experimentally.The cathode sheath temperatures under various discharge conditions are derived from the speeds of the emanating shock waves which are measured by a Mach-Zehnder interferometry.It is found that the cathode sheath temperature and the ratioΔT_(3)/ΔT_(1) of temperature rise between cathode sheath and plasma bulk are determined by the specific energy deposition and the breakdown delay time respectively.These results are helpful for discharge stability improving and shock wave reducing.展开更多
文摘自由运行的半导体激光器由于谱线较宽而无法满足如拉曼散射等对线宽有要求的应用需求,因此获得线宽较窄、波长稳定的半导体激光器十分必要。采用反射式全息光栅作为谱线窄化元件,研究了在Littrow布局下的405 nm外腔半导体激光器。反射式全息光栅的加入,使得光栅面和半导体激光器的输出面组成耦合外腔,这在很大程度上改善了405 nm半导体激光器的线宽性能。实验结果表明,通过加入2400 line/mm的反射式全息光栅形成外腔反馈,半导体激光器的阈值电流由31 m A下降到22 m A,谱线宽度从自由运行时的1 nm减小到0.03 nm以下,实现了窄线宽输出,并且在工作电流为100 m A时,得到窄线宽半导体激光器的输出功率为28 m W,为自由运行半导体激光器输出功率的31.7%。此外,通过调节反馈光栅的角度,实现了较大电流范围的激光波长的连续调谐,最大调谐范围达3.5 nm。
文摘The temperature characteristics of cathode sheath in high-pressure volume discharge are investigated experimentally.The cathode sheath temperatures under various discharge conditions are derived from the speeds of the emanating shock waves which are measured by a Mach-Zehnder interferometry.It is found that the cathode sheath temperature and the ratioΔT_(3)/ΔT_(1) of temperature rise between cathode sheath and plasma bulk are determined by the specific energy deposition and the breakdown delay time respectively.These results are helpful for discharge stability improving and shock wave reducing.
