摘要
采用反应磁控共溅射的方法,通过改变Cr靶溅射功率,在不锈钢基体上沉积不同Cr含量TiAlCrN薄膜。采用原子力显微镜(AFM)观察薄膜表面形貌;采用动电位极化试验研究薄膜的电化学腐蚀行为。结果表明:沉积的TiAlCrN薄膜表面平整、光滑、致密,无孔洞和突起等缺陷,晶粒细小,粗糙度低;TiAlCrN薄膜的抗腐蚀性好于不锈钢和TiAlN薄膜,且随Cr含量增加而增强。Cr含量为25.5%(原子分数)试样成膜质量最好,其抗腐蚀性约为不锈钢的15.0倍,约为TiAlN薄膜的7.7倍。
Advanced quaternary TiAlCrN hard coatings with different Cr contents were prepared on stainless steel substrates under various sputtering power of Cr target by using reactive magnetrons co-puttering tech-nique.The micro-morphologies of the coatings were analyzed using an atomic force microscope.The corrosion behavior of the coatings was evaluated by conducting potentiodynamic polarization measurements on a galvanostat and potentiostat system.Results indicate that the resulting TiAlCrN hard coatings are smooth,compact,and free of defects including holes and protrusions,consisting fine particles and showing a small surface roughness.Moreover,the TiAlCrN hard coatings had better corrosion resist-ance than stainless steel,and the corrosion resistance increased with increasing Cr content.At a Cr content of 25.5at%,the cor-responding TiAlCrN hard coating had the optimum quality charac-terized by the smallest grain size and surface roughness,and showed corrosion resistance as much as 15.0 times of that of stainless steel and 7.7 times of that of TiAlN coating.
出处
《材料保护》
CAS
CSCD
北大核心
2009年第9期16-18,共3页
Materials Protection
基金
民航总局教育研究基金(03-3-07)资助
