The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is ...The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.展开更多
基金Supported by National Natural Science Foundation of China (10825521)973 Project (2011CB922203)Natural Science Foundation of Shanghai (09ZR1434300)
文摘The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.
