摘要
采用多弧离子镀技术在40Cr基体上制备TiAlN/TiN复合膜层,通过金相显微镜、扫描电镜和显微硬度仪研究靶电流对膜层表面形貌、沉积率及硬度的影响。结果表明:靶材电流对膜层组织和硬度有显著影响,电流越高膜层表面越不平整,显微硬度随靶材电流的升高先上升后降低。靶电流越高,膜层中Ti、Al原子的含量就越高。
TiAlN/TiN composite film was prepared on 40Cr steel substrate using multi-arc ion technology.The effects of target current on structure,deposition rate and microhardness of TiAlN/TiN film were studied with metallographic microscope,SEM and microhardness instrument.The results show that the target current has a great influence on the performance of TiAlN/TiN film.The surface of film becomes out-of-flatness by increasing target current.The microhardness and the content of Ti/Al in film increase with the increase of target current.
出处
《热加工工艺》
CSCD
北大核心
2010年第22期120-122,共3页
Hot Working Technology
基金
机械传动国家重点实验室2009年度开放基金资助项目(SKLMT-KFKT-200907)
