摘要
用磁控溅射法在奥氏体不锈钢基片上分别制备了TiN薄膜和Al_2O_3薄膜,并用XRD、SEM和显微硬度等测试手段对沉积态和退火态薄膜进行表征,分析了不同工艺参数对薄膜的沉积速率、结构和性能的影响,从而得到最佳工艺参数。TiN薄膜在沉积气压为1.5 Pa,氩氮比为16:16时薄膜的硬度值最大为16.0 GPa。Al_2O_3薄膜在沉积气压为0.5 Pa,氩氧比为10:1时薄膜的硬度值可达25.2 GPa。
In this paper, the TiN film and Al2O3 film were prepared on austenitic stainless steel by magnetron sputtering method. These films were analyzed by XRD,SEM and Microhardness test. Through the analysis,the effects of different processes on the film deposition rate, strueture and properties are obtained, and the ideal parameters are given. The hardness of TiN thin film is 16.0 GPa when the deposition pressure is 1.5 Pa, and the ratio of argon to nitrogen is 16：16 . The hardness of Al2O3 thin film reaches 25.2 GPa when the deposition pressure is 0.5 Pa, and the ratio of argon to oxygen is 10：1.
出处
《真空与低温》
2009年第4期227-232,共6页
Vacuum and Cryogenics
基金
安徽省红外与低温等离子体重点实验室(2007C002107D)
安徽省自然科学基金(090414182)
973项目(2008CB717802)
国家自然科学基金(60806028)资助
关键词
奥氏体不锈钢
磁控溅射
氮化钛薄膜
氧化铝薄膜
显微硬度
austenitic stainless steel
magnetron sputtering
TiN thin film
Al2O3 thin film
Microhardness
